Class information for:
Level 1: ELECTROCHEMICAL VAPOR DEPOSITION//BETA DIKETONE METAL CHELATES//COLD PLASMA PROCESS

Basic class information

ID Publications Average number
of references
Avg. shr. active
ref. in WoS
26717 203 18.4 56%



Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)



ID, lev.
above
Publications Label for level above
119 23489 SOLID OXIDE FUEL CELLS//SOFC//SOLID STATE IONICS

Terms with highest relevance score



Rank Term Type of term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 ELECTROCHEMICAL VAPOR DEPOSITION Author keyword 8 62% 4% 8
2 BETA DIKETONE METAL CHELATES Author keyword 2 67% 1% 2
3 COLD PLASMA PROCESS Author keyword 2 67% 1% 2
4 PULSED PRESSURE MOCVD Author keyword 2 67% 1% 2
5 LASER CHEMICAL VAPOR DEPOSITION Author keyword 2 18% 4% 8
6 UMR7174 Address 1 50% 1% 2
7 PP MOCVD Author keyword 1 40% 1% 2
8 GENIE PROCEDES PLASMAS TRAITEMENTS SUR E Address 1 27% 1% 3
9 1 SILICON DEPOSIT Author keyword 1 50% 0% 1
10 2 THERMAL PLASMA Author keyword 1 50% 0% 1

Web of Science journal categories

Author Key Words



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
LCSH search Wikipedia search
1 ELECTROCHEMICAL VAPOR DEPOSITION 8 62% 4% 8 Search ELECTROCHEMICAL+VAPOR+DEPOSITION Search ELECTROCHEMICAL+VAPOR+DEPOSITION
2 BETA DIKETONE METAL CHELATES 2 67% 1% 2 Search BETA+DIKETONE+METAL+CHELATES Search BETA+DIKETONE+METAL+CHELATES
3 COLD PLASMA PROCESS 2 67% 1% 2 Search COLD+PLASMA+PROCESS Search COLD+PLASMA+PROCESS
4 PULSED PRESSURE MOCVD 2 67% 1% 2 Search PULSED+PRESSURE+MOCVD Search PULSED+PRESSURE+MOCVD
5 LASER CHEMICAL VAPOR DEPOSITION 2 18% 4% 8 Search LASER+CHEMICAL+VAPOR+DEPOSITION Search LASER+CHEMICAL+VAPOR+DEPOSITION
6 PP MOCVD 1 40% 1% 2 Search PP+MOCVD Search PP+MOCVD
7 1 SILICON DEPOSIT 1 50% 0% 1 Search 1+SILICON+DEPOSIT Search 1+SILICON+DEPOSIT
8 2 THERMAL PLASMA 1 50% 0% 1 Search 2+THERMAL+PLASMA Search 2+THERMAL+PLASMA
9 3 HYDROGENATION 1 50% 0% 1 Search 3+HYDROGENATION Search 3+HYDROGENATION
10 CAULIFLOWER LIKE MICROSTRUCTURE 1 50% 0% 1 Search CAULIFLOWER+LIKE+MICROSTRUCTURE Search CAULIFLOWER+LIKE+MICROSTRUCTURE

Key Words Plus



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 ZRCL4 H2 CO2 AR GAS MIXTURES 4 75% 1% 3
2 STABILIZED ZIRCONIA FILMS 2 18% 5% 11
3 LIQUID SOURCE 1 50% 0% 1
4 MICROCAVITY METHOD 0 20% 1% 2
5 CVD PROCESS 0 10% 2% 4
6 LIQUID INJECTION 0 17% 1% 2
7 YSZ LAYERS 0 15% 1% 2
8 AEROSOL IONIC REDISTRIBUTION 0 25% 0% 1
9 FILM PRECURSORS 0 25% 0% 1
10 SOURCE MOCVD 0 25% 0% 1

Journals

Reviews



Title Publ. year Cit. Active
references
% act. ref.
to same field
Thermal barrier coatings produced by chemical vapor deposition 2003 0 24 54%

Address terms



Rank Address term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 UMR7174 1 50% 1.0% 2
2 GENIE PROCEDES PLASMAS TRAITEMENTS SUR E 1 27% 1.5% 3
3 CHIM CONVERS ACTINIDES 1 50% 0.5% 1
4 GENIE PROC PLASMA TRAITEMENT SUR ES 1 50% 0.5% 1
5 MAT STRUCT MET 1 50% 0.5% 1
6 OBERFLACHENTECHN PLASMATECHN WERKSTOFFENTW 1 50% 0.5% 1
7 ADV ENERGY MAT SYST 0 33% 0.5% 1
8 LGPPTS ENSCP 0 33% 0.5% 1
9 MAT ELECT ENGN IWE 0 33% 0.5% 1
10 SUR E PROC MECH GRP 0 33% 0.5% 1

Related classes at same level (level 1)



Rank Relatedness score Related classes
1 0.0000211366 BATI2O5//BA2TI9O20//BATI4O9
2 0.0000188697 ADV COATINGS EXPT//REACTIVE ION ASSISTED COEVAPORATION//TETRAGONAL AND MONOCLINIC PHASES
3 0.0000158109 SOLID OXIDE FUEL CELLS//COMPOSITE CATHODE//CATHODE
4 0.0000126717 Y2O3 STABILISED//ELEKTROWARME//ABT RIO 41
5 0.0000113149 KAPPA AL2O3//ALUMINA COATINGS//COMBUSTION CHEMICAL VAPOR DEPOSITION
6 0.0000109662 ISOTHERMAL CHEMICAL VAPOR INFILTRATION//PRESSURE PULSED CHEMICAL VAPOR INFILTRATION//3D IMAGE BASED MODELING
7 0.0000100666 PARASITIC REACTION//CVD REACTOR//MOCVD REACTOR
8 0.0000096679 LANTHANIDE BETA DIKETONATES//BETA DIKETONATES//BETA DIKETONATE CHELATES
9 0.0000090775 SOLID OXIDE ELECTROLYSIS CELL//SOLID OXIDE ELECTROLYZER//HIGH TEMPERATURE ELECTROLYSIS
10 0.0000089611 CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK