Class information for:
Level 1: BILEVEL STRUCTURE//PLASMA BLANKING//WT ADDITIVITY

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
7214 1316 17.2 36%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
740 11887 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 BILEVEL STRUCTURE Author keyword 4 75% 0% 3
2 PLASMA BLANKING Author keyword 4 75% 0% 3
3 WT ADDITIVITY Author keyword 3 100% 0% 3
4 DRY DEVELOPMENT Author keyword 3 28% 1% 9
5 ALKALINE DEVELOPMENT Author keyword 2 67% 0% 2
6 EPOXYSTYRENE Author keyword 2 67% 0% 2
7 NOVOLAC RESIST Author keyword 2 67% 0% 2
8 PRE EXPOSURE SILYLATION Author keyword 2 67% 0% 2
9 GEL DEGRADATION Author keyword 2 50% 0% 3
10 HALFTONE MASK Author keyword 2 50% 0% 3

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 BILEVEL STRUCTURE 4 75% 0% 3 Search BILEVEL+STRUCTURE Search BILEVEL+STRUCTURE
2 PLASMA BLANKING 4 75% 0% 3 Search PLASMA+BLANKING Search PLASMA+BLANKING
3 WT ADDITIVITY 3 100% 0% 3 Search WT+ADDITIVITY Search WT+ADDITIVITY
4 DRY DEVELOPMENT 3 28% 1% 9 Search DRY+DEVELOPMENT Search DRY+DEVELOPMENT
5 ALKALINE DEVELOPMENT 2 67% 0% 2 Search ALKALINE+DEVELOPMENT Search ALKALINE+DEVELOPMENT
6 EPOXYSTYRENE 2 67% 0% 2 Search EPOXYSTYRENE Search EPOXYSTYRENE
7 NOVOLAC RESIST 2 67% 0% 2 Search NOVOLAC+RESIST Search NOVOLAC+RESIST
8 PRE EXPOSURE SILYLATION 2 67% 0% 2 Search PRE+EXPOSURE+SILYLATION Search PRE+EXPOSURE+SILYLATION
9 GEL DEGRADATION 2 50% 0% 3 Search GEL+DEGRADATION Search GEL+DEGRADATION
10 HALFTONE MASK 2 50% 0% 3 Search HALFTONE+MASK Search HALFTONE+MASK

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 DRY DEVELOPMENT 8 75% 0% 6
2 RADIATION CHEMICAL YIELDS 8 100% 0% 5
3 SI CONTAINING COPOLYMER 6 100% 0% 4
4 RESIST SYSTEMS 4 75% 0% 3
5 CHLOROMETHYLSTYRENE 4 56% 0% 5
6 CHLORINATED POLYMETHYLSTYRENE 3 100% 0% 3
7 LITHOGRAPHIC PROPERTIES 3 100% 0% 3
8 O 2 SO2 PLASMA 3 100% 0% 3
9 PHENYL ISOPROPENYL KETONE 3 100% 0% 3
10 PHASE SILYLATION 2 36% 0% 4

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
POLYMER MATERIALS FOR MICROLITHOGRAPHY 1989 126 72 78%
RESISTS FOR MICROLITHOGRAPHY - PRESENT STATUS AND RECENT RESEARCH TRENDS 1992 15 77 75%
A REVIEW OF EXCIMER LASER PROJECTION LITHOGRAPHY 1988 55 39 31%
LITHOGRAPHIC RESIST MATERIALS CHEMISTRY 1993 9 77 53%
NOVEL ANALYTIC METHOD OF PHOTOINDUCED ACID GENERATION AND EVIDENCE OF PHOTOSENSITIZATION VIA MATRIX RESIN 1994 4 2 100%
Silicon-containing block copolymer resist materials 1995 11 18 56%
A PERSPECTIVE ON RESIST MATERIALS FOR FINE-LINE LITHOGRAPHY 1984 44 37 86%
POLYMER MATERIALS FOR MICROLITHOGRAPHY 1987 13 87 84%
PHOTORESIST SYSTEMS FOR MICROLITHOGRAPHY 1988 10 23 83%
ORGANOSILICON POLYMERS FOR MICROLITHOGRAPHIC APPLICATIONS 1990 7 20 75%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 3D MICRO NANO STRUCT 1 50% 0.1% 1
2 POST COURSES FUNCT CONTROL SYST 1 29% 0.2% 2
3 EP 2073 0 20% 0.1% 1
4 SOLID STATE DEV 0 17% 0.1% 1
5 SOLID STATE S 0 17% 0.1% 1
6 FTM ADV RD 0 11% 0.1% 1
7 ABSRD ECB RT 0 100% 0.1% 1
8 BEREICH MAKROMOL VERBINDUNGEN 0 100% 0.1% 1
9 CHEM PL CHEM YAMADAOKA 0 100% 0.1% 1
10 CHEM SM MCELVAIN ORGAN CHEM 0 100% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000153770 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY//LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESISTS
2 0.0000116545 POLY1 BUTENE SULFONE//POLY2 METHYL 1 PENTENE SULFONE//POLYACRYLAMIDE SULFONE
3 0.0000101076 PHOTOMASK//IC EQUIPMENT//PROXIMITY EFFECT CORRECTION
4 0.0000078572 OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//BOTTOM ANTIREFLECTIVE COATINGS
5 0.0000078012 PHOTOBASE GENERATOR//BASE AMPLIFIER//BASE PROLIFERATION REACTION
6 0.0000070570 X RAY MASK//SUPER FINE SR LITHOG//X RAY LITHOGRAPHY
7 0.0000064294 WET OZONE//PHOTORESIST REMOVAL//RESIST REMOVAL
8 0.0000063411 CONE DEFECT//DYED RESIST//NITRIDE BUBBLES
9 0.0000060196 LADDER SILICONE SPIN ON GLASS LS SOG//POLYSILOXENE BASED FILM//SIO2 PATTERN GENERATION
10 0.0000058246 BEAM SPILL//HYDROGEN ION BEAM//POLYLACTATURETHANE