Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
9023 | 1127 | 22.4 | 57% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
512 | 14399 | PLASMA SOURCES SCIENCE & TECHNOLOGY//PLASMA DISPLAY PANEL PDP//PLASMA DISPLAY PANEL |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | SURFACE WAVE PLASMA | Author keyword | 34 | 53% | 4% | 45 |
2 | GRP ESPE OSCOPIA PLASMAS | Address | 21 | 73% | 1% | 16 |
3 | GRP PHYS PLASMAS | Address | 17 | 43% | 3% | 31 |
4 | INNOVAC PLASMAS | Address | 14 | 100% | 1% | 7 |
5 | SURFACE WAVE SUSTAINED DISCHARGES | Author keyword | 14 | 100% | 1% | 7 |
6 | MICROWAVE DISCHARGES | Author keyword | 14 | 38% | 2% | 28 |
7 | SURFACE WAVE PLASMAS | Author keyword | 9 | 83% | 0% | 5 |
8 | MICROWAVE PLASMA JET | Author keyword | 8 | 70% | 1% | 7 |
9 | OXYGEN PLASMA FOR ULSI PROCESSES | Author keyword | 8 | 100% | 0% | 5 |
10 | MICROWAVE PLASMA | Author keyword | 8 | 12% | 5% | 61 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | AXIAL STRUCTURE | 72 | 93% | 2% | 27 |
2 | AXIAL INJECTION TORCH | 26 | 100% | 1% | 11 |
3 | MICROWAVE DISCHARGES | 20 | 43% | 3% | 36 |
4 | PLASMA COLUMN | 19 | 55% | 2% | 24 |
5 | WAVE PRODUCED PLASMAS | 17 | 70% | 1% | 14 |
6 | SUSTAINED DISCHARGES | 15 | 82% | 1% | 9 |
7 | INTERMEDIATE PRESSURES | 15 | 73% | 1% | 11 |
8 | SURFACE WAVE | 12 | 20% | 5% | 55 |
9 | WAVE SUSTAINED DISCHARGE | 12 | 50% | 2% | 17 |
10 | INJECTION AXIALE | 12 | 86% | 1% | 6 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Travelling-wave-sustained discharges | 2007 | 37 | 223 | 73% |
PLASMA SOURCES BASED ON THE PROPAGATION OF ELECTROMAGNETIC SURFACE-WAVES | 1991 | 287 | 35 | 80% |
AXIAL STRUCTURE OF LOW-PRESSURE HIGH-FREQUENCY DISCHARGES SUSTAINED BY TRAVELING ELECTROMAGNETIC SURFACE-WAVES | 1995 | 63 | 87 | 92% |
Modeling of surface-wave discharges with cylindrical symmetry | 2009 | 10 | 80 | 69% |
Fundamental comparison between non-equilibrium aspects of ICP and MIP discharges | 1999 | 53 | 37 | 41% |
EXCITATION EQUILIBRIA IN PLASMAS - A CLASSIFICATION | 1990 | 220 | 27 | 19% |
A COLLISIONAL-RADIATIVE MODEL FOR MICROWAVE DISCHARGES IN HELIUM AT LOW AND INTERMEDIATE PRESSURES | 1992 | 56 | 32 | 28% |
Thomson scattering from analytical plasmas | 2002 | 29 | 50 | 16% |
EXPERIMENTAL INVESTIGATIONS OF THE PROPAGATION OF SURFACE-WAVES ALONG A PLASMA-COLUMN | 1982 | 151 | 4 | 50% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | GRP ESPE OSCOPIA PLASMAS | 21 | 73% | 1.4% | 16 |
2 | GRP PHYS PLASMAS | 17 | 43% | 2.8% | 31 |
3 | INNOVAC PLASMAS | 14 | 100% | 0.6% | 7 |
4 | PLASMA LASER ENGN | 7 | 25% | 2.3% | 26 |
5 | IMP PAN | 5 | 63% | 0.4% | 5 |
6 | SZEWALSKI FLUID FLOW MACHINERY | 5 | 16% | 2.3% | 26 |
7 | OSRODEK TECH PLAZMOWEJ LASEROWEJ | 4 | 75% | 0.3% | 3 |
8 | MARINE ELECT | 4 | 19% | 1.6% | 18 |
9 | PROC EQUIPMENT ENGN | 3 | 57% | 0.4% | 4 |
10 | GRP ESPECT PLASMAS | 3 | 50% | 0.4% | 4 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000247480 | NS KURNAKOV//ELE OPHYS IL//PLASMA SLAB |
2 | 0.0000215643 | MICROWAVE PENETRATION//RADIATION SPECTRA//COAXIAL WAVES |
3 | 0.0000133467 | LOW INDUCTANCE ANTENNA//LOW DAMAGE PROCESS//INDUCTIVELY COUPLED PLASMA |
4 | 0.0000131642 | ECR PLASMA//UNIFORM PLASMA//MAGNETIC MULTIPOLE FIELD |
5 | 0.0000111819 | NITROGEN AFTERGLOW//FIS PLASMAS//CO2 LASER MIXTURE |
6 | 0.0000111024 | ELECTRON PLASMA OSCILLATION//RAMAN REGIME//TEMPAKU |
7 | 0.0000109827 | MICROWAVE INDUCED PLASMA//HIGH POWER NITROGEN MICROWAVE INDUCED PLASMA//OKAMOTO CAVITY |
8 | 0.0000107961 | VACUUM TECHNOL//ACTIVE PLASMA RESONANCE SPECTROSCOPY//CUTOFF PROBE |
9 | 0.0000099156 | SINGLE CRYSTAL DIAMOND//CH3 RADICAL DENSITY//DIAMOND |
10 | 0.0000096766 | N 2 SIH4 PLASMA//PROBE CURRENT VOLTAGE CHARACTERISTIC//SUPERFICI INTERFASI CONSORZIO CATANIA RIC |