Class information for:
Level 1: POLY SIGE//POLY SI1 XGEX//POLYCRYSTALLINE SILICON GERMANIUM

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
26500 208 16.4 55%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
993 9970 THIN FILM TRANSISTOR//THIN FILM TRANSISTORS TFTS//THIN FILM TRANSISTOR TFT

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 POLY SIGE Author keyword 5 25% 9% 18
2 POLY SI1 XGEX Author keyword 3 57% 2% 4
3 POLYCRYSTALLINE SILICON GERMANIUM Author keyword 1 38% 1% 3
4 MEMS POSTPROCESSING Author keyword 1 100% 1% 2
5 PROC MODULE DEV Address 1 50% 1% 2
6 SILICON GERMANIUM FILMS Author keyword 1 50% 1% 2
7 VALENCE BAND TUNNELING Author keyword 1 50% 1% 2
8 ADV MAT PROCLAMP Address 1 50% 0% 1
9 AMORPHOUS SI TI Author keyword 1 50% 0% 1
10 CAPACITIVE DEVICES Author keyword 1 50% 0% 1

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 POLY SIGE 5 25% 9% 18 Search POLY+SIGE Search POLY+SIGE
2 POLY SI1 XGEX 3 57% 2% 4 Search POLY+SI1+XGEX Search POLY+SI1+XGEX
3 POLYCRYSTALLINE SILICON GERMANIUM 1 38% 1% 3 Search POLYCRYSTALLINE+SILICON+GERMANIUM Search POLYCRYSTALLINE+SILICON+GERMANIUM
4 MEMS POSTPROCESSING 1 100% 1% 2 Search MEMS+POSTPROCESSING Search MEMS+POSTPROCESSING
5 SILICON GERMANIUM FILMS 1 50% 1% 2 Search SILICON+GERMANIUM+FILMS Search SILICON+GERMANIUM+FILMS
6 VALENCE BAND TUNNELING 1 50% 1% 2 Search VALENCE+BAND+TUNNELING Search VALENCE+BAND+TUNNELING
7 AMORPHOUS SI TI 1 50% 0% 1 Search AMORPHOUS+SI+TI Search AMORPHOUS+SI+TI
8 CAPACITIVE DEVICES 1 50% 0% 1 Search CAPACITIVE+DEVICES Search CAPACITIVE+DEVICES
9 EFFECTIVE CARRIER CONCENTRATION 1 50% 0% 1 Search EFFECTIVE+CARRIER+CONCENTRATION Search EFFECTIVE+CARRIER+CONCENTRATION
10 ELECTRICAL CHARECTERIZATION 1 50% 0% 1 Search ELECTRICAL+CHARECTERIZATION Search ELECTRICAL+CHARECTERIZATION

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SILICON GERMANIUM FILMS 22 67% 10% 20
2 OXIDE SEMICONDUCTOR APPLICATIONS 6 100% 2% 4
3 POLY SIGE 3 43% 3% 6
4 SI1 XGEX FILMS 3 22% 6% 13
5 POLYCRYSTALLINE SI1 XGEX 3 60% 1% 3
6 POLYCRYSTALLINE SIXGE1 X FILMS 1 38% 1% 3
7 210 DEGREES C 1 100% 1% 2
8 GATE MATERIAL 1 100% 1% 2
9 POLYCRYSTALLINE SI1 XGEX FILMS 1 50% 1% 2
10 POLYCRYSTALLINE SILICON GERMANIUM 1 25% 2% 4

Journals

Reviews

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 PROC MODULE DEV 1 50% 1.0% 2
2 ADV MAT PROCLAMP 1 50% 0.5% 1
3 DEVICE CHARACTERIZAT 1 50% 0.5% 1
4 OPEN HIGH TEMP MAT TESTING 0 25% 0.5% 1
5 SEMICOND COMPONENTS CCS 0 25% 0.5% 1
6 MICROTECHNOL CHALMERS MC2 0 12% 1.0% 2
7 ELECT SOLID STATE ELECT 0 14% 0.5% 1
8 YJ SCI TECHNOL 0 11% 0.5% 1
9 YOUSSEF JAMEEL SCI TECHNOL 0 11% 0.5% 1
10 ELECT DEVICES CO 0 10% 0.5% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000242613 METAL INDUCED CRYSTALLIZATION//SOLID PHASE CRYSTALLIZATION//METAL INDUCED LATERAL CRYSTALLIZATION
2 0.0000202661 ATOMIC LAYER DOPING//SI EPITAXIAL GROWTH//GERMANIUM SILICON COMPOUNDS
3 0.0000128611 POLYSILICON RESISTORS//HEAVILY DOPED POLYSILICON RESISTOR//LPCVD SI LAYERS
4 0.0000124691 POLY SI TFT//POLYCRYSTALLINE SILICON THIN FILM TRANSISTORS POLY SI TFTS//JOINT SCI TECHNOL
5 0.0000113825 STRAINED SI//SIGE//STRAINED SILICON
6 0.0000108913 UNCOOLED INFRARED IMAGING//OPTICAL READOUT//MICROBOLOMETER
7 0.0000105447 ANTIFUSE//SOURCE GATED TRANSISTOR SGT//MULTITIME PROGRAMMABLE MTP
8 0.0000080087 GERMANIUM CARBON//A SIGE//GE1 XCX
9 0.0000075896 BORON PENETRATION//REMOTE PLASMA NITRIDATION RPN//SI NITRIDE
10 0.0000072153 DIRECT TUNNELING//QUANTUM MECHANICAL EFFECTS QMES//WAVE FUNCTION PENETRATION