Class information for: |
Basic class information |
| ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
|---|---|---|---|
| 29274 | 155 | 11.1 | 43% |
Classes in level above (level 2) |
Terms with highest relevance score |
| Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|---|
| 1 | PLASMA LENS | Author keyword | 5 | 43% | 6% | 9 |
| 2 | PLASMA OPTICS | Author keyword | 2 | 40% | 3% | 4 |
| 3 | HALL CURRENT ACCELERATOR | Author keyword | 1 | 50% | 1% | 2 |
| 4 | ION BEAM PLASMA | Author keyword | 1 | 100% | 1% | 2 |
| 5 | ION MANIPULATION | Author keyword | 1 | 50% | 1% | 2 |
| 6 | BROAD BEAM ION SOURCE | Author keyword | 1 | 50% | 1% | 1 |
| 7 | D EGG | Address | 1 | 50% | 1% | 1 |
| 8 | GMR SPIN VALVE SENSOR | Author keyword | 1 | 50% | 1% | 1 |
| 9 | ICN CIN2 | Address | 1 | 50% | 1% | 1 |
| 10 | INGN MECCAN MAT | Address | 1 | 50% | 1% | 1 |
Web of Science journal categories |
Author Key Words |
| Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | PLASMA LENS | 5 | 43% | 6% | 9 | Search PLASMA+LENS | Search PLASMA+LENS |
| 2 | PLASMA OPTICS | 2 | 40% | 3% | 4 | Search PLASMA+OPTICS | Search PLASMA+OPTICS |
| 3 | HALL CURRENT ACCELERATOR | 1 | 50% | 1% | 2 | Search HALL+CURRENT+ACCELERATOR | Search HALL+CURRENT+ACCELERATOR |
| 4 | ION BEAM PLASMA | 1 | 100% | 1% | 2 | Search ION+BEAM+PLASMA | Search ION+BEAM+PLASMA |
| 5 | ION MANIPULATION | 1 | 50% | 1% | 2 | Search ION+MANIPULATION | Search ION+MANIPULATION |
| 6 | BROAD BEAM ION SOURCE | 1 | 50% | 1% | 1 | Search BROAD+BEAM+ION+SOURCE | Search BROAD+BEAM+ION+SOURCE |
| 7 | GMR SPIN VALVE SENSOR | 1 | 50% | 1% | 1 | Search GMR+SPIN+VALVE+SENSOR | Search GMR+SPIN+VALVE+SENSOR |
| 8 | BEAM FOCUSSING | 0 | 33% | 1% | 1 | Search BEAM+FOCUSSING | Search BEAM+FOCUSSING |
| 9 | ELECTROCHEMICAL VAPOUR DEPOSITION | 0 | 33% | 1% | 1 | Search ELECTROCHEMICAL+VAPOUR+DEPOSITION | Search ELECTROCHEMICAL+VAPOUR+DEPOSITION |
| 10 | ELECTRON EXTRACTION | 0 | 33% | 1% | 1 | Search ELECTRON+EXTRACTION | Search ELECTRON+EXTRACTION |
Key Words Plus |
| Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | CURRENT ION BEAMS | 1 | 50% | 1% | 1 |
| 2 | EMISSION ELECTRONICS | 1 | 50% | 1% | 1 |
| 3 | NEUTRALIZATION SPECTROSCOPY | 1 | 50% | 1% | 1 |
| 4 | BEAM ION SOURCES | 1 | 25% | 1% | 2 |
| 5 | LARGE AREA GLASS | 0 | 33% | 1% | 1 |
| 6 | COMBINED ELECTRON | 0 | 25% | 1% | 1 |
| 7 | HE2S | 0 | 25% | 1% | 1 |
| 8 | DIRECTIONAL LANGMUIR PROBE | 0 | 14% | 1% | 1 |
| 9 | MULTIPOLE ARC DISCHARGES | 0 | 10% | 1% | 1 |
| 10 | ELECTROSTATIC PLASMA LENS | 0 | 100% | 1% | 1 |
Journals |
Reviews |
| Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
|---|---|---|---|---|
| Invited Review Article: The electrostatic plasma lens | 2013 | 3 | 26 | 81% |
Address terms |
| Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | D EGG | 1 | 50% | 0.6% | 1 |
| 2 | ICN CIN2 | 1 | 50% | 0.6% | 1 |
| 3 | INGN MECCAN MAT | 1 | 50% | 0.6% | 1 |
| 4 | MICROELECT NANOSTRUCT | 1 | 50% | 0.6% | 1 |
| 5 | NATURWISSEN AFTL FAK 2 | 1 | 50% | 0.6% | 1 |
| 6 | PHYS PLASMASCNRSECOLE POLYTECH | 0 | 14% | 1.3% | 2 |
| 7 | CHAIR PETR CHEM ORGAN CATALYSIS | 0 | 17% | 0.6% | 1 |
| 8 | AFRD | 0 | 11% | 0.6% | 1 |
| 9 | HIGH CURRENT ELECT SB | 0 | 11% | 0.6% | 1 |
| 10 | ECOLE POLYTECHCNRS PHYS PLASMAS | 0 | 100% | 0.6% | 1 |
Related classes at same level (level 1) |
| Rank | Relatedness score | Related classes |
|---|---|---|
| 1 | 0.0000138482 | CEAG//SUR E TREATMENT OPT MAT//VIBRATION STATES |
| 2 | 0.0000106143 | PLASMA PROP//HALL THRUSTER//PLASMADYNAM ELECT PROP |
| 3 | 0.0000101716 | VACUUM ARC//CATHODE SPOT//VACUUM ARCS |
| 4 | 0.0000080314 | PLASMA CENTRIFUGE//ISOTOPE TRANSMUTATION ONLINE SEPARATION//PROC ENRICHISSEMENT |
| 5 | 0.0000074950 | SURFACE CONDUCTION ELECTRON EMITTER DISPLAY SED//SURFACE CONDUCTION ELECTRON EMISSION//SURFACE CONDUCTION ELECTRON EMITTER DISPLAY |
| 6 | 0.0000065284 | HYDROGEN INDUCED FRACTURE//SURFACE SCALE//SILUMINS |
| 7 | 0.0000062005 | STRESS STRAINED STATE//STRESS STRUCTURAL INHOMOGENEITY//STATE ENGN |
| 8 | 0.0000061963 | ATOMIC LAYER ETCHING//GATE CHARGING//NEUTRAL BEAM ETCHING |
| 9 | 0.0000061376 | HIGHLY DISPERSED FERROMAGNETICS//PULSE PROC TECHNOL//LOW ENERGY DEUTERIUM INCIDENCE |
| 10 | 0.0000057162 | TINX FILMS//MAT CHEM COATINGS//TDEAT |