Class information for:
Level 1: TISI2//SALICIDE//NICKEL SILICIDE

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
531 3266 20.0 60%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
603 13298 BETA FESI2//SILICIDE//SILICIDES

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 TISI2 Author keyword 51 59% 2% 57
2 SALICIDE Author keyword 41 61% 1% 43
3 NICKEL SILICIDE Author keyword 37 37% 2% 80
4 SILICIDE Author keyword 28 20% 4% 127
5 NISI Author keyword 24 39% 2% 49
6 COSI2 Author keyword 22 44% 1% 38
7 TITANIUM SILICIDE Author keyword 19 38% 1% 41
8 NI SILICIDE Author keyword 19 46% 1% 31
9 COBALT SILICIDE Author keyword 19 43% 1% 34
10 SELF ALIGNED SILICIDE Author keyword 18 83% 0% 10

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 TISI2 51 59% 2% 57 Search TISI2 Search TISI2
2 SALICIDE 41 61% 1% 43 Search SALICIDE Search SALICIDE
3 NICKEL SILICIDE 37 37% 2% 80 Search NICKEL+SILICIDE Search NICKEL+SILICIDE
4 SILICIDE 28 20% 4% 127 Search SILICIDE Search SILICIDE
5 NISI 24 39% 2% 49 Search NISI Search NISI
6 COSI2 22 44% 1% 38 Search COSI2 Search COSI2
7 TITANIUM SILICIDE 19 38% 1% 41 Search TITANIUM+SILICIDE Search TITANIUM+SILICIDE
8 NI SILICIDE 19 46% 1% 31 Search NI+SILICIDE Search NI+SILICIDE
9 COBALT SILICIDE 19 43% 1% 34 Search COBALT+SILICIDE Search COBALT+SILICIDE
10 SELF ALIGNED SILICIDE 18 83% 0% 10 Search SELF+ALIGNED+SILICIDE Search SELF+ALIGNED+SILICIDE

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 TISI2 423 72% 10% 335
2 COSI2 107 40% 7% 213
3 C54 PHASE 103 97% 1% 30
4 C54 TISI2 102 100% 1% 30
5 C49 79 88% 1% 37
6 INTERPOSED LAYER 69 96% 1% 22
7 TITANIUM DISILICIDE 56 81% 1% 34
8 C49 TISI2 56 89% 1% 25
9 C49 TO C54 POLYMORPHIC TRANSFORMATION 52 100% 1% 18
10 111SI 51 52% 2% 69

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films 2006 62 72 83%
Silicides and ohmic contacts 1998 267 270 69%
Metal silicides in CMOS technology: Past, present, and future trends 2003 188 459 70%
SILICIDES FOR INTEGRATED-CIRCUITS - TISI2 AND COSI2 1993 270 141 80%
Formation and stability of silicides on polycrystalline silicon 1996 162 93 86%
In situ micro-Raman analysis and X-ray diffraction of nickel silicide thin films on silicon 2009 14 6 83%
Kinetics of formation of silicides: A review 1986 312 40 70%
SILICIDE THIN-FILMS AND THEIR APPLICATIONS IN MICROELECTRONICS 1995 118 29 55%
THIN-FILM COMPOUND PHASE-FORMATION SEQUENCE - AN EFFECTIVE HEAT OF FORMATION MODEL 1993 132 127 40%
Effect of a thin W, PtMo, and Zr interlayer on the thermal stability and electrical characteristics of NiSi 2007 8 7 100%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 VAKGROEP VASTE STOFWETEN PEN 12 86% 0.2% 6
2 VAKGRP VASTE STOFWETEN PEN 6 58% 0.2% 7
3 KRISTALLOG STUDIE VASTE STOF 4 67% 0.1% 4
4 VAKGRP VASTE STOF WETEN PEN 4 75% 0.1% 3
5 IMETEM 3 13% 0.7% 23
6 ST JEROME CASE 142 2 67% 0.1% 2
7 ELECT TECH TECHNOL 2 50% 0.1% 3
8 LSI PROD 2 50% 0.1% 3
9 IMM SEZ CATANIA 2 27% 0.2% 6
10 JARA FIT FUNDAMENTALS FUTURE INFORMAT TECHNOL 1 38% 0.1% 3

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000196852 VALENCE BAND DENSITY OF STATES//SURFACE MAGNETO OPTIC KERR EFFECT//METAL SEMICONDUCTOR THIN FILM
2 0.0000192573 INFNSEZ LECCE//FAST SIGNALS//FOCUSED ION BEAM IMAGING
3 0.0000156714 W TI THIN FILMS//WTI THIN FILMS//SURFACE LASER TREATMENT
4 0.0000147160 RECONFIGURABLE TRANSISTOR//RFET//SILICIDE NANOWIRES
5 0.0000134654 CROSS BRIDGE KELVIN RESISTOR CBKR//CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR
6 0.0000116667 SCHOTTKY BARRIER SB//DOPANT SEGREGATION DS//SCHOTTKY BARRIER SB MOSFET
7 0.0000113274 LASER MOL BEAM EPITAXY//PTSI//IRIDIUM SILICIDES
8 0.0000104902 CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK
9 0.0000084863 RU2SI3//OSSI2//CHROMIUM DISILICIDE
10 0.0000071331 ERBIUM SILICIDE//ERSI2//YTTRIUM SILICIDE