Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
34663 | 66 | 17.4 | 50% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
2662 | 2955 | FYS CHEM//INERT SEMICONDUCTOR REDOX ELECTROLYTE//KINETICS OF REDOX REACTIONS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | RESIST SENSITIVITY | Author keyword | 1 | 12% | 6% | 4 |
2 | MATH CHEM ENGN | Address | 0 | 33% | 2% | 1 |
3 | RECTIFICATION PROPERTY | Author keyword | 0 | 25% | 2% | 1 |
4 | HEAT DEFORMATION | Author keyword | 0 | 20% | 2% | 1 |
5 | REDOX DEPOSITION | Author keyword | 0 | 20% | 2% | 1 |
6 | PHOTOCATALYTIC LITHOGRAPHY | Author keyword | 0 | 13% | 2% | 1 |
7 | SCAN EXPOSURE | Author keyword | 0 | 13% | 2% | 1 |
8 | ELECTRIC FIELD DEPENDENCE | Author keyword | 0 | 11% | 2% | 1 |
9 | REFLECTIVE MASK | Author keyword | 0 | 11% | 2% | 1 |
10 | ADSORPTION OF O 2 | Author keyword | 0 | 100% | 2% | 1 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | RESIST SENSITIVITY | 1 | 12% | 6% | 4 | Search RESIST+SENSITIVITY | Search RESIST+SENSITIVITY |
2 | RECTIFICATION PROPERTY | 0 | 25% | 2% | 1 | Search RECTIFICATION+PROPERTY | Search RECTIFICATION+PROPERTY |
3 | HEAT DEFORMATION | 0 | 20% | 2% | 1 | Search HEAT+DEFORMATION | Search HEAT+DEFORMATION |
4 | REDOX DEPOSITION | 0 | 20% | 2% | 1 | Search REDOX+DEPOSITION | Search REDOX+DEPOSITION |
5 | PHOTOCATALYTIC LITHOGRAPHY | 0 | 13% | 2% | 1 | Search PHOTOCATALYTIC+LITHOGRAPHY | Search PHOTOCATALYTIC+LITHOGRAPHY |
6 | SCAN EXPOSURE | 0 | 13% | 2% | 1 | Search SCAN+EXPOSURE | Search SCAN+EXPOSURE |
7 | ELECTRIC FIELD DEPENDENCE | 0 | 11% | 2% | 1 | Search ELECTRIC+FIELD+DEPENDENCE | Search ELECTRIC+FIELD+DEPENDENCE |
8 | REFLECTIVE MASK | 0 | 11% | 2% | 1 | Search REFLECTIVE+MASK | Search REFLECTIVE+MASK |
9 | ADSORPTION OF O 2 | 0 | 100% | 2% | 1 | Search ADSORPTION+OF+O+2 | Search ADSORPTION+OF+O+2 |
10 | ELECTRODE ELECTRODE DISTANCE | 0 | 100% | 2% | 1 | Search ELECTRODE+ELECTRODE+DISTANCE | Search ELECTRODE+ELECTRODE+DISTANCE |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ELECTRONIC STATE DENSITIES | 1 | 50% | 2% | 1 |
2 | EUV RETICLE | 1 | 50% | 2% | 1 |
3 | ELECTROCHEMICAL TUNNELING SPECTROSCOPY | 0 | 33% | 2% | 1 |
4 | MEMBRANE MIRRORS | 0 | 25% | 2% | 1 |
5 | CYTOSTATIC EVALUATIONS | 0 | 20% | 2% | 1 |
6 | RETICLES | 0 | 10% | 3% | 2 |
7 | STATE DENSITIES | 0 | 11% | 2% | 1 |
8 | SENSITIVE ZNO SIO2 AU DEVICE | 0 | 100% | 2% | 1 |
Journals |
Reviews |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MATH CHEM ENGN | 0 | 33% | 1.5% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000177377 | PHOTOCATALYTIC LITHOGRAPHY//LATEX DEV//REMOTE OXIDATION |
2 | 0.0000130430 | NANOMETER SIZED SCHOTTKY CONTACT//METAL DOT ARRAY//NANO DIODE |
3 | 0.0000128647 | ELECTROCHEMICAL MICROSCRATCHING//PARTICLE CONTACTS//GLASS ENAMEL COATINGS |
4 | 0.0000112191 | SHEARING MOTIONS//WEAK INHOMOGENEITY//PRACT EDUC |
5 | 0.0000094143 | FYS CHEM//INERT SEMICONDUCTOR REDOX ELECTROLYTE//KINETICS OF REDOX REACTIONS |
6 | 0.0000086537 | LOCAL ANODIC OXIDATION//AFM LITHOGRAPHY//NANO OXIDATION |
7 | 0.0000084229 | PHYSICOCHIM MOLEC ORSAY//SURFACE STRUCTURE AND ROUGHNESS//DESORPTION INDUCED BY ELECTRON STIMULATION |
8 | 0.0000078307 | PYROMET//PYROSEARCH//GASIFICATION AND MELTING |
9 | 0.0000074323 | S SENCE//SCANNING LIGHT PULSE TECHNIQUE//HYDROGEN SENSOR |
10 | 0.0000071543 | X RAY MASK//SUPER FINE SR LITHOG//X RAY LITHOGRAPHY |