Class information for:
Level 1: KINETICS OF PHOTOCHEMICAL REACTION//LASER MATERIALS MODIFICATION//PHOTOCHEMICAL KINETICS

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
31291 125 11.4 24%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
3348 1252 ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII//UNIV BEREICH STADTMITTE//MICROELECT SEMICOND

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 KINETICS OF PHOTOCHEMICAL REACTION Author keyword 1 50% 1% 1
2 LASER MATERIALS MODIFICATION Author keyword 1 50% 1% 1
3 PHOTOCHEMICAL KINETICS Author keyword 0 33% 1% 1
4 PHOTOCHROMIC ISOMERIZATION Author keyword 0 33% 1% 1
5 ELECT SYST DEVICES GRP Address 0 25% 1% 1
6 OPTICALLY DENSE MEDIA Author keyword 0 17% 1% 1
7 L PISARZHEVSKII Address 0 100% 1% 1

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 KINETICS OF PHOTOCHEMICAL REACTION 1 50% 1% 1 Search KINETICS+OF+PHOTOCHEMICAL+REACTION Search KINETICS+OF+PHOTOCHEMICAL+REACTION
2 LASER MATERIALS MODIFICATION 1 50% 1% 1 Search LASER+MATERIALS+MODIFICATION Search LASER+MATERIALS+MODIFICATION
3 PHOTOCHEMICAL KINETICS 0 33% 1% 1 Search PHOTOCHEMICAL+KINETICS Search PHOTOCHEMICAL+KINETICS
4 PHOTOCHROMIC ISOMERIZATION 0 33% 1% 1 Search PHOTOCHROMIC+ISOMERIZATION Search PHOTOCHROMIC+ISOMERIZATION
5 OPTICALLY DENSE MEDIA 0 17% 1% 1 Search OPTICALLY+DENSE+MEDIA Search OPTICALLY+DENSE+MEDIA

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 INTENSE XUV RADIATION 0 20% 1% 1
2 RELIEF IMAGE FORMATION 0 100% 1% 1

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
KINETIC PRINCIPLES OF PHOTOCHEMICAL-REACTIONS IN LAYERS OF PHOTORESISTS AND PHOTOSENSITIVITY OF PHOTORESISTS .1. 1987 5 14 71%
SENSITOMETRY OF NEGATIVE PHOTORESISTS AND THE FORMATION OF PROTECTING DRAWINGS 1984 4 9 100%
LIGHT SENSITIVITY OF PHOTORESIST LAYERS AND KINETIC REGULARITIES OF PHOTOCHEMICAL-REACTIONS IN SUCH LAYERS .2. 1988 7 19 84%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 ELECT SYST DEVICES GRP 0 25% 0.8% 1
2 L PISARZHEVSKII 0 100% 0.8% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000160944 NITRENES//AROMATIC AZIDE//NITROSO OXIDES
2 0.0000153845 DIARYLAMINOACRIDINE//PHOTOINDUCED SYNTHESIS//EPOXIDE AMINE OLIGOMERS
3 0.0000142239 COLLOIDAL CENTER//PHOTOVOLTA METROL//SOLID SOLUTIONS WITH FLUORITE STRUCTURE
4 0.0000135644 ELECTROLESS NICKEL DEPOSITION//LEAD FILM//ZHUZHOU ENGN
5 0.0000113872 KATEDRA KONSTRUKCJI MASZYN//AMINE MODIFIERS//WYDZIAL BUDOWY MASZYN LOTNICTWA
6 0.0000109966 CHARGE TRANSFER POLYMERIZATION//KINETIC NONIDEALITY//COMBUSTION SYNTHESIZED TIO2
7 0.0000100706 GRAFTED RADICALS//ELASTIC WAVE PULSE//ANGULAR DEPENDENCE OF ESR SPECTRA
8 0.0000074874 PL MATH AUTOMAT//PULSE WIDTH DEPENDENCE OF DAMAGE THRESHOLD//KABARDINO BALKAR SCI
9 0.0000072464 PULSED PROC//PULSE PROC//AIR FILLING
10 0.0000065136 PHENYLATED POLYPHENYLENE//POLYMERS THERMODYNAM//ZAO EKLIP