Class information for:
Level 1: SILICON OXYNITRIDE//SILICON NITRIDE FILMS//CONDUCTANCE TRANSIENTS

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
2830 2061 20.9 59%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
252 19240 MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//PHOTOVOLTA THIN FILM ELECT

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SILICON OXYNITRIDE Author keyword 10 18% 2% 50
2 SILICON NITRIDE FILMS Author keyword 7 42% 1% 13
3 CONDUCTANCE TRANSIENTS Author keyword 6 71% 0% 5
4 SILICON NITRIDE FILM Author keyword 6 35% 1% 14
5 ION ENERGY DIAGNOSTICS Author keyword 6 100% 0% 4
6 AMORPHOUS SILICON NITRIDE Author keyword 4 34% 0% 10
7 HYDROGEN BOND DENSITY Author keyword 4 75% 0% 3
8 PULSED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Author keyword 4 75% 0% 3
9 EFFECTIVE TRAPPED CARRIER DENSITY Author keyword 3 100% 0% 3
10 ELECTRON CYCLOTRON RESONANCE PLASMA DEPOSITION Author keyword 3 100% 0% 3

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 SILICON OXYNITRIDE 10 18% 2% 50 Search SILICON+OXYNITRIDE Search SILICON+OXYNITRIDE
2 SILICON NITRIDE FILMS 7 42% 1% 13 Search SILICON+NITRIDE+FILMS Search SILICON+NITRIDE+FILMS
3 CONDUCTANCE TRANSIENTS 6 71% 0% 5 Search CONDUCTANCE+TRANSIENTS Search CONDUCTANCE+TRANSIENTS
4 SILICON NITRIDE FILM 6 35% 1% 14 Search SILICON+NITRIDE+FILM Search SILICON+NITRIDE+FILM
5 ION ENERGY DIAGNOSTICS 6 100% 0% 4 Search ION+ENERGY+DIAGNOSTICS Search ION+ENERGY+DIAGNOSTICS
6 AMORPHOUS SILICON NITRIDE 4 34% 0% 10 Search AMORPHOUS+SILICON+NITRIDE Search AMORPHOUS+SILICON+NITRIDE
7 HYDROGEN BOND DENSITY 4 75% 0% 3 Search HYDROGEN+BOND+DENSITY Search HYDROGEN+BOND+DENSITY
8 PULSED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 4 75% 0% 3 Search PULSED+PLASMA+ENHANCED+CHEMICAL+VAPOR+DEPOSITION Search PULSED+PLASMA+ENHANCED+CHEMICAL+VAPOR+DEPOSITION
9 EFFECTIVE TRAPPED CARRIER DENSITY 3 100% 0% 3 Search EFFECTIVE+TRAPPED+CARRIER+DENSITY Search EFFECTIVE+TRAPPED+CARRIER+DENSITY
10 ELECTRON CYCLOTRON RESONANCE PLASMA DEPOSITION 3 100% 0% 3 Search ELECTRON+CYCLOTRON+RESONANCE+PLASMA+DEPOSITION Search ELECTRON+CYCLOTRON+RESONANCE+PLASMA+DEPOSITION

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SILICON NITRIDE FILMS 44 38% 5% 93
2 SINXHY DEPOSITION 27 78% 1% 18
3 HYDROGEN CONTENT 21 35% 2% 48
4 OXYNITRIDE FILMS 21 36% 2% 47
5 SILICON OXYNITRIDE FILMS 21 45% 2% 34
6 DANGLING BOND CENTERS 19 48% 1% 30
7 CHLORINE ADDITION 17 100% 0% 8
8 DOMINANT DEEP TRAP 15 73% 1% 11
9 MEMORY TRAPS 14 100% 0% 7
10 AMORPHOUS SILICON NITRIDE 13 36% 1% 30

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
SILICON-NITRIDE AND OXYNITRIDE FILMS 1994 123 206 56%
Plasma deposition of optical films and coatings: A review 2000 278 200 17%
Atomic structure of the amorphous nonstoichiometric silicon oxides and nitrides 2008 10 17 47%
THE PREPARATION, PROPERTIES AND APPLICATIONS OF SILICON-NITRIDE THIN-FILMS DEPOSITED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION 1991 60 72 76%
Electronic structure of silicon nitride 2012 5 25 36%
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits 1999 41 101 31%
Critical evaluation of the state of the art of the analysis of light elements in thin films demonstrated using the examples of SiOXNY and AiO(X)N(Y) films - (IUPAC Technical Report) 2004 14 118 40%
Advances in low temperature processing of silicon nitride based dielectrics and their applications in surface passivation and integrated optical devices 2000 18 44 25%
New dielectric materials and insulators for microelectronic applications 1996 1 6 33%
THE DETERMINATION OF ELASTIC-CONSTANTS USING A COMBINATION OF X-RAY STRESS TECHNIQUES 1983 0 1 100%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 ELECT TECNOL COMPUTADO PROYECTOS 3 60% 0.1% 3
2 SIMULAC DISPOSIT SEMICOND 2 67% 0.1% 2
3 FIS LICADA ELECT ELECT 3 1 17% 0.4% 8
4 ABT SF 4 1 100% 0.1% 2
5 ELECT TECNOL COMPUTADORAS 1 50% 0.1% 2
6 FIS LICADA ELECT ELE ON 3 1 100% 0.1% 2
7 THIN FILM TRANSISTOR TECHNOL 1 100% 0.1% 2
8 UMR CNRS 5001 1 100% 0.1% 2
9 EPUSP 1 11% 0.5% 10
10 OPT TELECOMMUN 1 30% 0.1% 3

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000140085 BORON PENETRATION//REMOTE PLASMA NITRIDATION RPN//SI NITRIDE
2 0.0000121526 SILICON TETRAACETATE//F 2 LASER//N2O GAS
3 0.0000110585 SIPOS//MSOS O P STRUCTURE//SEMI INSULATING POLYCRYSTALLINE SILICON
4 0.0000094233 SILICON CARBONITRIDE//SILICON CARBON NITRIDE//SILICON CARBONITRIDE FILM
5 0.0000087740 BOROPHOSPHOSILICATE GLASS BPSG//ATMOSPHERIC PRESSURE CVD//BPSG
6 0.0000086745 HMDSO//HEXAMETHYLDISILOXANE//HEXAMETHYLDISILOXANE HMDSO
7 0.0000077550 SIH2//SIH3//SILANE PLASMA
8 0.0000071802 GAMMA SI3N4//TIN NITRIDE//CUBIC SILICON NITRIDE
9 0.0000070543 GENIE URBAIN ENVIRONM//COMPUTERISING//OXYNITRIDE FILMS
10 0.0000066619 ACTIVE MATRIX ORGANIC LIGHT EMITTING DIODE AMOLED//PIXEL CIRCUIT//AMORPHOUS SILICON THIN FILM TRANSISTOR