Class information for:
Level 1: MICROCRYSTALLINE SILICON//SID PHYS DEVICES//MU C SI H

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
685 3094 20.3 72%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
252 19240 MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//PHOTOVOLTA THIN FILM ELECT

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 MICROCRYSTALLINE SILICON Author keyword 405 69% 11% 347
2 SID PHYS DEVICES Address 99 86% 2% 50
3 MU C SI H Author keyword 50 81% 1% 30
4 ENERGY UNIT Address 45 37% 3% 97
5 HOT WIRE CVD Author keyword 44 48% 2% 68
6 NANOCRYSTALLINE SILICON Author keyword 42 33% 3% 105
7 VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Author keyword 38 93% 0% 14
8 HOT WIRE CHEMICAL VAPOR DEPOSITION Author keyword 36 47% 2% 56
9 PHYS INTER ES COUCHES MINCES Address 33 26% 4% 109
10 UMR 7647 Address 32 32% 3% 84

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 MICROCRYSTALLINE SILICON 405 69% 11% 347 Search MICROCRYSTALLINE+SILICON Search MICROCRYSTALLINE+SILICON
2 MU C SI H 50 81% 1% 30 Search MU+C+SI++H Search MU+C+SI++H
3 HOT WIRE CVD 44 48% 2% 68 Search HOT+WIRE+CVD Search HOT+WIRE+CVD
4 NANOCRYSTALLINE SILICON 42 33% 3% 105 Search NANOCRYSTALLINE+SILICON Search NANOCRYSTALLINE+SILICON
5 VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 38 93% 0% 14 Search VERY+HIGH+FREQUENCY+PLASMA+ENHANCED+CHEMICAL+VAPOR+DEPOSITION Search VERY+HIGH+FREQUENCY+PLASMA+ENHANCED+CHEMICAL+VAPOR+DEPOSITION
6 HOT WIRE CHEMICAL VAPOR DEPOSITION 36 47% 2% 56 Search HOT+WIRE+CHEMICAL+VAPOR+DEPOSITION Search HOT+WIRE+CHEMICAL+VAPOR+DEPOSITION
7 HYDROGENATED MICROCRYSTALLINE SILICON 27 74% 1% 20 Search HYDROGENATED+MICROCRYSTALLINE+SILICON Search HYDROGENATED+MICROCRYSTALLINE+SILICON
8 VHFPECVD 21 90% 0% 9 Search VHFPECVD Search VHFPECVD
9 SIH2CL2 21 65% 1% 20 Search SIH2CL2 Search SIH2CL2
10 INCUBATION LAYER 21 85% 0% 11 Search INCUBATION+LAYER Search INCUBATION+LAYER

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 MICROCRYSTALLINE SILICON 442 47% 22% 692
2 AMORPHOUS SILICON 76 12% 20% 617
3 C SI H 46 70% 1% 38
4 DEVICE QUALITY 45 66% 1% 42
5 HIGH RATE GROWTH 42 59% 2% 48
6 HYDROGEN DILUTION 41 51% 2% 57
7 HYDROGENATED AMORPHOUS SILICON 40 14% 9% 268
8 A SI H 36 14% 7% 232
9 INTRINSIC MICROCRYSTALLINE SILICON 35 86% 1% 18
10 SI H 27 19% 4% 133

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Hot Wire Chemical Vapor Deposition Chemistry in the Gas Phase and on the Catalyst Surface with Organosilicon Compounds 2015 1 39 44%
Low temperature polycrystalline silicon: a review on deposition, physical properties and solar cell applications 2003 117 105 87%
Review of thin-film silicon deposition techniques for high-efficiency solar cells developed at Panasonic/Sanyo 2013 7 19 58%
Thin-film silicon - Growth process and solar cell application 2004 106 35 49%
Formation of silicon-based thin films prepared by catalytic chemical vapor deposition (Cat-CVD) method 1998 148 29 62%
Percolation and tunneling in composite materials 2004 91 74 47%
Photovoltaic Properties of a-Si:H Films Grown by Plasma Enhanced Chemical Vapor Deposition: A Review 2012 9 79 41%
Limiting factors in the fabrication of microcrystalline silicon solar cells and microcrystalline/amorphous ('micromorph') tandems 2009 13 63 60%
Advances in plasma-enhanced chemical vapor deposition of silicon films at low temperatures 2002 41 31 61%
Microscopic and macroscopic manifestations of percolation transitions in a semiconductor composite 2009 7 105 59%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SID PHYS DEVICES 99 86% 1.6% 50
2 ENERGY UNIT 45 37% 3.1% 97
3 PHYS INTER ES COUCHES MINCES 33 26% 3.5% 109
4 UMR 7647 32 32% 2.7% 84
5 PHOTOVOLTAIK 26 52% 1.1% 35
6 OPT TECHNOL LASER CONTROLLED PROC 21 90% 0.3% 9
7 PHOTOELECT THIN FILM DEVICES TECH 15 46% 0.8% 24
8 THIN FILM SILICON SOLAR CELLS SUPER 14 60% 0.5% 15
9 PHOTOELECT THIN FILM DEVICES TECH TIANJ 12 47% 0.6% 18
10 IEK PHOTOVOLTA 5 8 36% 0.5% 17

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000249636 SIH2//SIH3//SILANE PLASMA
2 0.0000143188 CHARGED NANOPARTICLES//SASAKI TEAM//MICROSTRUCT SCI MAT
3 0.0000142070 GENIE ELECT PARISCNRS UMR 8507//SILICON HETEROJUNCTION SOLAR CELLS//PHOTOVOLTA THIN FILM ELECT
4 0.0000111203 LIGHT TRAPPING//PHOTOVOLTA THIN FILM ELECT//BACK REFLECTOR
5 0.0000096428 DUST PARTICLE GROWTH//CNRS LPICM//PARTICLE CHARGE DISTRIBUTION
6 0.0000095900 STAEBLER WRONSKI EFFECT//HYDROGENATED AMORPHOUS SILICON//SOLAR CELLS
7 0.0000095299 AMORPHOUS SILICON CARBIDE//SILICON CARBON ALLOYS//A SIC H
8 0.0000094991 METAL INDUCED CRYSTALLIZATION//SOLID PHASE CRYSTALLIZATION//METAL INDUCED LATERAL CRYSTALLIZATION
9 0.0000094731 GERMANIUM CARBON//A SIGE//GE1 XCX
10 0.0000069476 LADDER SILICONE SPIN ON GLASS LS SOG//POLYSILOXENE BASED FILM//SIO2 PATTERN GENERATION