Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
5107 | 1603 | 22.6 | 52% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
886 | 10744 | SURFACE AND INTERFACE ANALYSIS//AUGER PHOTOELECTRON COINCIDENCE SPECTROSCOPY APECS//IMFP |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | OXYGEN BOMBARDMENT | Author keyword | 27 | 92% | 1% | 11 |
2 | STORING MATTER TECHNIQUE | Author keyword | 26 | 100% | 1% | 11 |
3 | SCI ANAL MAT SAM | Address | 26 | 55% | 2% | 32 |
4 | MRI MODEL | Author keyword | 19 | 63% | 1% | 19 |
5 | SURFACE TRANSIENT | Author keyword | 18 | 89% | 0% | 8 |
6 | DEPTH RESOLUTION | Author keyword | 17 | 29% | 3% | 50 |
7 | SPUTTER RATE | Author keyword | 15 | 82% | 1% | 9 |
8 | USEFUL YIELD | Author keyword | 12 | 59% | 1% | 13 |
9 | AES DEPTH PROFILING | Author keyword | 11 | 45% | 1% | 18 |
10 | SPUTTER DEPTH PROFILING | Author keyword | 9 | 45% | 1% | 15 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | OXYGEN BOMBARDMENT | 27 | 92% | 1% | 11 | Search OXYGEN+BOMBARDMENT | Search OXYGEN+BOMBARDMENT |
2 | STORING MATTER TECHNIQUE | 26 | 100% | 1% | 11 | Search STORING+MATTER+TECHNIQUE | Search STORING+MATTER+TECHNIQUE |
3 | MRI MODEL | 19 | 63% | 1% | 19 | Search MRI+MODEL | Search MRI+MODEL |
4 | SURFACE TRANSIENT | 18 | 89% | 0% | 8 | Search SURFACE+TRANSIENT | Search SURFACE+TRANSIENT |
5 | DEPTH RESOLUTION | 17 | 29% | 3% | 50 | Search DEPTH+RESOLUTION | Search DEPTH+RESOLUTION |
6 | SPUTTER RATE | 15 | 82% | 1% | 9 | Search SPUTTER+RATE | Search SPUTTER+RATE |
7 | USEFUL YIELD | 12 | 59% | 1% | 13 | Search USEFUL+YIELD | Search USEFUL+YIELD |
8 | AES DEPTH PROFILING | 11 | 45% | 1% | 18 | Search AES+DEPTH+PROFILING | Search AES+DEPTH+PROFILING |
9 | SPUTTER DEPTH PROFILING | 9 | 45% | 1% | 15 | Search SPUTTER+DEPTH+PROFILING | Search SPUTTER+DEPTH+PROFILING |
10 | CESIUM CLUSTERS | 9 | 83% | 0% | 5 | Search CESIUM+CLUSTERS | Search CESIUM+CLUSTERS |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | OXYGEN BOMBARDMENT | 35 | 89% | 1% | 16 |
2 | SAMPLE ROTATION | 33 | 46% | 3% | 54 |
3 | CESIUM BOMBARDMENT | 23 | 100% | 1% | 10 |
4 | O 2 BOMBARDMENT | 21 | 90% | 1% | 9 |
5 | SENSITIVE ANALYTICAL TECHNIQUE | 20 | 100% | 1% | 9 |
6 | SIMS | 18 | 12% | 9% | 139 |
7 | OXYGEN BOMBARDED SILICON | 17 | 100% | 0% | 8 |
8 | USEFUL YIELDS | 17 | 100% | 0% | 8 |
9 | IMPURITY LAYERS | 15 | 73% | 1% | 11 |
10 | IN SITU DEPOSITION | 15 | 73% | 1% | 11 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Unravelling the secrets of Cs controlled secondary ion formation: Evidence of the dominance of site specific surface chemistry, alloying and ionic bonding | 2013 | 12 | 301 | 38% |
Sputter depth profile analysis of interfaces | 1998 | 115 | 133 | 62% |
ULTRA-SHALLOW DOPING PROFILING WITH SIMS | 1995 | 98 | 113 | 50% |
COMPOSITIONAL DEPTH PROFILING BY SPUTTERING | 1991 | 62 | 86 | 62% |
CHARACTERIZATION OF SHARP INTERFACES AND DELTA-DOPED LAYERS IN SEMICONDUCTORS USING SECONDARY-ION MASS-SPECTROMETRY | 1994 | 28 | 61 | 69% |
EFFECTS OF CRYSTALLINITY ON DEPTH RESOLUTION IN SPUTTER DEPTH PROFILES | 1993 | 18 | 33 | 67% |
SIMS: from research to production control | 2003 | 7 | 19 | 74% |
OPTIMIZATION OF SECONDARY-ION MASS-SPECTROMETRY FOR QUANTITATIVE TRACE ANALYSIS | 1994 | 18 | 31 | 58% |
SURFACE AND DEPTH ANALYSIS BASED ON SPUTTERING | 1991 | 44 | 208 | 48% |
High-depth-resolution Auger depth profiling atomic mixing | 1999 | 5 | 41 | 51% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SCI ANAL MAT SAM | 26 | 55% | 2.0% | 32 |
2 | ADV SIMS PROJECT | 9 | 83% | 0.3% | 5 |
3 | ADV SIMS PROJECTS | 9 | 67% | 0.5% | 8 |
4 | SPDT | 3 | 40% | 0.4% | 6 |
5 | SCI ANAL MAT | 3 | 17% | 0.9% | 15 |
6 | ANAL MAT | 2 | 23% | 0.6% | 9 |
7 | ANALYSE MAT | 2 | 67% | 0.1% | 2 |
8 | SUR E ENGN OPTOELECT F4 | 2 | 50% | 0.2% | 3 |
9 | NANO SUR E GRP | 2 | 16% | 0.6% | 10 |
10 | ANALYT RUMENTAT IL | 2 | 14% | 0.7% | 11 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000207749 | SUR E THIN FILM ANAL IFOS//SNMS//POST IONIZATION |
2 | 0.0000160074 | CONICAL PROTRUSION//FINE PROTRUSION//STRIPE RIB |
3 | 0.0000141404 | SIMS MICROSCOPY//ION MICROSCOPY//ANALYTICAL ION MICROSCOPY |
4 | 0.0000130014 | ION SPUTTERING//HBEREICH AUTOMATISIERUNG INFORMAT//ION EROSION |
5 | 0.0000116791 | LINEAR LEAST SQUARES FITTING//LINEAR LEAST SQUARE FIT//LINEAR LEAST SQUARE METHOD |
6 | 0.0000114335 | KINETIC EXCITATION//ION PHOTON EMISSION//NON ADDITIVE SPUTTERING |
7 | 0.0000091427 | HELLANDITE//OKANOGANITE Y//REE BOROSILICATE |
8 | 0.0000071099 | HONG KONG BEIJING JOINT//MATEMATYKI FIZYKI//GEN LASER PHYS |
9 | 0.0000068497 | MOLECULAR DEPTH PROFILING//CLUSTER SIMS//ION BEAM ENGN EXPT |
10 | 0.0000066984 | IMFP//ELASTIC PEAK ELECTRON SPECTROSCOPY//SURFACE EXCITATION |