Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
27887 | 179 | 16.7 | 37% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
2430 | 3649 | INTENSE PULSED ION BEAM//HIGH CURRENT PULSED ELECTRON BEAM//HIGH INTENSITY PULSED ION BEAM |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | QUANTUM SENSITIVITY LIMIT | Author keyword | 8 | 100% | 3% | 5 |
2 | ACTIVE QUANTUM FILTER | Author keyword | 6 | 100% | 2% | 4 |
3 | LARGE AREA FILMS | Author keyword | 3 | 60% | 2% | 3 |
4 | INTERCONNECT DENSITY | Author keyword | 2 | 67% | 1% | 2 |
5 | TECHNOL MANAGEMENT MKT | Address | 2 | 67% | 1% | 2 |
6 | LASER WEAPON | Author keyword | 1 | 38% | 2% | 3 |
7 | COHERENT SUMMATION | Author keyword | 1 | 50% | 1% | 2 |
8 | CW BAND IN LASER | Author keyword | 1 | 100% | 1% | 2 |
9 | ENERGY PROCESS WINDOW | Author keyword | 1 | 100% | 1% | 2 |
10 | LASER ANTIFUSE | Author keyword | 1 | 100% | 1% | 2 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | QUANTUM SENSITIVITY LIMIT | 8 | 100% | 3% | 5 | Search QUANTUM+SENSITIVITY+LIMIT | Search QUANTUM+SENSITIVITY+LIMIT |
2 | ACTIVE QUANTUM FILTER | 6 | 100% | 2% | 4 | Search ACTIVE+QUANTUM+FILTER | Search ACTIVE+QUANTUM+FILTER |
3 | LARGE AREA FILMS | 3 | 60% | 2% | 3 | Search LARGE+AREA+FILMS | Search LARGE+AREA+FILMS |
4 | INTERCONNECT DENSITY | 2 | 67% | 1% | 2 | Search INTERCONNECT+DENSITY | Search INTERCONNECT+DENSITY |
5 | LASER WEAPON | 1 | 38% | 2% | 3 | Search LASER+WEAPON | Search LASER+WEAPON |
6 | COHERENT SUMMATION | 1 | 50% | 1% | 2 | Search COHERENT+SUMMATION | Search COHERENT+SUMMATION |
7 | CW BAND IN LASER | 1 | 100% | 1% | 2 | Search CW+BAND+IN+LASER | Search CW+BAND+IN+LASER |
8 | ENERGY PROCESS WINDOW | 1 | 100% | 1% | 2 | Search ENERGY+PROCESS+WINDOW | Search ENERGY+PROCESS+WINDOW |
9 | LASER ANTIFUSE | 1 | 100% | 1% | 2 | Search LASER+ANTIFUSE | Search LASER+ANTIFUSE |
10 | LASER METAL CUT | 1 | 100% | 1% | 2 | Search LASER+METAL+CUT | Search LASER+METAL+CUT |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | FORMED METALLIC CONNECTIONS | 9 | 83% | 3% | 5 |
2 | PROGRAMMABLE REDUNDANCY | 6 | 100% | 2% | 4 |
3 | TDI CCD CAMERA | 3 | 100% | 2% | 3 |
4 | ACTIVE QUANTUM FILTER | 1 | 100% | 1% | 2 |
5 | MILLISECOND LASER | 1 | 100% | 1% | 2 |
6 | PUMPED PHOTODISSOCIATION LASERS | 1 | 100% | 1% | 2 |
7 | 0532 MU M | 0 | 33% | 1% | 1 |
8 | IV IODINE LASER | 0 | 33% | 1% | 1 |
9 | POWER LASER PROPAGATION | 0 | 33% | 1% | 1 |
10 | SINGLE CRYSTAL GERMANIUM | 0 | 14% | 1% | 1 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
RECENT ADVANCES IN LASER PROCESSING OF SEMICONDUCTORS | 1983 | 0 | 3 | 67% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | TECHNOL MANAGEMENT MKT | 2 | 67% | 1.1% | 2 |
2 | LSI TECHNOL | 1 | 50% | 0.6% | 1 |
3 | PL MATH IND ENGN | 1 | 29% | 1.1% | 2 |
4 | GRP RECH MICROELECT | 0 | 33% | 0.6% | 1 |
5 | SEMICOND RD HEADQUARTERS | 0 | 25% | 0.6% | 1 |
6 | INTERCONNECT PROD TECHNOL | 0 | 17% | 0.6% | 1 |
7 | RD 1 4 | 0 | 14% | 0.6% | 1 |
8 | HOSP 169 | 0 | 11% | 0.6% | 1 |
9 | BATTAL 19 BIOMED ENGN | 0 | 100% | 0.6% | 1 |
10 | BATTAL 4 CADET BRIGADE | 0 | 100% | 0.6% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000137018 | EXCIMER LASER DOPING//LASER INDUCED SURFACE PROCESS//WIDE BANDGAP OXIDES |
2 | 0.0000131400 | ZONE REFINING//ULTRA PURE MAT//ULTR URE MAT |
3 | 0.0000108066 | ZONE MELTING RECRYSTALLIZATION//ARCHITECTURE TECH//LASER INDUCED TEMPERATURE RISE |
4 | 0.0000076877 | BUILT IN REDUNDANCY ANALYSIS BIRA//CATASTROPHIC FAULT PATTERNS//CRITICAL AREA |
5 | 0.0000055739 | WE ONS ARBB//FAST FLOW LASER//IR PHOTOGRAPHY |
6 | 0.0000055129 | FEMTOSECOND LASER ABLATION//FEMTOSECOND LASER//PHOTO MFG SCI TECHNOL |
7 | 0.0000053472 | RD OPT THIN FILM COATINGS//TIO2 SIO2 HIGH REFLECTORS//LASER INDUCED DAMAGE |
8 | 0.0000053000 | DATA RETENTION TIME//VOLTAGE DOWN CONVERTER//FERROELECTRIC MEMORY |
9 | 0.0000050263 | LASER DYNAM BEHAV MAT//WILLIAMS ASYMPTOTIC APPROACH//REACTION COUPLE |
10 | 0.0000049589 | CHEM KOMI//FINITE DIFFUSION IMPEDANCE//TECHNOL UNIQUE RUMENTAT |