Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
2875 | 2050 | 21.2 | 50% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1792 | 5778 | DIFFUSION BARRIER//ELECTROMIGRATION//CU METALLIZATION |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | ELECTROMIGRATION | Author keyword | 91 | 24% | 16% | 327 |
2 | STRESS INDUCED MIGRATION | Author keyword | 21 | 85% | 1% | 11 |
3 | PRC MER | Address | 13 | 71% | 0% | 10 |
4 | ELECTROMIGRATION EM | Author keyword | 11 | 43% | 1% | 20 |
5 | HILLOCK | Author keyword | 7 | 29% | 1% | 19 |
6 | CUSIN | Author keyword | 6 | 80% | 0% | 4 |
7 | EE PHYS ELECT | Address | 6 | 80% | 0% | 4 |
8 | ELECTROMIGRATION FAILURE | Author keyword | 6 | 80% | 0% | 4 |
9 | SUR E EVALUAT | Address | 6 | 100% | 0% | 4 |
10 | STRESS VOIDING | Author keyword | 5 | 55% | 0% | 6 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | ELECTROMIGRATION | 91 | 24% | 16% | 327 | Search ELECTROMIGRATION | Search ELECTROMIGRATION |
2 | STRESS INDUCED MIGRATION | 21 | 85% | 1% | 11 | Search STRESS+INDUCED+MIGRATION | Search STRESS+INDUCED+MIGRATION |
3 | ELECTROMIGRATION EM | 11 | 43% | 1% | 20 | Search ELECTROMIGRATION+EM | Search ELECTROMIGRATION+EM |
4 | HILLOCK | 7 | 29% | 1% | 19 | Search HILLOCK | Search HILLOCK |
5 | CUSIN | 6 | 80% | 0% | 4 | Search CUSIN | Search CUSIN |
6 | ELECTROMIGRATION FAILURE | 6 | 80% | 0% | 4 | Search ELECTROMIGRATION+FAILURE | Search ELECTROMIGRATION+FAILURE |
7 | STRESS VOIDING | 5 | 55% | 0% | 6 | Search STRESS+VOIDING | Search STRESS+VOIDING |
8 | THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAYS | 4 | 67% | 0% | 4 | Search THIN+FILM+TRANSISTOR+LIQUID+CRYSTAL+DISPLAYS | Search THIN+FILM+TRANSISTOR+LIQUID+CRYSTAL+DISPLAYS |
9 | SELF ALIGNED BARRIER | 4 | 56% | 0% | 5 | Search SELF+ALIGNED+BARRIER | Search SELF+ALIGNED+BARRIER |
10 | AL 111 TEXTURE | 3 | 100% | 0% | 3 | Search AL+111+TEXTURE | Search AL+111+TEXTURE |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ELECTROMIGRATION | 52 | 17% | 14% | 285 |
2 | ALUMINUM BASED METALLIZATIONS | 44 | 100% | 1% | 16 |
3 | CONFINED METAL LINES | 36 | 65% | 2% | 34 |
4 | ALUMINUM FILMS | 33 | 31% | 4% | 90 |
5 | FILM CONDUCTORS | 31 | 92% | 1% | 12 |
6 | BAMBOO LINES | 29 | 72% | 1% | 23 |
7 | STRESS EVOLUTION | 27 | 37% | 3% | 58 |
8 | CONDUCTOR LINES | 24 | 91% | 0% | 10 |
9 | NEAR BAMBOO | 24 | 91% | 0% | 10 |
10 | THIN FILM CONDUCTORS | 23 | 69% | 1% | 20 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Electromigration of Cu/low dielectric constant interconnects | 2006 | 71 | 33 | 76% |
Electromigration reliability issues in dual-damascene Cu interconnections | 2002 | 120 | 97 | 73% |
Copper metallization for high performance silicon technology | 2000 | 241 | 15 | 33% |
Electromigration in submicron interconnect features of integrated circuits | 2011 | 9 | 68 | 75% |
Electromigration: A review | 1997 | 111 | 42 | 86% |
Electromigration in integrated circuit conductors | 1999 | 83 | 14 | 79% |
Electromigration in thin film conductors | 1997 | 65 | 11 | 100% |
Surface morphological response of crystalline solids to mechanical stresses and electric fields | 2011 | 6 | 141 | 50% |
ELECTROMIGRATION IN METALS | 1989 | 373 | 18 | 44% |
Interface reliability assessments. for Copper/Low-k products | 2004 | 28 | 27 | 63% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | PRC MER | 13 | 71% | 0.5% | 10 |
2 | EE PHYS ELECT | 6 | 80% | 0.2% | 4 |
3 | SUR E EVALUAT | 6 | 100% | 0.2% | 4 |
4 | INTERCONNECT PACKAGING | 4 | 29% | 0.6% | 13 |
5 | MINIST EDUC BAND G SEMICOND MAT DEVICES | 4 | 67% | 0.2% | 4 |
6 | INTERCONNECT PACKAGING GRP | 3 | 60% | 0.1% | 3 |
7 | ADV DEVICE DEV | 2 | 24% | 0.4% | 8 |
8 | ADV PROC DEV PROJECT TEAM | 2 | 67% | 0.1% | 2 |
9 | ARRAY PROC TECHNOL GRP | 2 | 67% | 0.1% | 2 |
10 | TEST ANAL TECHNOL DEV | 2 | 67% | 0.1% | 2 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000122868 | LASER POLISHING//SELF ION ASSISTED DEPOSITION//QUASISTATIC PROBLEM OF THERMOELASTICITY |
2 | 0.0000101166 | W TI THIN FILMS//WTI THIN FILMS//SURFACE LASER TREATMENT |
3 | 0.0000093673 | AL PT//AMORPHOUS AL2PT//SELF ORGANISED STRUCTURE FORMATION |
4 | 0.0000085781 | INTERFACIAL SHEARS//NON LOCAL STRESS CURVATURE RELATIONS//NON UNIFORM MISFIT STRAIN |
5 | 0.0000080786 | STRIP BENDING TEST//MEMS PROD//HIGH CYCLE FATIGUE TEST |
6 | 0.0000075811 | DIRECT FORCE//WISSEN BEREICH THEORET PHYS//SCI PHYS ASTRON |
7 | 0.0000075378 | DIFFUSION BARRIER//CU METALLIZATION//TANTALUM NITRIDE |
8 | 0.0000071577 | MATH DESIGN MAT//SOLID STATE DEWETTING//SURFACE ENERGY ANISOTROPY |
9 | 0.0000070979 | ADSORBED LAYER INSTABILITY//ASARO TILLER GRINFELD INSTABILITY//STRETCHABLE SUBSTRATE |
10 | 0.0000066595 | SELF ANNEALING//COPPER ELECTRODEPOSITION//COPPER ELECTROPLATING |