Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
6224 | 1448 | 17.5 | 54% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
138 | 22619 | IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | SONOS | Author keyword | 122 | 65% | 8% | 115 |
2 | CHARGE TRAPPING LAYER | Author keyword | 41 | 90% | 1% | 18 |
3 | FLASH MEMORY | Author keyword | 36 | 20% | 12% | 167 |
4 | NROM | Author keyword | 35 | 76% | 2% | 25 |
5 | NAND FLASH MEMORY | Author keyword | 33 | 32% | 6% | 87 |
6 | SILICON OXIDE NITRIDE OXIDE SILICON SONOS | Author keyword | 29 | 72% | 2% | 23 |
7 | 2 BIT CELL | Author keyword | 27 | 92% | 1% | 11 |
8 | FLASH MEMORIES | Author keyword | 24 | 32% | 4% | 64 |
9 | TANOS | Author keyword | 22 | 66% | 1% | 21 |
10 | FLASH DESIGN TEAM | Address | 21 | 90% | 1% | 9 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | SONOS | 122 | 65% | 8% | 115 | Search SONOS | Search SONOS |
2 | CHARGE TRAPPING LAYER | 41 | 90% | 1% | 18 | Search CHARGE+TRAPPING+LAYER | Search CHARGE+TRAPPING+LAYER |
3 | FLASH MEMORY | 36 | 20% | 12% | 167 | Search FLASH+MEMORY | Search FLASH+MEMORY |
4 | NROM | 35 | 76% | 2% | 25 | Search NROM | Search NROM |
5 | NAND FLASH MEMORY | 33 | 32% | 6% | 87 | Search NAND+FLASH+MEMORY | Search NAND+FLASH+MEMORY |
6 | SILICON OXIDE NITRIDE OXIDE SILICON SONOS | 29 | 72% | 2% | 23 | Search SILICON+OXIDE+NITRIDE+OXIDE+SILICON+SONOS | Search SILICON+OXIDE+NITRIDE+OXIDE+SILICON+SONOS |
7 | 2 BIT CELL | 27 | 92% | 1% | 11 | Search 2+BIT+CELL | Search 2+BIT+CELL |
8 | FLASH MEMORIES | 24 | 32% | 4% | 64 | Search FLASH+MEMORIES | Search FLASH+MEMORIES |
9 | TANOS | 22 | 66% | 1% | 21 | Search TANOS | Search TANOS |
10 | CHARGE TRAPPING MEMORY | 19 | 63% | 1% | 19 | Search CHARGE+TRAPPING+MEMORY | Search CHARGE+TRAPPING+MEMORY |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SONOS | 125 | 72% | 7% | 97 |
2 | NROM | 50 | 72% | 3% | 39 |
3 | FLASH MEMORY | 49 | 32% | 9% | 126 |
4 | SONOS MEMORY | 37 | 81% | 2% | 22 |
5 | ERASE | 15 | 67% | 1% | 14 |
6 | BLOCKING OXIDE | 15 | 88% | 0% | 7 |
7 | DATA RETENTION CHARACTERISTICS | 12 | 58% | 1% | 14 |
8 | CHARGE RETENTION | 12 | 56% | 1% | 15 |
9 | NAND FLASH | 12 | 59% | 1% | 13 |
10 | PROGRAMMING SCHEME | 11 | 100% | 0% | 6 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Future Prospects of NAND Flash Memory Technology-The Evolution from Floating Gate to Charge Trapping to 3D Stacking | 2012 | 27 | 1 | 100% |
Review on Non-Volatile Memory with High-k Dielectrics: Flash for Generation Beyond 32 nm | 2014 | 4 | 43 | 49% |
Electronic structure of silicon dioxide (a review) | 2014 | 3 | 29 | 31% |
Threshold Voltage Instability Mechanisms of Nitride Based Charge Trap Flash Memory-A Review | 2014 | 1 | 51 | 59% |
Perspective of flash memory realized on vertical Si nanowires | 2012 | 3 | 14 | 71% |
The Floating-Gate Non-Volatile Semiconductor Memory-From Invention to the Digital Age | 2012 | 7 | 5 | 40% |
The Impact of Tunnel Oxide Nitridation to Reliability Performance of Charge Storage Non-Volatile Memory Devices | 2014 | 1 | 85 | 32% |
NAND flash memory technology utilizing fringing electric field | 2012 | 1 | 10 | 70% |
Overview of emerging nonvolatile memory technologies | 2014 | 2 | 82 | 17% |
Technical Solutions to Mitigate Reliability Challenges due to Technology Scaling of Charge Storage NVM | 2013 | 0 | 53 | 38% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | FLASH DESIGN TEAM | 21 | 90% | 0.6% | 9 |
2 | EMERGING CENT | 12 | 54% | 1.0% | 15 |
3 | MEMORY BUSINESS | 9 | 48% | 1.0% | 14 |
4 | RD TECHNOL DEV | 6 | 40% | 0.8% | 12 |
5 | NVM TEAM | 6 | 100% | 0.3% | 4 |
6 | PROD QUAL ASSURANCE TEAM | 6 | 100% | 0.3% | 4 |
7 | TU PT | 6 | 100% | 0.3% | 4 |
8 | MOBILE FLASH | 4 | 67% | 0.3% | 4 |
9 | MEMORY TECHNOL | 4 | 75% | 0.2% | 3 |
10 | MEMORY PROD GRP | 4 | 36% | 0.6% | 8 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000175556 | GE NANOCRYSTALS//NANO FLOATING GATE MEMORY//NANOCRYSTAL MEMORY |
2 | 0.0000160977 | POLYOXIDE//INTERPOLY OXIDE//NONPLANAR POLYOXIDE |
3 | 0.0000159602 | CHARGE PUMP//SWITCHED CAPACITOR SC CONVERTER//SWITCHED CAPACITOR SC CONVERTERS |
4 | 0.0000108923 | ANTIFUSE//SOURCE GATED TRANSISTOR SGT//MULTITIME PROGRAMMABLE MTP |
5 | 0.0000102463 | BACK BIAS EFFECT//VERTICAL MOSFET//SURROUNDING GATE TRANSISTOR |
6 | 0.0000089667 | STRESS INDUCED LEAKAGE CURRENT//SOFT BREAKDOWN//DIELECTRIC BREAKDOWN BD |
7 | 0.0000083129 | SINGLE EVENT BURNOUT SEB//SINGLE EVENT GATE RUPTURE SEGR//RREACT GRP |
8 | 0.0000078599 | BCDMOS//HIGH SIDE//MULTIPLE CHANNEL FET |
9 | 0.0000067827 | DEVICE MODELLING GRP//RANDOM DOPANT//DEVICE MODELING GRP |
10 | 0.0000064507 | HFO2//HIGH K//METAL GATE |