Class information for:
Level 1: PHOTOMASK//IC EQUIPMENT//PROXIMITY EFFECT CORRECTION

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
9004 1129 13.0 53%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
740 11887 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 PHOTOMASK Address 17 100% 1% 8
2 IC EQUIPMENT Address 12 75% 1% 9
3 PROXIMITY EFFECT CORRECTION Author keyword 11 31% 3% 29
4 EB MASK EQUIPMENT ENGN Address 9 83% 0% 5
5 MASK DRAWING EQUIPMENT DEV Address 8 100% 0% 5
6 REPRESENTATIVE FIGURE Author keyword 8 100% 0% 5
7 ELECTRON BEAM DIRECT WRITING Author keyword 6 43% 1% 10
8 OHI PLANT Address 4 67% 0% 4
9 VERTICAL DEVELOPMENT Author keyword 4 75% 0% 3
10 ELECTRON PROJECTION LITHOGRAPHY EPL Author keyword 4 46% 1% 6

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 PROXIMITY EFFECT CORRECTION 11 31% 3% 29 Search PROXIMITY+EFFECT+CORRECTION Search PROXIMITY+EFFECT+CORRECTION
2 REPRESENTATIVE FIGURE 8 100% 0% 5 Search REPRESENTATIVE+FIGURE Search REPRESENTATIVE+FIGURE
3 ELECTRON BEAM DIRECT WRITING 6 43% 1% 10 Search ELECTRON+BEAM+DIRECT+WRITING Search ELECTRON+BEAM+DIRECT+WRITING
4 VERTICAL DEVELOPMENT 4 75% 0% 3 Search VERTICAL+DEVELOPMENT Search VERTICAL+DEVELOPMENT
5 ELECTRON PROJECTION LITHOGRAPHY EPL 4 46% 1% 6 Search ELECTRON+PROJECTION+LITHOGRAPHY+EPL Search ELECTRON+PROJECTION+LITHOGRAPHY+EPL
6 STITCHING ACCURACY 3 43% 1% 6 Search STITCHING+ACCURACY Search STITCHING+ACCURACY
7 LATERAL DEVELOPMENT 3 100% 0% 3 Search LATERAL+DEVELOPMENT Search LATERAL+DEVELOPMENT
8 CHARACTER PROJECTION 3 24% 1% 11 Search CHARACTER+PROJECTION Search CHARACTER+PROJECTION
9 PROXIMITY EFFECT LITHOGRAPHY 2 33% 1% 6 Search PROXIMITY+EFFECT+LITHOGRAPHY Search PROXIMITY+EFFECT+LITHOGRAPHY
10 CELL PROJECTION 2 24% 1% 9 Search CELL+PROJECTION Search CELL+PROJECTION

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 PROXIMITY EFFECT CORRECTION 33 53% 4% 43
2 AREA DENSITY MAP 24 91% 1% 10
3 CELL PROJECTION LITHOGRAPHY 19 80% 1% 12
4 REPRESENTATIVE FIGURE METHOD 13 69% 1% 11
5 NIKON EB STEPPER 6 53% 1% 8
6 PATTERN SHAPE MODIFICATION 6 100% 0% 4
7 PROXECCO 6 100% 0% 4
8 STENCIL MASK 5 54% 1% 7
9 NEAREST NEIGHBOR APPROACH 5 63% 0% 5
10 RULE BASED APPROACH 5 44% 1% 8

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution 2015 2 34 38%
Electron beam lithography - Present and future 1996 10 7 86%
Making lithography work for the 7-nm node and beyond in overlay accuracy, resolution, defect, and cost 2015 0 2 100%
PROXIMITY EFFECT CORRECTION AT 10 KEV USING GHOST AND SIZING FOR 0.4-MU-M MASK LITHOGRAPHY 1990 5 5 100%
MONTE-CARLO METHODS AND MICROLITHOGRAPHY SIMULATION FOR ELECTRON AND X-RAY-BEAMS 1987 32 50 54%
NANOSTRUCTURE TECHNOLOGY 1988 48 82 22%
NANOMETRIC-SCALE ELECTRON-BEAM LITHOGRAPHY 1992 3 38 58%
ELECTRON LITHOGRAPHY FOR THE FABRICATION OF MICROELECTRONIC DEVICES 1985 14 34 47%
PRACTICAL AND FUNDAMENTAL-ASPECTS OF LITHOGRAPHY 1984 5 6 67%
EXPOSURE AND DEVELOPMENT MODELS USED IN ELECTRON-BEAM LITHOGRAPHY 1981 41 8 88%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 PHOTOMASK 17 100% 0.7% 8
2 IC EQUIPMENT 12 75% 0.8% 9
3 EB MASK EQUIPMENT ENGN 9 83% 0.4% 5
4 MASK DRAWING EQUIPMENT DEV 8 100% 0.4% 5
5 OHI PLANT 4 67% 0.4% 4
6 MASK DEV TEAM 3 50% 0.4% 5
7 ADV LITHOG 3 60% 0.3% 3
8 IC LCD EQUIPMENT BUSINESS HEADQUARTERS 2 67% 0.2% 2
9 LETI GRENOBLE 2 50% 0.3% 3
10 ELECT DEV 1 19% 0.6% 7

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000263362 MICROCOLUMN//SCHOTTKY EMITTER//PROD DESIGN TECHNOL
2 0.0000246390 NANOSYST MFG//NANOELECT PROC IL//ION PROJECTION
3 0.0000148749 NANOPYRAMID ARRAY//DOPANT ION IMPLANTATION//FIS SUPERFICIES INTER ES
4 0.0000139799 HYDROGEN SILSESQUIOXANE//HSQ//HSQ RESIST
5 0.0000136837 X RAY MASK//SUPER FINE SR LITHOG//X RAY LITHOGRAPHY
6 0.0000118661 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY//LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESISTS
7 0.0000101076 BILEVEL STRUCTURE//PLASMA BLANKING//WT ADDITIVITY
8 0.0000093478 CANONICAL ABERRATION THEORY//OPT PHYS ELECT ENGN//ACCURACY OF COMPUTATION
9 0.0000072857 SCANNING//SECONDARY EMISSION NOISE//INTEGRATED CIRCUIT ADV PROC TECHNOL
10 0.0000057393 OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//BOTTOM ANTIREFLECTIVE COATINGS