Class information for:
Level 1: QUANTUM SENSITIVITY LIMIT//ACTIVE QUANTUM FILTER//LARGE AREA FILMS

Basic class information

ID Publications Average number
of references
Avg. shr. active
ref. in WoS
27887 179 16.7 37%



Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)



ID, lev.
above
Publications Label for level above
2430 3649 INTENSE PULSED ION BEAM//HIGH CURRENT PULSED ELECTRON BEAM//HIGH INTENSITY PULSED ION BEAM

Terms with highest relevance score



Rank Term Type of term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 QUANTUM SENSITIVITY LIMIT Author keyword 8 100% 3% 5
2 ACTIVE QUANTUM FILTER Author keyword 6 100% 2% 4
3 LARGE AREA FILMS Author keyword 3 60% 2% 3
4 INTERCONNECT DENSITY Author keyword 2 67% 1% 2
5 TECHNOL MANAGEMENT MKT Address 2 67% 1% 2
6 LASER WEAPON Author keyword 1 38% 2% 3
7 COHERENT SUMMATION Author keyword 1 50% 1% 2
8 CW BAND IN LASER Author keyword 1 100% 1% 2
9 ENERGY PROCESS WINDOW Author keyword 1 100% 1% 2
10 LASER ANTIFUSE Author keyword 1 100% 1% 2

Web of Science journal categories

Author Key Words



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
LCSH search Wikipedia search
1 QUANTUM SENSITIVITY LIMIT 8 100% 3% 5 Search QUANTUM+SENSITIVITY+LIMIT Search QUANTUM+SENSITIVITY+LIMIT
2 ACTIVE QUANTUM FILTER 6 100% 2% 4 Search ACTIVE+QUANTUM+FILTER Search ACTIVE+QUANTUM+FILTER
3 LARGE AREA FILMS 3 60% 2% 3 Search LARGE+AREA+FILMS Search LARGE+AREA+FILMS
4 INTERCONNECT DENSITY 2 67% 1% 2 Search INTERCONNECT+DENSITY Search INTERCONNECT+DENSITY
5 LASER WEAPON 1 38% 2% 3 Search LASER+WEAPON Search LASER+WEAPON
6 COHERENT SUMMATION 1 50% 1% 2 Search COHERENT+SUMMATION Search COHERENT+SUMMATION
7 CW BAND IN LASER 1 100% 1% 2 Search CW+BAND+IN+LASER Search CW+BAND+IN+LASER
8 ENERGY PROCESS WINDOW 1 100% 1% 2 Search ENERGY+PROCESS+WINDOW Search ENERGY+PROCESS+WINDOW
9 LASER ANTIFUSE 1 100% 1% 2 Search LASER+ANTIFUSE Search LASER+ANTIFUSE
10 LASER METAL CUT 1 100% 1% 2 Search LASER+METAL+CUT Search LASER+METAL+CUT

Key Words Plus



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 FORMED METALLIC CONNECTIONS 9 83% 3% 5
2 PROGRAMMABLE REDUNDANCY 6 100% 2% 4
3 TDI CCD CAMERA 3 100% 2% 3
4 ACTIVE QUANTUM FILTER 1 100% 1% 2
5 MILLISECOND LASER 1 100% 1% 2
6 PUMPED PHOTODISSOCIATION LASERS 1 100% 1% 2
7 0532 MU M 0 33% 1% 1
8 IV IODINE LASER 0 33% 1% 1
9 POWER LASER PROPAGATION 0 33% 1% 1
10 SINGLE CRYSTAL GERMANIUM 0 14% 1% 1

Journals

Reviews



Title Publ. year Cit. Active
references
% act. ref.
to same field
RECENT ADVANCES IN LASER PROCESSING OF SEMICONDUCTORS 1983 0 3 67%

Address terms



Rank Address term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 TECHNOL MANAGEMENT MKT 2 67% 1.1% 2
2 LSI TECHNOL 1 50% 0.6% 1
3 PL MATH IND ENGN 1 29% 1.1% 2
4 GRP RECH MICROELECT 0 33% 0.6% 1
5 SEMICOND RD HEADQUARTERS 0 25% 0.6% 1
6 INTERCONNECT PROD TECHNOL 0 17% 0.6% 1
7 RD 1 4 0 14% 0.6% 1
8 HOSP 169 0 11% 0.6% 1
9 BATTAL 19 BIOMED ENGN 0 100% 0.6% 1
10 BATTAL 4 CADET BRIGADE 0 100% 0.6% 1

Related classes at same level (level 1)



Rank Relatedness score Related classes
1 0.0000137018 EXCIMER LASER DOPING//LASER INDUCED SURFACE PROCESS//WIDE BANDGAP OXIDES
2 0.0000131400 ZONE REFINING//ULTRA PURE MAT//ULTR URE MAT
3 0.0000108066 ZONE MELTING RECRYSTALLIZATION//ARCHITECTURE TECH//LASER INDUCED TEMPERATURE RISE
4 0.0000076877 BUILT IN REDUNDANCY ANALYSIS BIRA//CATASTROPHIC FAULT PATTERNS//CRITICAL AREA
5 0.0000055739 WE ONS ARBB//FAST FLOW LASER//IR PHOTOGRAPHY
6 0.0000055129 FEMTOSECOND LASER ABLATION//FEMTOSECOND LASER//PHOTO MFG SCI TECHNOL
7 0.0000053472 RD OPT THIN FILM COATINGS//TIO2 SIO2 HIGH REFLECTORS//LASER INDUCED DAMAGE
8 0.0000053000 DATA RETENTION TIME//VOLTAGE DOWN CONVERTER//FERROELECTRIC MEMORY
9 0.0000050263 LASER DYNAM BEHAV MAT//WILLIAMS ASYMPTOTIC APPROACH//REACTION COUPLE
10 0.0000049589 CHEM KOMI//FINITE DIFFUSION IMPEDANCE//TECHNOL UNIQUE RUMENTAT