Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
2435 | 2176 | 19.9 | 63% |
Classes in level above (level 2) |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | TRIMETHYLINDIUM | Author keyword | 16 | 58% | 1% | 18 |
2 | CHEMICAL BEAM EPITAXY CBE | Author keyword | 9 | 64% | 0% | 9 |
3 | MOLECULAR LAYER EPITAXY | Author keyword | 8 | 62% | 0% | 8 |
4 | TERTIARYBUTYLPHOSPHINE | Author keyword | 6 | 48% | 0% | 10 |
5 | OMVPE IL | Address | 6 | 80% | 0% | 4 |
6 | MOLECULAR LAYER EPITAXY MLE | Author keyword | 6 | 100% | 0% | 4 |
7 | METALORGANICS | Author keyword | 5 | 54% | 0% | 7 |
8 | TRIMETHYLGALLIUM | Author keyword | 5 | 28% | 1% | 14 |
9 | MOMBE | Author keyword | 4 | 18% | 1% | 21 |
10 | NITROGEN CARRIER GAS | Author keyword | 4 | 75% | 0% | 3 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | TRIMETHYLINDIUM | 16 | 58% | 1% | 18 | Search TRIMETHYLINDIUM | Search TRIMETHYLINDIUM |
2 | CHEMICAL BEAM EPITAXY CBE | 9 | 64% | 0% | 9 | Search CHEMICAL+BEAM+EPITAXY+CBE | Search CHEMICAL+BEAM+EPITAXY+CBE |
3 | MOLECULAR LAYER EPITAXY | 8 | 62% | 0% | 8 | Search MOLECULAR+LAYER+EPITAXY | Search MOLECULAR+LAYER+EPITAXY |
4 | TERTIARYBUTYLPHOSPHINE | 6 | 48% | 0% | 10 | Search TERTIARYBUTYLPHOSPHINE | Search TERTIARYBUTYLPHOSPHINE |
5 | MOLECULAR LAYER EPITAXY MLE | 6 | 100% | 0% | 4 | Search MOLECULAR+LAYER+EPITAXY+MLE | Search MOLECULAR+LAYER+EPITAXY+MLE |
6 | METALORGANICS | 5 | 54% | 0% | 7 | Search METALORGANICS | Search METALORGANICS |
7 | TRIMETHYLGALLIUM | 5 | 28% | 1% | 14 | Search TRIMETHYLGALLIUM | Search TRIMETHYLGALLIUM |
8 | MOMBE | 4 | 18% | 1% | 21 | Search MOMBE | Search MOMBE |
9 | NITROGEN CARRIER GAS | 4 | 75% | 0% | 3 | Search NITROGEN+CARRIER+GAS | Search NITROGEN+CARRIER+GAS |
10 | ATOMIC LAYER EPITAXY | 4 | 12% | 1% | 29 | Search ATOMIC+LAYER+EPITAXY | Search ATOMIC+LAYER+EPITAXY |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | TRIETHYLGALLIUM | 87 | 66% | 4% | 81 |
2 | TRIMETHYLGALLIUM | 67 | 40% | 6% | 130 |
3 | TERTIARY BUTYLPHOSPHINE | 42 | 94% | 1% | 15 |
4 | CBE | 41 | 65% | 2% | 40 |
5 | ARSINE | 35 | 36% | 4% | 79 |
6 | TERTIARYBUTYLPHOSPHINE | 34 | 57% | 2% | 40 |
7 | TERTIARYBUTYLARSINE | 32 | 43% | 3% | 57 |
8 | MOMBE GROWTH | 29 | 72% | 1% | 23 |
9 | TERTIARY BUTYLARSINE | 29 | 88% | 1% | 14 |
10 | MOMBE | 28 | 36% | 3% | 63 |
Journals |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ACTA POLYTECHNICA SCANDINAVICA-CHEMICAL TECHNOLOGY SERIES | 1 | 16% | 0% | 8 |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
METALORGANIC PRECURSORS FOR VAPOR-PHASE EPITAXY | 1993 | 83 | 151 | 60% |
Developments in metalorganic precursors for semiconductor growth from the vapour phase | 1997 | 36 | 33 | 45% |
ORGANOMETALLIC PRECURSORS IN THE GROWTH OF EPITAXIAL THIN-FILMS OF GROUPS III-V SEMICONDUCTORS BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION | 1991 | 61 | 142 | 68% |
Organometallic vapor phase epitaxy (OMVPE) | 1999 | 25 | 55 | 33% |
Fundamental aspects of organometallic vapor phase epitaxy | 2001 | 17 | 96 | 39% |
COMPOUND SEMICONDUCTOR GROWTH BY METALLORGANIC MOLECULAR-BEAM EPITAXY (MOMBE) | 1995 | 12 | 106 | 59% |
MECHANISMS OF GAAS ATOMIC LAYER EPITAXY - A REVIEW OF PROGRESS | 1994 | 13 | 46 | 76% |
ORGANOMETALLIC MOLECULAR PRECURSORS FOR LOW-TEMPERATURE MOCVD OF III-V SEMICONDUCTORS | 1991 | 27 | 45 | 89% |
Role of surface chemistry in semiconductor thin film processing | 1996 | 53 | 168 | 16% |
ATOMIC LAYER EPITAXY OF III-V COMPOUNDS USING METALORGANIC AND HYDRIDE SOURCES | 1992 | 23 | 92 | 78% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | OMVPE IL | 6 | 80% | 0.2% | 4 |
2 | SENDAI | 3 | 19% | 0.6% | 12 |
3 | ENGN MECHATRON PRECIS ENGN | 1 | 100% | 0.1% | 2 |
4 | SHIPLEY METALORGAN | 1 | 100% | 0.1% | 2 |
5 | TELECOMMUN ADVANCEMENT ORG J AN | 1 | 33% | 0.1% | 3 |
6 | TELECOMMUN ADV ORG J AN | 1 | 40% | 0.1% | 2 |
7 | 35 TECHNOL | 1 | 50% | 0.0% | 1 |
8 | CHEM BIOCHEM MAT CHEM | 1 | 50% | 0.0% | 1 |
9 | DFALPD | 1 | 50% | 0.0% | 1 |
10 | ELECT SEMICOND | 1 | 50% | 0.0% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000221170 | CARBON DOPING//CBR4//C DOPED GAAS |
2 | 0.0000193059 | ING ELECT SEES//SECC PUEBLA//ALLOY SOURCE |
3 | 0.0000182915 | SELECTIVE AREA GROWTH//TERTIARYBUTYLCHLORIDE//SELECTIVE EPITAXY |
4 | 0.0000174144 | DIMETHYLZINC ADDUCTS//MOCVD METAL ORGANIC CHEMICAL VAPOR DEPOSITION//PHASE RULES |
5 | 0.0000154280 | INASP INP//INASP//QUANTUM PHOTOVOLTA GRP |
6 | 0.0000147232 | PARASITIC REACTION//CVD REACTOR//MOCVD REACTOR |
7 | 0.0000125098 | OVAL DEFECTS//SEEIE//GA AS BI SOLUTION |
8 | 0.0000092440 | SURFACE PHOTOABSORPTION//REFLECTANCE ANISOTROPY SPECTROSCOPY//REFLECTION ANISOTROPY SPECTROSCOPY |
9 | 0.0000081021 | LUMILEDS LIGHTING//ZINC DIFFUSION//ACCEPTOR DIFFUSION |
10 | 0.0000076778 | ATOMIC HYDROGEN CLEANING//ECR HYDROGEN PLASMA//IN SITU VACUUM PROCESS |