Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
2399 | 2188 | 18.8 | 79% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1859 | 5530 | NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | NANOIMPRINT | Author keyword | 111 | 43% | 9% | 197 |
2 | NANOIMPRINT LITHOGRAPHY | Author keyword | 95 | 34% | 10% | 226 |
3 | UV NANOIMPRINT | Author keyword | 56 | 81% | 2% | 34 |
4 | IMPRINT LITHOGRAPHY | Author keyword | 21 | 35% | 2% | 49 |
5 | ANTISTICKING LAYER | Author keyword | 21 | 85% | 1% | 11 |
6 | PHOTO NANOIMPRINT | Author keyword | 20 | 100% | 0% | 9 |
7 | UV NANOIMPRINT LITHOGRAPHY | Author keyword | 20 | 58% | 1% | 23 |
8 | HOT EMBOSSING | Author keyword | 18 | 20% | 4% | 82 |
9 | UV NIL | Author keyword | 17 | 46% | 1% | 27 |
10 | NANOIMPRINT LITHOGRAPHY NIL | Author keyword | 16 | 44% | 1% | 27 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | NANOIMPRINT | 111 | 43% | 9% | 197 | Search NANOIMPRINT | Search NANOIMPRINT |
2 | NANOIMPRINT LITHOGRAPHY | 95 | 34% | 10% | 226 | Search NANOIMPRINT+LITHOGRAPHY | Search NANOIMPRINT+LITHOGRAPHY |
3 | UV NANOIMPRINT | 56 | 81% | 2% | 34 | Search UV+NANOIMPRINT | Search UV+NANOIMPRINT |
4 | IMPRINT LITHOGRAPHY | 21 | 35% | 2% | 49 | Search IMPRINT+LITHOGRAPHY | Search IMPRINT+LITHOGRAPHY |
5 | ANTISTICKING LAYER | 21 | 85% | 1% | 11 | Search ANTISTICKING+LAYER | Search ANTISTICKING+LAYER |
6 | PHOTO NANOIMPRINT | 20 | 100% | 0% | 9 | Search PHOTO+NANOIMPRINT | Search PHOTO+NANOIMPRINT |
7 | UV NANOIMPRINT LITHOGRAPHY | 20 | 58% | 1% | 23 | Search UV+NANOIMPRINT+LITHOGRAPHY | Search UV+NANOIMPRINT+LITHOGRAPHY |
8 | HOT EMBOSSING | 18 | 20% | 4% | 82 | Search HOT+EMBOSSING | Search HOT+EMBOSSING |
9 | UV NIL | 17 | 46% | 1% | 27 | Search UV+NIL | Search UV+NIL |
10 | NANOIMPRINT LITHOGRAPHY NIL | 16 | 44% | 1% | 27 | Search NANOIMPRINT+LITHOGRAPHY+NIL | Search NANOIMPRINT+LITHOGRAPHY+NIL |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | IMPRINT LITHOGRAPHY | 221 | 46% | 16% | 355 |
2 | NANOIMPRINT LITHOGRAPHY | 176 | 34% | 19% | 426 |
3 | FLASH IMPRINT LITHOGRAPHY | 106 | 58% | 6% | 122 |
4 | IMPRINT | 69 | 29% | 9% | 199 |
5 | UV NANOIMPRINT | 51 | 83% | 1% | 29 |
6 | HOT EMBOSSING LITHOGRAPHY | 46 | 76% | 1% | 32 |
7 | NANOIMPRINT | 34 | 44% | 3% | 58 |
8 | THERMAL NANOIMPRINT | 25 | 77% | 1% | 17 |
9 | LIQUID POLYMER | 21 | 90% | 0% | 9 |
10 | ENVIRONMENTAL PRESSURE | 21 | 85% | 1% | 11 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Nanoimprint lithography: Methods and material requirements | 2007 | 603 | 93 | 72% |
Nanoimprint lithography: An old story in modern times? A review | 2008 | 251 | 151 | 87% |
Micro hot embossing of thermoplastic polymers: a review | 2014 | 14 | 151 | 53% |
A review of roll-to-roll nanoimprint lithography | 2014 | 4 | 51 | 88% |
UV-Nanoimprint Lithography: Structure, Materials and Fabrication of Flexible Molds | 2013 | 12 | 69 | 75% |
Recent developments and design challenges in continuous roller micro- and nanoimprinting | 2012 | 22 | 78 | 73% |
Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing | 2011 | 20 | 6 | 83% |
Recent progress in nanoimprint technology and its applications | 2004 | 324 | 87 | 56% |
Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication | 2009 | 53 | 86 | 59% |
Review on micro molding of thermoplastic polymers | 2004 | 379 | 23 | 35% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | LASTI | 14 | 27% | 2.0% | 43 |
2 | GRACE POLYMER PROC | 11 | 69% | 0.4% | 9 |
3 | TECHNOL DEV OPERAT | 8 | 75% | 0.3% | 6 |
4 | ELECT INFORMAT MEDIA ENGN | 7 | 30% | 0.9% | 19 |
5 | FLEXIBLE ELECT EQUIPMENT | 6 | 80% | 0.2% | 4 |
6 | NANOMECH SYST | 6 | 15% | 1.8% | 39 |
7 | NANOTECHNOL PLICAT POLYMERS | 6 | 100% | 0.2% | 4 |
8 | UBIQUITOUS MEMS MICRO ENGN | 5 | 32% | 0.6% | 14 |
9 | INNOVAT MFG SYST TECHNOL PROGRAM | 4 | 67% | 0.2% | 4 |
10 | BEANS PROJECT | 4 | 36% | 0.4% | 8 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000188100 | MICROCONTACT PRINTING//SOFT LITHOGRAPHY//CAPILLARY FORCE LITHOGRAPHY |
2 | 0.0000133203 | HYDROGEN SILSESQUIOXANE//HSQ//HSQ RESIST |
3 | 0.0000117984 | WET ETCHING OF GLASS//DEEP GLASS ETCHING//TECH SUPPORT MACHINERY MET IND |
4 | 0.0000076007 | MICROLENS ARRAY//MICROLENS//MICROLENSES |
5 | 0.0000056993 | LASER SCAN LITHOGRAPHY//ADV SCI TECHNOL IND//WORM INJECTION MOLDING |
6 | 0.0000056857 | SU 8//ZNCL2 NACL KCL//DEVICE TECHNOL GRP |
7 | 0.0000055864 | ANTIREFLECTION//ANTI REFLECTION//MOTH EYE |
8 | 0.0000054063 | OPTICAL SCATTEROMETRY//DIMENSIONAL STANDARDS//LINEWIDTH MONITORING |
9 | 0.0000052740 | DOT MATRIX HOLOGRAM//BAR CODE DECODING//ANTICOUNTERFEITING |
10 | 0.0000044748 | STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING |