Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
26717 | 203 | 18.4 | 56% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
119 | 23489 | SOLID OXIDE FUEL CELLS//SOFC//SOLID STATE IONICS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | ELECTROCHEMICAL VAPOR DEPOSITION | Author keyword | 8 | 62% | 4% | 8 |
2 | BETA DIKETONE METAL CHELATES | Author keyword | 2 | 67% | 1% | 2 |
3 | COLD PLASMA PROCESS | Author keyword | 2 | 67% | 1% | 2 |
4 | PULSED PRESSURE MOCVD | Author keyword | 2 | 67% | 1% | 2 |
5 | LASER CHEMICAL VAPOR DEPOSITION | Author keyword | 2 | 18% | 4% | 8 |
6 | UMR7174 | Address | 1 | 50% | 1% | 2 |
7 | PP MOCVD | Author keyword | 1 | 40% | 1% | 2 |
8 | GENIE PROCEDES PLASMAS TRAITEMENTS SUR E | Address | 1 | 27% | 1% | 3 |
9 | 1 SILICON DEPOSIT | Author keyword | 1 | 50% | 0% | 1 |
10 | 2 THERMAL PLASMA | Author keyword | 1 | 50% | 0% | 1 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ZRCL4 H2 CO2 AR GAS MIXTURES | 4 | 75% | 1% | 3 |
2 | STABILIZED ZIRCONIA FILMS | 2 | 18% | 5% | 11 |
3 | LIQUID SOURCE | 1 | 50% | 0% | 1 |
4 | MICROCAVITY METHOD | 0 | 20% | 1% | 2 |
5 | CVD PROCESS | 0 | 10% | 2% | 4 |
6 | LIQUID INJECTION | 0 | 17% | 1% | 2 |
7 | YSZ LAYERS | 0 | 15% | 1% | 2 |
8 | AEROSOL IONIC REDISTRIBUTION | 0 | 25% | 0% | 1 |
9 | FILM PRECURSORS | 0 | 25% | 0% | 1 |
10 | SOURCE MOCVD | 0 | 25% | 0% | 1 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Thermal barrier coatings produced by chemical vapor deposition | 2003 | 0 | 24 | 54% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | UMR7174 | 1 | 50% | 1.0% | 2 |
2 | GENIE PROCEDES PLASMAS TRAITEMENTS SUR E | 1 | 27% | 1.5% | 3 |
3 | CHIM CONVERS ACTINIDES | 1 | 50% | 0.5% | 1 |
4 | GENIE PROC PLASMA TRAITEMENT SUR ES | 1 | 50% | 0.5% | 1 |
5 | MAT STRUCT MET | 1 | 50% | 0.5% | 1 |
6 | OBERFLACHENTECHN PLASMATECHN WERKSTOFFENTW | 1 | 50% | 0.5% | 1 |
7 | ADV ENERGY MAT SYST | 0 | 33% | 0.5% | 1 |
8 | LGPPTS ENSCP | 0 | 33% | 0.5% | 1 |
9 | MAT ELECT ENGN IWE | 0 | 33% | 0.5% | 1 |
10 | SUR E PROC MECH GRP | 0 | 33% | 0.5% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000211366 | BATI2O5//BA2TI9O20//BATI4O9 |
2 | 0.0000188697 | ADV COATINGS EXPT//REACTIVE ION ASSISTED COEVAPORATION//TETRAGONAL AND MONOCLINIC PHASES |
3 | 0.0000158109 | SOLID OXIDE FUEL CELLS//COMPOSITE CATHODE//CATHODE |
4 | 0.0000126717 | Y2O3 STABILISED//ELEKTROWARME//ABT RIO 41 |
5 | 0.0000113149 | KAPPA AL2O3//ALUMINA COATINGS//COMBUSTION CHEMICAL VAPOR DEPOSITION |
6 | 0.0000109662 | ISOTHERMAL CHEMICAL VAPOR INFILTRATION//PRESSURE PULSED CHEMICAL VAPOR INFILTRATION//3D IMAGE BASED MODELING |
7 | 0.0000100666 | PARASITIC REACTION//CVD REACTOR//MOCVD REACTOR |
8 | 0.0000096679 | LANTHANIDE BETA DIKETONATES//BETA DIKETONATES//BETA DIKETONATE CHELATES |
9 | 0.0000090775 | SOLID OXIDE ELECTROLYSIS CELL//SOLID OXIDE ELECTROLYZER//HIGH TEMPERATURE ELECTROLYSIS |
10 | 0.0000089611 | CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK |