Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
3427 | 1912 | 34.1 | 78% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1854 | 5551 | ATOMIC LAYER DEPOSITION//CHEMICAL VAPOR DEPOSITION//MOLECULAR LAYER DEPOSITION MLD |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | ATOMIC LAYER DEPOSITION | Author keyword | 126 | 24% | 24% | 459 |
2 | MOLECULAR LAYER DEPOSITION MLD | Author keyword | 27 | 92% | 1% | 11 |
3 | MOLECULAR LAYER DEPOSITION | Author keyword | 18 | 55% | 1% | 22 |
4 | ALD | Author keyword | 17 | 16% | 5% | 96 |
5 | ATOMIC LAYER DEPOSITION ALD | Author keyword | 17 | 23% | 3% | 65 |
6 | ALUCONE | Author keyword | 4 | 75% | 0% | 3 |
7 | ANGTROM SOLAR | Address | 4 | 75% | 0% | 3 |
8 | COCOON | Address | 4 | 38% | 0% | 8 |
9 | ASTRAL | Address | 4 | 31% | 1% | 10 |
10 | GROWTH PER CYCLE | Author keyword | 3 | 100% | 0% | 3 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | ATOMIC LAYER DEPOSITION | 126 | 24% | 24% | 459 | Search ATOMIC+LAYER+DEPOSITION | Search ATOMIC+LAYER+DEPOSITION |
2 | MOLECULAR LAYER DEPOSITION MLD | 27 | 92% | 1% | 11 | Search MOLECULAR+LAYER+DEPOSITION+MLD | Search MOLECULAR+LAYER+DEPOSITION+MLD |
3 | MOLECULAR LAYER DEPOSITION | 18 | 55% | 1% | 22 | Search MOLECULAR+LAYER+DEPOSITION | Search MOLECULAR+LAYER+DEPOSITION |
4 | ALD | 17 | 16% | 5% | 96 | Search ALD | Search ALD |
5 | ATOMIC LAYER DEPOSITION ALD | 17 | 23% | 3% | 65 | Search ATOMIC+LAYER+DEPOSITION+ALD | Search ATOMIC+LAYER+DEPOSITION+ALD |
6 | ALUCONE | 4 | 75% | 0% | 3 | Search ALUCONE | Search ALUCONE |
7 | GROWTH PER CYCLE | 3 | 100% | 0% | 3 | Search GROWTH+PER+CYCLE | Search GROWTH+PER+CYCLE |
8 | PE ALD | 3 | 50% | 0% | 4 | Search PE+ALD | Search PE+ALD |
9 | PLASMA ENHANCED ALD | 3 | 60% | 0% | 3 | Search PLASMA+ENHANCED+ALD | Search PLASMA+ENHANCED+ALD |
10 | ATOMIC LAYER EPITAXY ALE | 3 | 24% | 1% | 10 | Search ATOMIC+LAYER+EPITAXY+ALE | Search ATOMIC+LAYER+EPITAXY+ALE |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | BINARY REACTION SEQUENCE | 177 | 74% | 7% | 130 |
2 | ALD | 42 | 31% | 6% | 114 |
3 | SEQUENTIAL SURFACE REACTIONS | 27 | 71% | 1% | 22 |
4 | BN PARTICLES | 27 | 72% | 1% | 21 |
5 | TRIMETHYLALUMINUM | 16 | 20% | 4% | 75 |
6 | VISCOUS FLOW REACTOR | 15 | 88% | 0% | 7 |
7 | ALCH33 | 14 | 100% | 0% | 7 |
8 | HYDROXYLATED SIO2 | 13 | 67% | 1% | 12 |
9 | DIOXIDE THIN FILMS | 13 | 22% | 3% | 52 |
10 | ALUMINA TUBULAR MEMBRANES | 11 | 78% | 0% | 7 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Atomic Layer Deposition: An Overview | 2010 | 1008 | 208 | 61% |
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends | 2013 | 159 | 2284 | 31% |
Catalyst Design with Atomic Layer Deposition | 2015 | 3 | 216 | 58% |
Atomic Layer Deposition of Metal Sulfide Materials | 2015 | 4 | 53 | 30% |
Atomic Layer Deposition of Noble Metals and Their Oxides | 2014 | 18 | 118 | 49% |
Synthesis and surface engineering of complex nanostructures by atomic layer deposition | 2007 | 344 | 101 | 41% |
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process | 2005 | 889 | 1046 | 31% |
Tailoring nanoporous materials by atomic layer deposition | 2011 | 60 | 85 | 69% |
Atomic layer deposition of ZnO: a review | 2014 | 19 | 260 | 30% |
Organic and inorganic-organic thin film structures by molecular layer deposition: A review | 2014 | 6 | 103 | 80% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ANGTROM SOLAR | 4 | 75% | 0.2% | 3 |
2 | COCOON | 4 | 38% | 0.4% | 8 |
3 | ASTRAL | 4 | 31% | 0.5% | 10 |
4 | EXPT PHYS TECHNOL | 3 | 18% | 0.8% | 16 |
5 | ADV SUR E TECHNOL | 3 | 45% | 0.3% | 5 |
6 | PL PHYS SENSORS | 3 | 35% | 0.3% | 6 |
7 | DARPA INTEGRATED MICRO NANOELE OMECH TRANSD | 2 | 36% | 0.3% | 5 |
8 | BURLINGTON ENGN S 2147 | 2 | 67% | 0.1% | 2 |
9 | MICRO NANOFABRICAT MINFAB | 2 | 67% | 0.1% | 2 |
10 | ANGSTROM MICROSTRUCT | 2 | 27% | 0.4% | 7 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000165283 | RUO2//RUOD3//RU |
2 | 0.0000091285 | PERMEATION BARRIER//THIN FILM PASSIVATION//KANEKA SKKU INCUBAT |
3 | 0.0000089488 | HFO2//HIGH K//METAL GATE |
4 | 0.0000087017 | PERFLUORINATED CARBOXYLATES//COPPER CVD//IR AND NMR |
5 | 0.0000078932 | TINX FILMS//MAT CHEM COATINGS//TDEAT |
6 | 0.0000059137 | CHEM TECHNOL MAT DEVICES ELECT IND//METALLIC EUROPIUM//SHEAR STRESS UNDER HIGH PRESSURE |
7 | 0.0000054709 | KAPPA AL2O3//ALUMINA COATINGS//COMBUSTION CHEMICAL VAPOR DEPOSITION |
8 | 0.0000047206 | TANTALUM OXIDE//TANTALUM PENTOXIDE//TA2O5 |
9 | 0.0000046176 | IRIDIUM COATING//IRIDIUM COATINGS//IR COATING |
10 | 0.0000042146 | CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK |