Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
2430 | 2179 | 16.0 | 53% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
138 | 22619 | IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | HOT CARRIER | Author keyword | 30 | 30% | 4% | 86 |
2 | CHANNEL INITIATED SECONDARY ELECTRON CHISEL | Author keyword | 24 | 91% | 0% | 10 |
3 | HOT CARRIER DEGRADATION | Author keyword | 17 | 41% | 1% | 32 |
4 | CHARGE PUMPING CP | Author keyword | 16 | 47% | 1% | 25 |
5 | HOT CARRIER EFFECT | Author keyword | 13 | 38% | 1% | 26 |
6 | CHARGE PUMPING | Author keyword | 12 | 25% | 2% | 42 |
7 | HOT CARRIER INDUCED DEGRADATION | Author keyword | 11 | 60% | 1% | 12 |
8 | CHANNEL HOT ELECTRON CHE | Author keyword | 11 | 69% | 0% | 9 |
9 | EFFECTIVE CHANNEL LENGTH | Author keyword | 9 | 41% | 1% | 17 |
10 | HOT CARRIERS HCS | Author keyword | 9 | 83% | 0% | 5 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | HOT CARRIER | 30 | 30% | 4% | 86 | Search HOT+CARRIER | Search HOT+CARRIER |
2 | CHANNEL INITIATED SECONDARY ELECTRON CHISEL | 24 | 91% | 0% | 10 | Search CHANNEL+INITIATED+SECONDARY+ELECTRON+CHISEL | Search CHANNEL+INITIATED+SECONDARY+ELECTRON+CHISEL |
3 | HOT CARRIER DEGRADATION | 17 | 41% | 1% | 32 | Search HOT+CARRIER+DEGRADATION | Search HOT+CARRIER+DEGRADATION |
4 | CHARGE PUMPING CP | 16 | 47% | 1% | 25 | Search CHARGE+PUMPING+CP | Search CHARGE+PUMPING+CP |
5 | HOT CARRIER EFFECT | 13 | 38% | 1% | 26 | Search HOT+CARRIER+EFFECT | Search HOT+CARRIER+EFFECT |
6 | CHARGE PUMPING | 12 | 25% | 2% | 42 | Search CHARGE+PUMPING | Search CHARGE+PUMPING |
7 | HOT CARRIER INDUCED DEGRADATION | 11 | 60% | 1% | 12 | Search HOT+CARRIER+INDUCED+DEGRADATION | Search HOT+CARRIER+INDUCED+DEGRADATION |
8 | CHANNEL HOT ELECTRON CHE | 11 | 69% | 0% | 9 | Search CHANNEL+HOT+ELECTRON+CHE | Search CHANNEL+HOT+ELECTRON+CHE |
9 | EFFECTIVE CHANNEL LENGTH | 9 | 41% | 1% | 17 | Search EFFECTIVE+CHANNEL+LENGTH | Search EFFECTIVE+CHANNEL+LENGTH |
10 | HOT CARRIERS HCS | 9 | 83% | 0% | 5 | Search HOT+CARRIERS+HCS | Search HOT+CARRIERS+HCS |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | LDD MOSFETS | 77 | 75% | 3% | 56 |
2 | HOT CARRIER DEGRADATION | 54 | 53% | 3% | 71 |
3 | DEVICE DEGRADATION | 36 | 60% | 2% | 40 |
4 | MOSFET DEGRADATION | 35 | 57% | 2% | 42 |
5 | CHANNEL MOSFETS | 33 | 38% | 3% | 68 |
6 | INDUCED MOSFET DEGRADATION | 27 | 72% | 1% | 21 |
7 | EFFECTIVE CHANNEL LENGTH | 24 | 59% | 1% | 27 |
8 | CHARGE PUMPING TECHNIQUE | 21 | 51% | 1% | 29 |
9 | DYNAMIC DEGRADATION | 18 | 89% | 0% | 8 |
10 | LIFETIME PREDICTION METHOD | 18 | 89% | 0% | 8 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Characterization of total safe operating area of lateral DMOS transistors | 2006 | 37 | 13 | 46% |
A review of hot-carrier degradation mechanisms in MOSFETs | 1996 | 31 | 88 | 74% |
UNDERSTANDING HOT-ELECTRON TRANSPORT IN SILICON DEVICES - IS THERE A SHORTCUT | 1995 | 157 | 75 | 20% |
DRAIN-ENGINEERED HOT-ELECTRON-RESISTANT DEVICE STRUCTURES - A REVIEW | 1989 | 54 | 8 | 100% |
HOT-CARRIER DEGRADATION IN SUBMICROMETER MOSFETS - FROM UNIFORM INJECTION TOWARDS THE REAL OPERATING-CONDITIONS | 1995 | 25 | 28 | 50% |
Experimental methods for investigating the defect properties of SiO2 in metal oxide semiconductor transistors | 1998 | 2 | 32 | 91% |
HOT-CARRIER-RELATED DEVICE RELIABILITY FOR DIGITAL AND ANALOG CMOS CIRCUITS | 1995 | 4 | 21 | 95% |
Hot-carrier injections in SiO2 | 1998 | 9 | 135 | 44% |
Reliability phenomena under AC stress | 1998 | 12 | 3 | 33% |
HOT-ELECTRON DEVICE MONITORING AND CHARACTERIZATION - A REVIEW | 1988 | 1 | 13 | 69% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | EXPLORATORY DEVICE | 6 | 100% | 0.2% | 4 |
2 | IUT ROUEN | 6 | 50% | 0.4% | 8 |
3 | FLORIDA SOLID STATE ELECT | 5 | 55% | 0.3% | 6 |
4 | PROC DEV IMPLEMENTAT | 4 | 67% | 0.2% | 4 |
5 | PHYS COMPOSANTS SEMICONDUCTEURS | 4 | 75% | 0.1% | 3 |
6 | SAGE ENISO | 3 | 100% | 0.1% | 3 |
7 | CHIP DESIGN RELIABIL | 3 | 40% | 0.3% | 6 |
8 | ELECT ENGN ADV OPTOELECT | 2 | 67% | 0.1% | 2 |
9 | CHRISTIAN DOPPLER RELIABIL ISSUES MICROELECT | 2 | 50% | 0.1% | 3 |
10 | SEMICOND TECHNOL PLICAT GRP | 2 | 26% | 0.3% | 6 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000208903 | CRYOGENIC CMOS//LOW TEMPERATURE ELECTRONICS//LOW TEMPERATURE CIRCUIT |
2 | 0.0000191145 | SID4//DEUTERIUM D ANNEALING//TRAP CREATION |
3 | 0.0000181850 | NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI//NEGATIVE BIAS TEMPERATURE INSTABILITY//CHRISTIAN DOPPLER TCAD |
4 | 0.0000167480 | NONQUASI STATIC NQS EFFECT//QUCS//RSCE |
5 | 0.0000121439 | SIDEWALL OXIDATION//COMPUTAT ELECT//MEMORY DEVICE BUSINESS |
6 | 0.0000119673 | STRESS INDUCED LEAKAGE CURRENT//SOFT BREAKDOWN//DIELECTRIC BREAKDOWN BD |
7 | 0.0000108739 | DOUBLE GATE MOSFET//FINFET//SHORT CHANNEL EFFECTS |
8 | 0.0000104208 | CARL EMILY FUCHS MICROELECT//CEFIM//EUROPEAN QUAL |
9 | 0.0000079467 | SPECIFIC ON RESISTANCE//BREAKDOWN VOLTAGE BV//LDMOS |
10 | 0.0000074304 | OXIDE TRAPPED CHARGE//ELDRS//TOTAL IONIZING DOSE |