Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
6115 | 1463 | 19.4 | 64% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
252 | 19240 | MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//PHOTOVOLTA THIN FILM ELECT |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | AMORPHOUS SILICON CARBIDE | Author keyword | 26 | 49% | 3% | 38 |
2 | SILICON CARBON ALLOYS | Author keyword | 19 | 71% | 1% | 15 |
3 | A SIC H | Author keyword | 9 | 52% | 1% | 12 |
4 | HYDROGENATED AMORPHOUS SILICON CARBIDE | Author keyword | 6 | 58% | 0% | 7 |
5 | AMORPHOUS SILICON CARBIDE A SIC H | Author keyword | 6 | 100% | 0% | 4 |
6 | MICROCRYSTALLINE SILICON CARBON | Author keyword | 6 | 100% | 0% | 4 |
7 | HWCVD | Author keyword | 5 | 22% | 1% | 21 |
8 | MICROCRYSTALLINE SILICON CARBIDE | Author keyword | 4 | 67% | 0% | 4 |
9 | AMORPHOUS HYDROGENATED SILICON CARBIDE | Author keyword | 4 | 75% | 0% | 3 |
10 | C SIC FILMS | Author keyword | 4 | 75% | 0% | 3 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SILICON CARBON ALLOYS | 75 | 74% | 4% | 56 |
2 | CARBON ALLOYS | 74 | 67% | 5% | 67 |
3 | AMORPHOUS SILICON CARBIDE | 65 | 61% | 5% | 69 |
4 | A SI1 XCX H | 48 | 73% | 3% | 37 |
5 | CARBON ALLOY FILMS | 37 | 100% | 1% | 14 |
6 | A SIC H | 26 | 64% | 2% | 25 |
7 | SIXC1 X | 18 | 89% | 1% | 8 |
8 | A SI1 XCX H THIN FILMS | 17 | 100% | 1% | 8 |
9 | SIC H FILMS | 16 | 52% | 2% | 22 |
10 | SIC H | 12 | 42% | 2% | 23 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
PHYSICS OF AMORPHOUS-SILICON CARBON ALLOYS | 1987 | 357 | 133 | 57% |
Semiconductors for optical memories | 2002 | 5 | 4 | 75% |
Optical properties of hydrogenated amorphous silicon carbide films | 2000 | 0 | 32 | 88% |
LASER-INDUCED CHEMICAL-VAPOR-DEPOSITION OF SILICON-CARBIDE | 1994 | 0 | 36 | 22% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | CNISM UNITA N OLI | 4 | 75% | 0.2% | 3 |
2 | COMPLESSO UNIV MSA | 2 | 36% | 0.3% | 5 |
3 | TECNOSUD RAMBLA THERMODYNAM | 2 | 67% | 0.1% | 2 |
4 | NUCL MICROSCOPE | 1 | 38% | 0.2% | 3 |
5 | POSITRON BEAM | 1 | 50% | 0.1% | 2 |
6 | SOLID STATE PHYS THIN FILMS | 1 | 50% | 0.1% | 2 |
7 | ENVIRONM RENEWABLE ENERGY SYST | 1 | 10% | 0.8% | 12 |
8 | MAT SCI MAT ENGN | 1 | 27% | 0.2% | 3 |
9 | AG MAT PHYS | 1 | 33% | 0.1% | 2 |
10 | QUANTUM NANOELE ON | 1 | 33% | 0.1% | 2 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000202878 | SILICON CARBONITRIDE//SILICON CARBON NITRIDE//SILICON CARBONITRIDE FILM |
2 | 0.0000173507 | GERMANIUM CARBON//A SIGE//GE1 XCX |
3 | 0.0000172990 | 3C SIC//FG NANOTECHNOL//HOLLOW VOID |
4 | 0.0000102479 | ELECTRON BEAM ANNEALING//RAFTER//ION BEAM SYNTHESIS IBS |
5 | 0.0000095299 | MICROCRYSTALLINE SILICON//SID PHYS DEVICES//MU C SI H |
6 | 0.0000090817 | ELECT TELECOMMUN COMP//IMAGE ACQUISITION AND REPRESENTATION//MULTISPECTRAL STRUCTURES |
7 | 0.0000084285 | A SIH A SIGEH//AMORPHOUS SILICON BASED ALLOY//DIP SCI MAT TERRA |
8 | 0.0000082856 | STAEBLER WRONSKI EFFECT//HYDROGENATED AMORPHOUS SILICON//SOLAR CELLS |
9 | 0.0000082581 | SIH2//SIH3//SILANE PLASMA |
10 | 0.0000079678 | GENIE ELECT PARISCNRS UMR 8507//SILICON HETEROJUNCTION SOLAR CELLS//PHOTOVOLTA THIN FILM ELECT |