Class information for: |
Basic class information |
| ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
|---|---|---|---|
| 26914 | 199 | 15.0 | 57% |
Classes in level above (level 2) |
| ID, lev. above |
Publications | Label for level above |
|---|---|---|
| 740 | 11887 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
Terms with highest relevance score |
| Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|---|
| 1 | NANOSYST MFG | Address | 11 | 100% | 3% | 6 |
| 2 | NANOELECT PROC IL | Address | 3 | 60% | 2% | 3 |
| 3 | ION PROJECTION | Author keyword | 3 | 42% | 3% | 5 |
| 4 | MASKLESS IMPLANTATION | Author keyword | 2 | 67% | 1% | 2 |
| 5 | CONDENSED MATTER PHYS CMP | Address | 1 | 50% | 1% | 1 |
| 6 | ION BEAM PROXIMITY PRINTING | Author keyword | 1 | 50% | 1% | 1 |
| 7 | ION PROJECTION LITHOGRAPHY IPL | Author keyword | 1 | 50% | 1% | 1 |
| 8 | MAGNETIC NANOPARTICLE ARRAYS | Author keyword | 1 | 50% | 1% | 1 |
| 9 | MONOLITHIC INTEGRATED CIRCUITS ICS | Author keyword | 1 | 50% | 1% | 1 |
| 10 | MESOTAXY | Author keyword | 0 | 33% | 1% | 1 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
| Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | SILICON STENCIL MASKS | 8 | 100% | 3% | 5 |
| 2 | STENCIL MASKS | 4 | 38% | 4% | 8 |
| 3 | COLLOIDAL BIMETALLIC NANOCRYSTALS | 1 | 100% | 1% | 2 |
| 4 | OPTICAL REDUCTION | 1 | 100% | 1% | 2 |
| 5 | PROXIMITY LITHOGRAPHY | 1 | 40% | 1% | 2 |
| 6 | ION BEAM LITHOGRAPHY | 1 | 17% | 2% | 4 |
| 7 | INGAAS INP QUANTUM WIRES | 1 | 50% | 1% | 1 |
| 8 | MMA TMT RESIST | 1 | 50% | 1% | 1 |
| 9 | PLASMA ION SOURCE | 1 | 50% | 1% | 1 |
| 10 | SEM METROLOGY | 1 | 50% | 1% | 1 |
Journals |
Reviews |
| Title | Publ. year | Cit. | Active references | % act. ref. to same field |
|---|---|---|---|---|
| A review of ion projection lithography | 1998 | 83 | 59 | 47% |
| Recent developments in nanofabrication using ion projection lithography | 2005 | 23 | 37 | 54% |
| Nanoscience and nanotechnology in Europe | 1996 | 32 | 234 | 3% |
Address terms |
| Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | NANOSYST MFG | 11 | 100% | 3.0% | 6 |
| 2 | NANOELECT PROC IL | 3 | 60% | 1.5% | 3 |
| 3 | CONDENSED MATTER PHYS CMP | 1 | 50% | 0.5% | 1 |
| 4 | PHYS MIT IONENSTRAHLEN | 0 | 33% | 0.5% | 1 |
| 5 | IMS CHIPS | 0 | 25% | 0.5% | 1 |
| 6 | MICRO NANOCHEM ENGN C | 0 | 25% | 0.5% | 1 |
| 7 | ANALYT TOOL MAKING | 0 | 17% | 0.5% | 1 |
| 8 | ISOKO KU | 0 | 17% | 0.5% | 1 |
| 9 | KNIGHT | 0 | 13% | 0.5% | 1 |
| 10 | FLOW IPT | 0 | 100% | 0.5% | 1 |
Related classes at same level (level 1) |
| Rank | Relatedness score | Related classes |
|---|---|---|
| 1 | 0.0000258140 | LIQUID METAL ION SOURCE//LIQUID METAL ION SOURCES//ION BEAMS MAT |
| 2 | 0.0000246390 | PHOTOMASK//IC EQUIPMENT//PROXIMITY EFFECT CORRECTION |
| 3 | 0.0000213405 | STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING |
| 4 | 0.0000197769 | X RAY MASK//SUPER FINE SR LITHOG//X RAY LITHOGRAPHY |
| 5 | 0.0000166281 | PROTON BEAM WRITING//ION BEAM PLICAT//PROBE FORMING SYSTEM |
| 6 | 0.0000156922 | MICROWAVE POWER SENSOR//POWER SENSOR//GAAS MMIC |
| 8 | 0.0000092527 | UPR 6412//PT CR CO MULTILAYER//UPR 020 |
| 9 | 0.0000077898 | NEGATIVE ION IMPLANTATION//DELTA LAYERED NANOPARTICLES//AB INITIO MOLECULAR ORBITAL METHODS |
| 10 | 0.0000072581 | MICROCOLUMN//SCHOTTKY EMITTER//PROD DESIGN TECHNOL |