Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
3587 | 1876 | 19.7 | 63% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1236 | 8540 | IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL//SURFACE ACOUSTIC WAVE//PIEZOELECT DEVICE |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | ALUMINUM NITRIDE | Author keyword | 38 | 18% | 10% | 196 |
2 | FILM BULK ACOUSTIC RESONATOR | Author keyword | 27 | 78% | 1% | 18 |
3 | ALUMINIUM NITRIDE | Author keyword | 26 | 26% | 4% | 84 |
4 | FILM BULK ACOUSTIC RESONATOR FBAR | Author keyword | 21 | 78% | 1% | 14 |
5 | ALN | Author keyword | 17 | 12% | 7% | 135 |
6 | FBAR | Author keyword | 16 | 28% | 3% | 47 |
7 | ALN FILMS | Author keyword | 15 | 62% | 1% | 16 |
8 | ALN FILM | Author keyword | 13 | 51% | 1% | 18 |
9 | ALN THIN FILM | Author keyword | 13 | 51% | 1% | 18 |
10 | ALN THIN FILMS | Author keyword | 12 | 58% | 1% | 14 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | ALUMINUM NITRIDE | 38 | 18% | 10% | 196 | Search ALUMINUM+NITRIDE | Search ALUMINUM+NITRIDE |
2 | FILM BULK ACOUSTIC RESONATOR | 27 | 78% | 1% | 18 | Search FILM+BULK+ACOUSTIC+RESONATOR | Search FILM+BULK+ACOUSTIC+RESONATOR |
3 | ALUMINIUM NITRIDE | 26 | 26% | 4% | 84 | Search ALUMINIUM+NITRIDE | Search ALUMINIUM+NITRIDE |
4 | FILM BULK ACOUSTIC RESONATOR FBAR | 21 | 78% | 1% | 14 | Search FILM+BULK+ACOUSTIC+RESONATOR+FBAR | Search FILM+BULK+ACOUSTIC+RESONATOR+FBAR |
5 | ALN | 17 | 12% | 7% | 135 | Search ALN | Search ALN |
6 | FBAR | 16 | 28% | 3% | 47 | Search FBAR | Search FBAR |
7 | ALN FILMS | 15 | 62% | 1% | 16 | Search ALN+FILMS | Search ALN+FILMS |
8 | ALN FILM | 13 | 51% | 1% | 18 | Search ALN+FILM | Search ALN+FILM |
9 | ALN THIN FILM | 13 | 51% | 1% | 18 | Search ALN+THIN+FILM | Search ALN+THIN+FILM |
10 | ALN THIN FILMS | 12 | 58% | 1% | 14 | Search ALN+THIN+FILMS | Search ALN+THIN+FILMS |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | AIN FILMS | 114 | 83% | 3% | 64 |
2 | ALUMINUM NITRIDE FILMS | 52 | 50% | 4% | 75 |
3 | AIN | 51 | 27% | 9% | 163 |
4 | ALUMINUM NITRIDE | 45 | 15% | 14% | 271 |
5 | ALN THIN FILMS | 39 | 45% | 4% | 66 |
6 | ALN FILMS | 35 | 42% | 4% | 66 |
7 | FBAR | 21 | 71% | 1% | 17 |
8 | BAW RESONATORS | 17 | 63% | 1% | 17 |
9 | NITRIDE THIN FILMS | 14 | 12% | 6% | 110 |
10 | FBARS | 14 | 100% | 0% | 7 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Development of piezoelectric thin film resonator and its impact on future wireless communication systems | 2005 | 52 | 6 | 100% |
Piezoelectric microelectromechanical resonant sensors for chemical and biological detection | 2012 | 22 | 63 | 44% |
Wide bandgap semiconductor thin films for piezoelectric and piezoresistive MEMS sensors applied at high temperatures: an overview | 2014 | 3 | 51 | 29% |
Nitriding of 6061T6 aluminium by plasma immersion ion implantation at low energy | 2010 | 1 | 4 | 75% |
Nitriding of 6061T6 aluminium by plasma immersion ion implantation at low energy | 2010 | 0 | 4 | 75% |
Deposition of aluminum nitride thin film on Si(111) by KrF excimer laser and its characterizations | 2008 | 3 | 17 | 29% |
Application of Fourier transform infrared spectroscopy to nanostructured materials surface characterization - Study of an aluminum nitride powder prepared via chemical synthesis | 1996 | 1 | 22 | 32% |
Filament-activated chemical vapour deposition of nitride thin films | 1996 | 2 | 36 | 22% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | COMMON COURSE | 7 | 57% | 0.4% | 8 |
2 | QINGDAO TERAHERTZ TECHNOL | 6 | 35% | 0.8% | 15 |
3 | GRP MICROSISTEMAS MAT ELECT | 5 | 50% | 0.4% | 7 |
4 | ON SITE SENSING DIAG | 4 | 38% | 0.5% | 9 |
5 | PHYS MILIEUX IONISES PLICAT | 4 | 20% | 1.0% | 19 |
6 | GMME CEMDATIC | 3 | 57% | 0.2% | 4 |
7 | ON SITE SENSING DIAGNOSIS | 3 | 42% | 0.3% | 5 |
8 | SENMC | 2 | 67% | 0.1% | 2 |
9 | UMR 7040 | 2 | 13% | 0.7% | 13 |
10 | IMRI | 2 | 22% | 0.4% | 7 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000134549 | UNIDIRECTIONAL TRANSDUCER//BGS WAVE//SAW GRATING REFLECTOR |
2 | 0.0000125356 | SCANDIUM NITRIDE//YN//TRAITEMENT SUR E SCI MAT |
3 | 0.0000097597 | ALUMINUM NITRIDE//ALN POWDER//ALN CERAMIC |
4 | 0.0000093443 | LIGAO2//AMORPHOUS GAN//NON POLAR NITRIDES |
5 | 0.0000088681 | SEMICONDUCTING ALUMINUM COMPOUNDS//CERAM OPERAT//ALGAN |
6 | 0.0000062187 | SI111 SUBSTRATES//SI111 SUBSTRATE//ALN BUFFER |
7 | 0.0000059751 | THERMOELASTIC DAMPING//MICROMECHANICAL RESONATOR//THERMOELASTIC DISSIPATION |
8 | 0.0000051481 | CUBIC GAN//FB PHYS 6//HEXAGONAL GAN |
9 | 0.0000043676 | MESOSCOP LOW DIMENS PHYS//ACOUSTOELECTRIC CURRENT//FILM BONDING |
10 | 0.0000040578 | LOVE WAVE//VACUUM MICROELECT//ST CUT QUARTZ |