Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
7565 | 1273 | 16.8 | 44% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
372 | 16511 | SWAMP//OXYGEN PRECIPITATION//GROWN IN DEFECT |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | RANGE PARAMETERS | Author keyword | 6 | 80% | 0% | 4 |
2 | SOFT ERROR MAPPING | Author keyword | 6 | 100% | 0% | 4 |
3 | HIGH ENERGY ION IMPLANTATION | Author keyword | 5 | 35% | 1% | 12 |
4 | NEUTRON DEPTH PROFILING | Author keyword | 5 | 30% | 1% | 14 |
5 | LATERAL STRAGGLING | Author keyword | 5 | 63% | 0% | 5 |
6 | ION RANGES | Author keyword | 4 | 67% | 0% | 4 |
7 | ATSUGI SEMICOND | Address | 4 | 75% | 0% | 3 |
8 | CESIA SETTORE RETI COMUNICAZ | Address | 3 | 100% | 0% | 3 |
9 | LONGITUDINAL RANGE STRAGGLING | Author keyword | 3 | 100% | 0% | 3 |
10 | RANGE STRAGGLING | Author keyword | 2 | 28% | 1% | 7 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | RANGE PARAMETERS | 6 | 80% | 0% | 4 | Search RANGE+PARAMETERS | Search RANGE+PARAMETERS |
2 | SOFT ERROR MAPPING | 6 | 100% | 0% | 4 | Search SOFT+ERROR+MAPPING | Search SOFT+ERROR+MAPPING |
3 | HIGH ENERGY ION IMPLANTATION | 5 | 35% | 1% | 12 | Search HIGH+ENERGY+ION+IMPLANTATION | Search HIGH+ENERGY+ION+IMPLANTATION |
4 | NEUTRON DEPTH PROFILING | 5 | 30% | 1% | 14 | Search NEUTRON+DEPTH+PROFILING | Search NEUTRON+DEPTH+PROFILING |
5 | LATERAL STRAGGLING | 5 | 63% | 0% | 5 | Search LATERAL+STRAGGLING | Search LATERAL+STRAGGLING |
6 | ION RANGES | 4 | 67% | 0% | 4 | Search ION+RANGES | Search ION+RANGES |
7 | LONGITUDINAL RANGE STRAGGLING | 3 | 100% | 0% | 3 | Search LONGITUDINAL+RANGE+STRAGGLING | Search LONGITUDINAL+RANGE+STRAGGLING |
8 | RANGE STRAGGLING | 2 | 28% | 1% | 7 | Search RANGE+STRAGGLING | Search RANGE+STRAGGLING |
9 | ELECTRIC CHARGE ACCUMULATION | 2 | 67% | 0% | 2 | Search ELECTRIC+CHARGE+ACCUMULATION | Search ELECTRIC+CHARGE+ACCUMULATION |
10 | RANGE DISTRIBUTIONS | 2 | 67% | 0% | 2 | Search RANGE+DISTRIBUTIONS | Search RANGE+DISTRIBUTIONS |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | PROJECTED RANGE | 21 | 73% | 1% | 16 |
2 | IMPURITY CONCENTRATION PROFILES | 18 | 89% | 1% | 8 |
3 | STOPPING POWER MODEL | 8 | 70% | 1% | 7 |
4 | MEAN PROJECTED RANGE | 8 | 100% | 0% | 5 |
5 | AMORPHOUS TARGETS | 8 | 48% | 1% | 12 |
6 | BORON IMPLANTATION | 8 | 48% | 1% | 12 |
7 | PEARSON DISTRIBUTIONS | 6 | 80% | 0% | 4 |
8 | LITHIUM IMPLANTATION | 6 | 100% | 0% | 4 |
9 | PROJECTED RANGES | 6 | 100% | 0% | 4 |
10 | AR IMPLANTATION | 4 | 75% | 0% | 3 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
NEUTRON DEPTH PROFILING - OVERVIEW AND DESCRIPTION OF NIST FACILITIES | 1993 | 49 | 58 | 60% |
RANGES IN SI AND LIGHTER MONO AND MULTIELEMENT TARGETS | 1995 | 31 | 67 | 55% |
CHANNELING IMPLANTS IN SILICON-CRYSTALS | 1994 | 10 | 34 | 56% |
DAMAGE FORMATION AND ANNEALING OF ION-IMPLANTATION IN SI | 1991 | 42 | 66 | 24% |
A Monte Carlo simulation study of high-dose and low-energy boron implantation into LPCVD-NiDoS polycrystalline thin films | 2008 | 0 | 14 | 50% |
NEAR-SURFACE PROFILING OF SEMICONDUCTOR-MATERIALS USING NEUTRON DEPTH PROFILING | 1995 | 4 | 9 | 33% |
APPLICATION OF NEUTRON DEPTH PROFILING TO MICROELECTRONIC MATERIALS PROCESSING | 1986 | 5 | 25 | 64% |
ON THE PERFORMANCE AND LIFETIME OF SOLAR MIRROR FOILS IN SPACE | 1985 | 1 | 4 | 50% |
ION-IMPLANTATION FOR VERY LARGE-SCALE INTEGRATION | 1982 | 5 | 10 | 40% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ATSUGI SEMICOND | 4 | 75% | 0.2% | 3 |
2 | CESIA SETTORE RETI COMUNICAZ | 3 | 100% | 0.2% | 3 |
3 | DESIGN MODELING HIGH SPEED BIPOLAR MOS TRANSI | 1 | 100% | 0.2% | 2 |
4 | SEMICOND INTEGRATED SYST | 1 | 100% | 0.2% | 2 |
5 | COMMUN ELE ENGN | 1 | 50% | 0.1% | 1 |
6 | DEUT ELE ONEN SYNCHROTRON | 1 | 50% | 0.1% | 1 |
7 | DPTO ELE ICIDAD ELECT | 1 | 50% | 0.1% | 1 |
8 | FESTKORPERELEK | 1 | 50% | 0.1% | 1 |
9 | MAT CHARACTERISAT PREPARAT | 1 | 50% | 0.1% | 1 |
10 | MEASURING SYST | 1 | 50% | 0.1% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000131523 | IBIEC//SOLID PHASE EPITAXIAL GROWTH//LATERAL SOLID PHASE EPITAXY |
2 | 0.0000123144 | VIBRATING CAPACITOR//SEMICOND EQUIPMENT OPERAT//SURFACE VOLTAGE |
3 | 0.0000108313 | TRANSIENT ENHANCED DIFFUSION//SWAMP//PAIR DIFFUSION MODEL |
4 | 0.0000097396 | STOPPING POWER//STOPPING FORCE//ENERGY LOSS |
5 | 0.0000097136 | MOLECULAR HYDRINO//NOVEL HYDRIDE ION//NEW ENERGY SOURCE |
6 | 0.0000069562 | MEV ION IMPLANTATION//ACTIVATION EFFICIENCY//COLD IMPLANTS |
7 | 0.0000067761 | RFQ ACCELERATOR//RFQ//SFRFQ |
8 | 0.0000060491 | ELASTIC RECOIL DETECTION//ION BEAM ANALYSIS//TOF ERDA |
9 | 0.0000057531 | ION CUT//SURFACE BLISTERING//SMART CUT |
10 | 0.0000055519 | ION BEAM MIXING//BALLISTIC MIXING//ION MIXING |