Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
7286 | 1308 | 16.8 | 69% |
Classes in level above (level 2) |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | PLASMA BASED ION IMPLANTATION | Author keyword | 98 | 73% | 6% | 75 |
2 | PLASMA IMMERSION ION IMPLANTATION | Author keyword | 86 | 39% | 13% | 172 |
3 | SHUNTING ARC | Author keyword | 45 | 94% | 1% | 16 |
4 | PLASMA SOURCE ION IMPLANTATION | Author keyword | 27 | 53% | 3% | 36 |
5 | PLASMA BASED ION IMPLANTATION PBII | Author keyword | 24 | 68% | 2% | 21 |
6 | PLASMA IMMERSION ION IMPLANTATION PIII | Author keyword | 18 | 45% | 2% | 31 |
7 | PLASMA BASED ION IMPLANTATION AND DEPOSITION PBIID | Author keyword | 15 | 82% | 1% | 9 |
8 | ION SHEATH | Author keyword | 13 | 46% | 2% | 21 |
9 | PLASMA DOPING PLAD | Author keyword | 13 | 62% | 1% | 13 |
10 | ECR PLASMA WITH A MIRROR FIELD | Author keyword | 11 | 100% | 0% | 6 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | CYLINDRICAL BORE | 39 | 80% | 2% | 24 |
2 | HIGH VOLTAGE PULSE | 34 | 93% | 1% | 13 |
3 | FINITE RISE | 33 | 100% | 1% | 13 |
4 | MULTIPOLAR BUCKET PLASMA | 33 | 100% | 1% | 13 |
5 | SOURCE ION IMPLANTATION | 29 | 40% | 4% | 57 |
6 | INNER SURFACE MODIFICATION | 26 | 100% | 1% | 11 |
7 | MATRIX SHEATH | 26 | 87% | 1% | 13 |
8 | HV PULSES | 23 | 86% | 1% | 12 |
9 | IMMERSION ION IMPLANTATION | 22 | 17% | 9% | 119 |
10 | DISCHARGE CATHODE MATERIALS | 21 | 90% | 1% | 9 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Plasma-blased ion implantation and deposition: A review of physics, technology, and applications | 2005 | 58 | 183 | 68% |
Plasma immersion ion implantation - A fledgling technique for semiconductor processing | 1996 | 167 | 77 | 65% |
Formation of diamond-like carbon films by plasma-based ion implantation and their characterization | 2006 | 7 | 38 | 82% |
Microcavity engineering by plasma immersion ion implantation | 1998 | 14 | 49 | 59% |
Simulation methods of ion sheath dynamics in plasma source ion implantation | 2004 | 3 | 55 | 95% |
Research progress in the inner surface modification of metal tubes by plasma processing | 2006 | 0 | 34 | 91% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MAT COMPONENT DEV | 11 | 100% | 0.5% | 6 |
2 | ASSOCIADO MAT SENSO | 9 | 67% | 0.6% | 8 |
3 | 702 | 8 | 39% | 1.2% | 16 |
4 | PLASMA SCI MICROELECT | 7 | 67% | 0.5% | 6 |
5 | ASSOC PLASMA | 5 | 54% | 0.5% | 7 |
6 | ASSOCIADO PLASMA | 4 | 26% | 1.1% | 14 |
7 | STATE WELDING PROD TECHNOL | 4 | 38% | 0.7% | 9 |
8 | ASSOC PLASMAS | 4 | 75% | 0.2% | 3 |
9 | ASSOCIADO PLASMAS | 3 | 45% | 0.4% | 5 |
10 | ASSOCIATED PLASMA | 3 | 16% | 1.2% | 16 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000090076 | PLASMA NITRIDING//EXPANDED AUSTENITE//NITRIDING |
2 | 0.0000084806 | RADIAT BEAM MAT ENGN//TI AL ZR ALLOY//ION PHYS MAT |
3 | 0.0000069719 | VACUUM ARC//CATHODE SPOT//VACUUM ARCS |
4 | 0.0000069250 | SHANGHAI CARDIOVASC//BIOMAT SUR E MODIFICAT SICHUAN//TI O FILM |
5 | 0.0000060799 | BOHM CRITERION//PLASMA SOLID INTERACTION//EMISSIVE PROBE |
6 | 0.0000059336 | DIAMOND LIKE CARBON//DLC//DLC COATINGS |
7 | 0.0000048845 | FUSED HOLLOW CATHODE//HOLLOW CATHODE//PLASMA GRP |
8 | 0.0000047004 | PL PLASMA PHYS GRP//PLASMA ACTIVATED COATING//PLASMA POLYMERIZED SURFACE |
9 | 0.0000045612 | DOUBLE GLOW//LASER NITRIDING//LASER GAS ALLOYING |
10 | 0.0000045458 | SELECTIVE REMOVAL OF ATOMS//MACROPOROUS CHAR//COMPOSITE ION BEAM IRRADIATION |