Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
2562 | 2136 | 19.0 | 59% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1490 | 7092 | EUV LITHOG//UNDULATORS//SPECTROMICROSCOPY |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | EUV LITHOG | Address | 38 | 93% | 1% | 14 |
2 | SOFT XRAY MICROSCOPY | Address | 27 | 92% | 1% | 11 |
3 | XRAY OPT | Address | 20 | 20% | 4% | 87 |
4 | PRECIS OPT ENGN | Address | 17 | 29% | 2% | 50 |
5 | X RAY EUV OPTICS | Author keyword | 13 | 62% | 1% | 13 |
6 | GOLD | Address | 12 | 59% | 1% | 13 |
7 | SOFT X RAY RANGE | Author keyword | 11 | 100% | 0% | 6 |
8 | SIBERIAN SR | Address | 11 | 69% | 0% | 9 |
9 | SCHWARZSCHILD OPTICS | Author keyword | 10 | 63% | 0% | 10 |
10 | DC DE | Address | 9 | 83% | 0% | 5 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | X RAY EUV OPTICS | 13 | 62% | 1% | 13 | Search X+RAY+EUV+OPTICS | Search X+RAY+EUV+OPTICS |
2 | SOFT X RAY RANGE | 11 | 100% | 0% | 6 | Search SOFT+X+RAY+RANGE | Search SOFT+X+RAY+RANGE |
3 | SCHWARZSCHILD OPTICS | 10 | 63% | 0% | 10 | Search SCHWARZSCHILD+OPTICS | Search SCHWARZSCHILD+OPTICS |
4 | X RAY MULTILAYER | 9 | 83% | 0% | 5 | Search X+RAY+MULTILAYER | Search X+RAY+MULTILAYER |
5 | MULTILAYER MIRRORS | 8 | 26% | 1% | 27 | Search MULTILAYER+MIRRORS | Search MULTILAYER+MIRRORS |
6 | EXTREME ULTRAVIOLET | 6 | 12% | 2% | 50 | Search EXTREME+ULTRAVIOLET | Search EXTREME+ULTRAVIOLET |
7 | SOFT X RAY MULTILAYERS | 6 | 71% | 0% | 5 | Search SOFT+X+RAY+MULTILAYERS | Search SOFT+X+RAY+MULTILAYERS |
8 | EUV MULTILAYER | 5 | 55% | 0% | 6 | Search EUV+MULTILAYER | Search EUV+MULTILAYER |
9 | MO SI | 4 | 24% | 1% | 16 | Search MO+SI | Search MO+SI |
10 | APERIODIC MULTILAYER | 4 | 67% | 0% | 4 | Search APERIODIC+MULTILAYER | Search APERIODIC+MULTILAYER |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MO SI MULTILAYERS | 75 | 64% | 3% | 73 |
2 | MO SI | 47 | 52% | 3% | 64 |
3 | X RAY MIRRORS | 46 | 59% | 2% | 51 |
4 | MIRRORS | 30 | 12% | 11% | 240 |
5 | SUB QUARTERWAVE MULTILAYERS | 18 | 89% | 0% | 8 |
6 | W SI MULTILAYERS | 17 | 79% | 1% | 11 |
7 | W C MULTILAYERS | 17 | 100% | 0% | 8 |
8 | MULTILAYER MIRRORS | 16 | 31% | 2% | 43 |
9 | LAYERED SYNTHETIC MICROSTRUCTURES | 16 | 61% | 1% | 17 |
10 | W C | 15 | 68% | 1% | 13 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Nanometer interface and materials control for multilayer EUV-optical applications | 2011 | 28 | 104 | 70% |
X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 | 1993 | 2768 | 25 | 20% |
Extreme ultraviolet lithography: A review | 2007 | 29 | 39 | 49% |
Properties of ultrathin films appropriate for optics capping layers exposed to high energy photon irradiation | 2008 | 33 | 78 | 38% |
Thin film and surface characterization by specular X-ray reflectivity | 1997 | 132 | 140 | 20% |
Recent Activities on Extreme Ultraviolet Lithography in NewSUBARU | 2013 | 2 | 22 | 64% |
Reactive diffusion in multilayer metal/silicon nanostructures | 2011 | 6 | 79 | 51% |
X-ray Optics | 2012 | 0 | 1 | 100% |
Precision imaging multilayer optics for soft X-rays and extreme ultraviolet bands | 2012 | 1 | 59 | 58% |
CHARACTERIZATION OF X-UV MULTILAYERS BY GRAZING-INCIDENCE X-RAY REFLECTOMETRY | 1988 | 87 | 16 | 56% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | EUV LITHOG | 38 | 93% | 0.7% | 14 |
2 | SOFT XRAY MICROSCOPY | 27 | 92% | 0.5% | 11 |
3 | XRAY OPT | 20 | 20% | 4.1% | 87 |
4 | PRECIS OPT ENGN | 17 | 29% | 2.3% | 50 |
5 | GOLD | 12 | 59% | 0.6% | 13 |
6 | SIBERIAN SR | 11 | 69% | 0.4% | 9 |
7 | DC DE | 9 | 83% | 0.2% | 5 |
8 | LUXOR | 8 | 50% | 0.6% | 12 |
9 | SYNCHROTRON LIGHT SOURCE BEAMLINE X24C | 6 | 100% | 0.2% | 4 |
10 | ADV SCI TECHNOL IND | 6 | 12% | 2.0% | 43 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000180008 | PHOTON MICROFABRICAT//APLANATIC OPTICS//MCP OPTICS |
2 | 0.0000128412 | COLLECTOR OPTICS//ADV INTERDISCIPLINARY SCI//MAT EXTREME ENVIRONM |
3 | 0.0000103324 | NEUTRON SPECULAR REFLECTION//MAGNETIC REFERENCE LAYER//PHASE PROBLEM |
4 | 0.0000091087 | HALF BRIGHTNESS DOSE//UNIDAD RADIAC IONIZANTES//ASOCIAC EUROTOM |
5 | 0.0000083750 | X RAY MICROSCOPY//FRESNEL ZONE PLATES//RONTGENPHYS |
6 | 0.0000083558 | SPACE NANOTECHNOL//FREESTANDING TRANSMISSION GRATING//SINGLE ORDER DIFFRACTION |
7 | 0.0000073776 | GASSENDI//FRONT ENDS//VARIED LINE SPACING GRATINGS |
8 | 0.0000064857 | RESIST SENSITIVITY//MATH CHEM ENGN//RECTIFICATION PROPERTY |
9 | 0.0000056937 | OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//BOTTOM ANTIREFLECTIVE COATINGS |
10 | 0.0000053489 | TOTAL EXTERNAL REFLECTION//X RAY STANDING WAVES//LAYERED SYNTHETIC MICROSTRUCTURES |