Class information for:
Level 1: EXCIMER LASER CRYSTALLIZATION//LASER CRYSTALLIZATION//EXCIMER LASER ANNEALING

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
5965 1482 18.1 63%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
993 9970 THIN FILM TRANSISTOR//THIN FILM TRANSISTORS TFTS//THIN FILM TRANSISTOR TFT

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 EXCIMER LASER CRYSTALLIZATION Author keyword 61 70% 3% 50
2 LASER CRYSTALLIZATION Author keyword 46 53% 4% 62
3 EXCIMER LASER ANNEALING Author keyword 28 41% 4% 54
4 SEMICOND ELECT INTEGRAT SCI Address 20 56% 2% 25
5 POLYCRYSTALLINE SILICON Author keyword 15 14% 6% 95
6 FLASH LAMP ANNEALING Author keyword 15 47% 2% 23
7 POLY SI Author keyword 13 19% 4% 63
8 LOCATION CONTROL Author keyword 11 67% 1% 10
9 MELT DURATION Author keyword 8 75% 0% 6
10 SECONDARY GRAIN GROWTH Author keyword 8 75% 0% 6

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 EXCIMER LASER CRYSTALLIZATION 61 70% 3% 50 Search EXCIMER+LASER+CRYSTALLIZATION Search EXCIMER+LASER+CRYSTALLIZATION
2 LASER CRYSTALLIZATION 46 53% 4% 62 Search LASER+CRYSTALLIZATION Search LASER+CRYSTALLIZATION
3 EXCIMER LASER ANNEALING 28 41% 4% 54 Search EXCIMER+LASER+ANNEALING Search EXCIMER+LASER+ANNEALING
4 POLYCRYSTALLINE SILICON 15 14% 6% 95 Search POLYCRYSTALLINE+SILICON Search POLYCRYSTALLINE+SILICON
5 FLASH LAMP ANNEALING 15 47% 2% 23 Search FLASH+LAMP+ANNEALING Search FLASH+LAMP+ANNEALING
6 POLY SI 13 19% 4% 63 Search POLY+SI Search POLY+SI
7 LOCATION CONTROL 11 67% 1% 10 Search LOCATION+CONTROL Search LOCATION+CONTROL
8 MELT DURATION 8 75% 0% 6 Search MELT+DURATION Search MELT+DURATION
9 SECONDARY GRAIN GROWTH 8 75% 0% 6 Search SECONDARY+GRAIN+GROWTH Search SECONDARY+GRAIN+GROWTH
10 HYDROGEN MODULATION DOPED AMORPHOUS SILICON 8 100% 0% 5 Search HYDROGEN+MODULATION+DOPED+AMORPHOUS+SILICON Search HYDROGEN+MODULATION+DOPED+AMORPHOUS+SILICON

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SI FILMS 41 35% 6% 95
2 EXCIMER LASER CRYSTALLIZATION 40 54% 4% 52
3 EXPLOSIVE CRYSTALLIZATION 36 52% 3% 49
4 POLY SI TFTS 30 33% 5% 75
5 PRESSURE H2O VAPOR 26 69% 1% 22
6 LATERAL GRAIN GROWTH 21 75% 1% 15
7 SUPER LATERAL GROWTH 17 79% 1% 11
8 MOLTEN LAYERS 14 100% 0% 7
9 TFTS 12 12% 6% 93
10 A SI FILMS 11 67% 1% 10

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
Polysilicon thin-film transistors on polymer substrates 2012 10 48 50%
EXCIMER LASER CRYSTALLIZATION AND NANOSTRUCTURING OF AMORPHOUS SILICON FOR PHOTOVOLTAIC APPLICATIONS 2008 4 50 84%
Heat transfer and phase transformations in laser annealing of thin Si films 2002 13 23 83%
Technological Innovation of Thin-Film Transistors: Technology Development, History, and Future 2012 4 17 35%
THE AMORPHOUS TO CRYSTALLINE PHASE-TRANSITION AND VICE-VERSA 1995 0 65 26%
COMPUTER-AIDED CALCULATION OF THE ABERRATION COEFFICIENTS OF MICROWAVE CAVITY LENSES .1. PRIMARY (2ND-ORDER) ABERRATIONS 1983 1 3 100%
SHOCK CRYSTALLIZATION OF FILMS 1983 3 5 80%
LASER EPITAXY OF MATERIALS FOR ELECTRONICS 1984 4 34 53%
ION-BEAM-INDUCED AND LASER-INDUCED SURFACE MODIFICATIONS 1985 24 52 6%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SEMICOND ELECT INTEGRAT SCI 20 56% 1.7% 25
2 NOVEL LASER TECH PLICAT SYST 6 80% 0.3% 4
3 DPTO MECAN MAQUINAS MOTO TERM FLUIDOS 6 100% 0.3% 4
4 MAT WISSEN MIKROCHARAKTERISIERUNG 4 75% 0.2% 3
5 ALTEDEC 3 100% 0.2% 3
6 PHYS FUNCT MAT SCI 3 100% 0.2% 3
7 ELECT COMPONENTS TECHNOL MAT 3 16% 1.1% 16
8 ELE ON TUBE DEVICES 2 38% 0.3% 5
9 TECHNOL PLATFORM 2 15% 0.9% 14
10 CIVIL ENGN PHYS 2 67% 0.1% 2

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000259089 POLY SI TFT//POLYCRYSTALLINE SILICON THIN FILM TRANSISTORS POLY SI TFTS//JOINT SCI TECHNOL
2 0.0000249187 METAL INDUCED CRYSTALLIZATION//SOLID PHASE CRYSTALLIZATION//METAL INDUCED LATERAL CRYSTALLIZATION
3 0.0000185488 EXCIMER LASER DOPING//LASER INDUCED SURFACE PROCESS//WIDE BANDGAP OXIDES
4 0.0000126624 ZONE MELTING RECRYSTALLIZATION//ARCHITECTURE TECH//LASER INDUCED TEMPERATURE RISE
5 0.0000094183 CROSS WAVES//KIRENSKI PHYS//SELF LIMITED GROWTH
6 0.0000076666 SPECIAL DESIGN TECHNOL BUR NAUKA//PHYS CHEM PROBLEMS CERAM//SORPTION ANALYSIS
7 0.0000067332 POLY SIGE//POLY SI1 XGEX//POLYCRYSTALLINE SILICON GERMANIUM
8 0.0000065510 IBIEC//SOLID PHASE EPITAXIAL GROWTH//LATERAL SOLID PHASE EPITAXY
9 0.0000059575 MICROCRYSTALLINE SILICON//SID PHYS DEVICES//MU C SI H
10 0.0000059106 INFNSEZ LECCE//FAST SIGNALS//FOCUSED ION BEAM IMAGING