Class information for:
Level 1: BORON PENETRATION//REMOTE PLASMA NITRIDATION RPN//SI NITRIDE

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
5427 1558 19.3 63%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
138 22619 IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 BORON PENETRATION Author keyword 31 58% 2% 35
2 REMOTE PLASMA NITRIDATION RPN Author keyword 9 83% 0% 5
3 SI NITRIDE Author keyword 8 75% 0% 6
4 SI OXYNITRIDE Author keyword 8 75% 0% 6
5 NITRIDED OXIDE Author keyword 7 48% 1% 11
6 OXYNITRIDATION Author keyword 6 50% 1% 9
7 OXYNITRIDE Author keyword 5 13% 3% 40
8 PLASMA OXYNITRIDATION Author keyword 4 75% 0% 3
9 TRENCH DRAM Author keyword 4 75% 0% 3
10 DECOUPLED PLASMA NITRIDATION Author keyword 4 56% 0% 5

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 BORON PENETRATION 31 58% 2% 35 Search BORON+PENETRATION Search BORON+PENETRATION
2 REMOTE PLASMA NITRIDATION RPN 9 83% 0% 5 Search REMOTE+PLASMA+NITRIDATION+RPN Search REMOTE+PLASMA+NITRIDATION+RPN
3 SI NITRIDE 8 75% 0% 6 Search SI+NITRIDE Search SI+NITRIDE
4 SI OXYNITRIDE 8 75% 0% 6 Search SI+OXYNITRIDE Search SI+OXYNITRIDE
5 NITRIDED OXIDE 7 48% 1% 11 Search NITRIDED+OXIDE Search NITRIDED+OXIDE
6 OXYNITRIDATION 6 50% 1% 9 Search OXYNITRIDATION Search OXYNITRIDATION
7 OXYNITRIDE 5 13% 3% 40 Search OXYNITRIDE Search OXYNITRIDE
8 PLASMA OXYNITRIDATION 4 75% 0% 3 Search PLASMA+OXYNITRIDATION Search PLASMA+OXYNITRIDATION
9 TRENCH DRAM 4 75% 0% 3 Search TRENCH+DRAM Search TRENCH+DRAM
10 DECOUPLED PLASMA NITRIDATION 4 56% 0% 5 Search DECOUPLED+PLASMA+NITRIDATION Search DECOUPLED+PLASMA+NITRIDATION

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 N2O AMBIENT 52 82% 2% 31
2 REOXIDIZED NITRIDED OXIDES 39 80% 2% 24
3 INTERFACIAL NITROGEN 38 93% 1% 14
4 BORON PENETRATION 36 52% 3% 49
5 RAPID THERMAL OXIDATION 28 54% 2% 37
6 NITRIDED OXIDE 24 91% 1% 10
7 OXIDE SI100 INTERFACE 23 86% 1% 12
8 NITRIDED OXIDES 20 63% 1% 20
9 INCORPORATED NITROGEN 18 89% 1% 8
10 OXIDIZING SI 17 79% 1% 11

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Ultrathin (< 4 nm) SiO2 and Si-O-N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits 2001 531 522 20%
Growth and characterization of ultrathin nitrided silicon oxide films 1999 133 121 60%
Atomic transport during growth of ultrathin dielectrics on silicon 1999 91 150 45%
Structure of silicon/oxide and nitride/oxide interfaces 2009 8 36 17%
On implant-based multiple gate oxide schemes for system-on-chip integration 2003 6 64 59%
PECVD based silicon oxynitride thin films for nano photonic on chip interconnects applications 2013 2 32 22%
Preparation of device-quality SiO2 thin films by remote plasma-enhanced chemical vapour deposition (PECVD): Applications in metal-oxide-semiconductor (MOS) devices 1996 14 27 63%
Structural characterization of crystalline and non-crystalline materials - A brief background of current requirements 2002 0 9 33%
Anomalous grazing-incidence X-ray reflection 2002 0 8 25%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 DIFFUS 4 46% 0.4% 6
2 LEMEAMED 2 43% 0.2% 3
3 PHYS CHEM SUR E INTER E 2 43% 0.2% 3
4 ADV LSI DEV 1 50% 0.1% 2
5 CHEM ENGN MC110 1 50% 0.1% 2
6 SOFTWARE ADV MAT PROC 1 100% 0.1% 2
7 WP ENGN DEV 1 50% 0.1% 2
8 MICROELECT MAT STRUCT 1 21% 0.3% 5
9 IIS B 1 40% 0.1% 2
10 SPA DEV ENGN 1 33% 0.1% 2

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000219329 POLYOXIDE//INTERPOLY OXIDE//NONPLANAR POLYOXIDE
2 0.0000157373 INTERFACIAL SILICON EMISSION//SILICON OXIDATION//LOW TEMPERATURE SILICON OXIDATION
3 0.0000148990 STRESS INDUCED LEAKAGE CURRENT//SOFT BREAKDOWN//DIELECTRIC BREAKDOWN BD
4 0.0000140085 SILICON OXYNITRIDE//SILICON NITRIDE FILMS//CONDUCTANCE TRANSIENTS
5 0.0000121280 SID4//DEUTERIUM D ANNEALING//TRAP CREATION
6 0.0000103896 DIRECT TUNNELING//QUANTUM MECHANICAL EFFECTS QMES//WAVE FUNCTION PENETRATION
7 0.0000098999 NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI//NEGATIVE BIAS TEMPERATURE INSTABILITY//CHRISTIAN DOPPLER TCAD
8 0.0000075896 POLY SIGE//POLY SI1 XGEX//POLYCRYSTALLINE SILICON GERMANIUM
9 0.0000074862 BULK AND INTERFACE STATES//NANO TRANSISTOR//VACANCY FORMATION ENERGY
10 0.0000074145 OXIDE TRAPPED CHARGE//ELDRS//TOTAL IONIZING DOSE