Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
30273 | 140 | 19.5 | 55% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
512 | 14399 | PLASMA SOURCES SCIENCE & TECHNOLOGY//PLASMA DISPLAY PANEL PDP//PLASMA DISPLAY PANEL |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | VACUUM TECHNOL | Address | 4 | 22% | 12% | 17 |
2 | ACTIVE PLASMA RESONANCE SPECTROSCOPY | Author keyword | 4 | 75% | 2% | 3 |
3 | CUTOFF PROBE | Author keyword | 4 | 75% | 2% | 3 |
4 | PLASMA ABSORPTION PROBE | Author keyword | 3 | 100% | 2% | 3 |
5 | PL LOW TEMP PLASMA | Address | 2 | 44% | 3% | 4 |
6 | DISCHARGE CHARACTERISATION | Author keyword | 2 | 67% | 1% | 2 |
7 | ELECTRON PLASMA FREQUENCY | Author keyword | 2 | 67% | 1% | 2 |
8 | 3D ELECTROMAGNETIC FIELD SIMULATIONS | Author keyword | 1 | 50% | 1% | 2 |
9 | CHARGE PARTICLE PHYS BRANCH CODE 6752 | Address | 1 | 100% | 1% | 2 |
10 | PLASMA COVERED ANTENNAS | Author keyword | 1 | 100% | 1% | 2 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ABSORPTION PROBE | 31 | 82% | 13% | 18 |
2 | PLASMA OSCILLATION METHOD | 9 | 83% | 4% | 5 |
3 | ABSOLUTE ELECTRON DENSITY | 6 | 80% | 3% | 4 |
4 | WAVE CUTOFF METHOD | 6 | 71% | 4% | 5 |
5 | RADIO FREQUENCY PROBE | 6 | 100% | 3% | 4 |
6 | OSCILLATION METHOD | 4 | 47% | 5% | 7 |
7 | RESONANCE PROBE | 4 | 75% | 2% | 3 |
8 | ISOTROPIC PLASMA | 2 | 67% | 1% | 2 |
9 | PLASMA ABSORPTION PROBE | 2 | 67% | 1% | 2 |
10 | RESOLVED ELECTRON DENSITY | 2 | 67% | 1% | 2 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Exploiting Laboratory and Heliophysics Plasma Synergies | 2010 | 1 | 42 | 7% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | VACUUM TECHNOL | 4 | 22% | 12% | 17 |
2 | PL LOW TEMP PLASMA | 2 | 44% | 2.9% | 4 |
3 | CHARGE PARTICLE PHYS BRANCH CODE 6752 | 1 | 100% | 1.4% | 2 |
4 | SHENZHEN SENSORS TECHNOL | 1 | 33% | 1.4% | 2 |
5 | LEHRSTUHL ELEKT ALTUNGSTECH | 1 | 50% | 0.7% | 1 |
6 | PROV THIN FILMS | 1 | 22% | 1.4% | 2 |
7 | HOCHFREQUENZTECH FUNKSYST | 0 | 25% | 0.7% | 1 |
8 | LEHRSTUHL ALLGEMEINE ELEKTROTECH PLASMATECH | 0 | 25% | 0.7% | 1 |
9 | LEHRSTUHL HOCHFREQUENZSYST | 0 | 25% | 0.7% | 1 |
10 | EXPT PHYS PLICAT ORIENTED PLASMA PHYS 2 | 0 | 20% | 0.7% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000245060 | PLASMA ANTENNA//PLASMA STEALTH//STATE PULSE POWER LASER TECHNOL |
2 | 0.0000210130 | LOW INDUCTANCE ANTENNA//LOW DAMAGE PROCESS//INDUCTIVELY COUPLED PLASMA |
3 | 0.0000202093 | LADDER SHAPED ELECTRODE//PLASMA ATOM PHYS//VHF PLASMA |
4 | 0.0000187448 | BOHM CRITERION//PLASMA SOLID INTERACTION//EMISSIVE PROBE |
5 | 0.0000125724 | TRANSFORMER SENSOR//NEGATIVE ABSORPTION//REACTOR ACCELERATOR DEV |
6 | 0.0000107961 | SURFACE WAVE PLASMA//GRP ESPE OSCOPIA PLASMAS//GRP PHYS PLASMAS |
7 | 0.0000107767 | ELECT DEVICES MAT TECHNOL//SIO2 ETCHING//PLASMA ETCHING |
8 | 0.0000100284 | LOW CURRENT SWITCHING//RETARDING POTENTIAL ANALYZER//INT SPACE WEATHER STUDY EDUC |
9 | 0.0000093333 | AEROSP PHYS OPT//RYDBERG ATOMS AND MOLECULES//L MIXING |
10 | 0.0000082397 | HIGH FREQUENCY ELECTRON CURRENT//MICROWAVE RESONATOR METHOD//TEMPORAL ELECTRON RELAXATION |