Class information for:
Level 1: LADDER SHAPED ELECTRODE//PLASMA ATOM PHYS//VHF PLASMA

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
2524 2147 24.1 65%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
512 14399 PLASMA SOURCES SCIENCE & TECHNOLOGY//PLASMA DISPLAY PANEL PDP//PLASMA DISPLAY PANEL

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 LADDER SHAPED ELECTRODE Author keyword 33 100% 1% 13
2 PLASMA ATOM PHYS Address 26 47% 2% 41
3 VHF PLASMA Author keyword 19 63% 1% 19
4 CAPACITIVELY COUPLED PLASMAS Author keyword 18 83% 0% 10
5 CAPACITIVELY COUPLED PLASMA Author keyword 13 34% 1% 30
6 PLASMA SCI TECHNOL Address 12 17% 3% 63
7 PLASMA MOLDING Author keyword 9 83% 0% 5
8 ELECTRICAL ASYMMETRY EFFECT Author keyword 8 100% 0% 5
9 RF CAPACITIVE DISCHARGE Author keyword 8 100% 0% 5
10 RF DISCHARGE Author keyword 7 17% 2% 36

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 LADDER SHAPED ELECTRODE 33 100% 1% 13 Search LADDER+SHAPED+ELECTRODE Search LADDER+SHAPED+ELECTRODE
2 VHF PLASMA 19 63% 1% 19 Search VHF+PLASMA Search VHF+PLASMA
3 CAPACITIVELY COUPLED PLASMAS 18 83% 0% 10 Search CAPACITIVELY+COUPLED+PLASMAS Search CAPACITIVELY+COUPLED+PLASMAS
4 CAPACITIVELY COUPLED PLASMA 13 34% 1% 30 Search CAPACITIVELY+COUPLED+PLASMA Search CAPACITIVELY+COUPLED+PLASMA
5 PLASMA MOLDING 9 83% 0% 5 Search PLASMA+MOLDING Search PLASMA+MOLDING
6 ELECTRICAL ASYMMETRY EFFECT 8 100% 0% 5 Search ELECTRICAL+ASYMMETRY+EFFECT Search ELECTRICAL+ASYMMETRY+EFFECT
7 RF CAPACITIVE DISCHARGE 8 100% 0% 5 Search RF+CAPACITIVE+DISCHARGE Search RF+CAPACITIVE+DISCHARGE
8 RF DISCHARGE 7 17% 2% 36 Search RF+DISCHARGE Search RF+DISCHARGE
9 PULSED PROBE 6 80% 0% 4 Search PULSED+PROBE Search PULSED+PROBE
10 CAPACITIVE DISCHARGES 6 100% 0% 4 Search CAPACITIVE+DISCHARGES Search CAPACITIVE+DISCHARGES

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 RF DISCHARGES 74 43% 6% 130
2 RF GLOW DISCHARGES 67 52% 4% 92
3 1356 MHZ 60 62% 3% 62
4 RADIOFREQUENCY DISCHARGES 55 43% 5% 99
5 GLOW DISCHARGES 53 26% 8% 179
6 SHAPED ELECTRODE 50 88% 1% 23
7 RADIOFREQUENCY GLOW DISCHARGES 49 69% 2% 42
8 FUNCTIONAL SEPARATION 46 75% 2% 33
9 RADIO FREQUENCY DISCHARGES 40 63% 2% 40
10 POWERED ELECTRODE 38 89% 1% 17

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Electromagnetic effects in high-frequency capacitive discharges used for plasma processing 2007 61 31 90%
Ion energy distributions in rf sheaths; review, analysis and simulation 1999 143 34 85%
A brief review of dual-frequency capacitively coupled discharges 2011 14 125 96%
From Fermi acceleration to collisionless discharge heating 1998 130 57 56%
Collisionless heating in radio-frequency discharges: a review 2009 35 79 65%
Particle and fluid simulations of low-temperature plasma discharges: benchmarks and kinetic effects 2005 103 81 46%
Tailored ion energy distributions on plasma electrodes 2013 4 80 84%
Two-dimensional fluid modelling of charged particle transport in radio-frequency capacitively coupled discharges 2002 48 73 67%
Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design 2009 68 28 21%
Cold-cathode discharges and breakdown in argon: surface and gas phase production of secondary electrons 1999 273 68 15%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 PLASMA ATOM PHYS 26 47% 1.9% 41
2 PLASMA SCI TECHNOL 12 17% 2.9% 63
3 PLASMA ATOMPHYS 6 71% 0.2% 5
4 PHYS TECHNOL PLASMAS 6 19% 1.3% 27
5 ELECT ENGN COMP SCI 1770 6 100% 0.2% 4
6 IMPEDANS LTD 6 100% 0.2% 4
7 LPP CNRS 5 60% 0.3% 6
8 YAMANASHI TECHNOL DEV 5 63% 0.2% 5
9 NAGASAKI SHIPYARD MACHINERY WORKS 5 30% 0.6% 13
10 THEORET ELECT ENGN 5 18% 1.1% 23

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000281005 LOW INDUCTANCE ANTENNA//LOW DAMAGE PROCESS//INDUCTIVELY COUPLED PLASMA
2 0.0000202093 VACUUM TECHNOL//ACTIVE PLASMA RESONANCE SPECTROSCOPY//CUTOFF PROBE
3 0.0000145217 BOHM CRITERION//PLASMA SOLID INTERACTION//EMISSIVE PROBE
4 0.0000142147 ELECT DEVICES MAT TECHNOL//SIO2 ETCHING//PLASMA ETCHING
5 0.0000133524 SPATIALLY INHOMOGENEOUS BOLTZMANN EQUATION//IONIZATION WAVES//ELECTRON VELOCITY DISTRIBUTION FUNCTION
6 0.0000123172 DUST PARTICLE GROWTH//CNRS LPICM//PARTICLE CHARGE DISTRIBUTION
7 0.0000110163 NON STANDARD LIGHTNING IMPULSE WAVEFORM//DIELECTRIC BREAKDOWN VOLTAGE TIME CHARACTERISTICS V T CHARACTERISTICS//CO2 GAS GAP
8 0.0000087601 METASTABLE PARTICLES//HACES DIRIGIDOS//SURFACE LOSS RATE
9 0.0000083943 FOKKER PLANCK LANDAU EQUATION//DARWIN MODEL//COULOMB COLLISIONS
10 0.0000082843 SIH2//SIH3//SILANE PLASMA