Class information for:
Level 1: FUSED HOLLOW CATHODE//HOLLOW CATHODE//PLASMA GRP

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
23796 280 16.7 53%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
2646 2988 HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 FUSED HOLLOW CATHODE Author keyword 11 78% 3% 7
2 HOLLOW CATHODE Author keyword 10 23% 13% 37
3 PLASMA GRP Address 8 41% 6% 16
4 PLASMA SINTERING Author keyword 4 28% 5% 13
5 RF HOLLOW CATHODE DISCHARGE Author keyword 4 75% 1% 3
6 UNALLOYED IRON Author keyword 3 100% 1% 3
7 HOLLOW CATHODE ARC Author keyword 3 60% 1% 3
8 GAS FLOW SPUTTERING Author keyword 2 28% 3% 7
9 HOLLOW CATHODE PLASMA JET Author keyword 2 67% 1% 2
10 HOLLOW CATHODE SPUTTERING Author keyword 2 50% 1% 3

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 FUSED HOLLOW CATHODE 11 78% 3% 7 Search FUSED+HOLLOW+CATHODE Search FUSED+HOLLOW+CATHODE
2 HOLLOW CATHODE 10 23% 13% 37 Search HOLLOW+CATHODE Search HOLLOW+CATHODE
3 PLASMA SINTERING 4 28% 5% 13 Search PLASMA+SINTERING Search PLASMA+SINTERING
4 RF HOLLOW CATHODE DISCHARGE 4 75% 1% 3 Search RF+HOLLOW+CATHODE+DISCHARGE Search RF+HOLLOW+CATHODE+DISCHARGE
5 UNALLOYED IRON 3 100% 1% 3 Search UNALLOYED+IRON Search UNALLOYED+IRON
6 HOLLOW CATHODE ARC 3 60% 1% 3 Search HOLLOW+CATHODE+ARC Search HOLLOW+CATHODE+ARC
7 GAS FLOW SPUTTERING 2 28% 3% 7 Search GAS+FLOW+SPUTTERING Search GAS+FLOW+SPUTTERING
8 HOLLOW CATHODE PLASMA JET 2 67% 1% 2 Search HOLLOW+CATHODE+PLASMA+JET Search HOLLOW+CATHODE+PLASMA+JET
9 HOLLOW CATHODE SPUTTERING 2 50% 1% 3 Search HOLLOW+CATHODE+SPUTTERING Search HOLLOW+CATHODE+SPUTTERING
10 FRESNEL FORMULAS 2 43% 1% 3 Search FRESNEL+FORMULAS Search FRESNEL+FORMULAS

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 QUALITY AMORPHOUS SILICON 2 40% 1% 4
2 INTERNAL WALLS 1 100% 1% 2
3 REACTIVE SPUTTERING SYSTEM 1 50% 1% 2
4 RF PLASMA JET 1 50% 1% 2
5 ABNORMAL GLOW DISCHARGE 1 22% 1% 4
6 CATHODE SPUTTERING TECHNIQUE 1 50% 0% 1
7 DISCHARGE OPTICAL SPECTROSCOPY 1 50% 0% 1
8 STATIONARY PLASMA 1 50% 0% 1
9 PULSED DISCHARGES 0 20% 1% 2
10 AIR CORONA DISCHARGES 0 33% 0% 1

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
The use of hollow cathodes in deposition processes: A critical review 2015 1 200 24%
Indigenous Ion Sources for Material Processing 2009 1 10 10%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 PLASMA GRP 8 41% 5.7% 16
2 SEMICOND MFG EQUIPEMENT 1 100% 0.7% 2
3 UMR CNRS UPS 8578 1 40% 0.7% 2
4 CHEM IND PROD TECHNOL 1 33% 0.7% 2
5 INTERDISCIPLINAR MAT 1 50% 0.4% 1
6 PROCESSAMENTO MAT PLASMA 1 50% 0.4% 1
7 PROGRAMA INTERDISCIPLINAR POS ENGN PIPE 1 50% 0.4% 1
8 SAMARA 1 50% 0.4% 1
9 FUNCT MAT DESIGN 1 29% 0.7% 2
10 INFLPR 1 12% 1.4% 4

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000134828 COPPER NITRIDE//COPPER NITRIDE FILM//CU3N
2 0.0000110163 STRESS STRAINED STATE//STRESS STRUCTURAL INHOMOGENEITY//STATE ENGN
3 0.0000102587 METASTABLE PARTICLES//HACES DIRIGIDOS//SURFACE LOSS RATE
4 0.0000099742 OPT PHYS ENGN//MICROPLASMAS//MICROHOLLOW CATHODE DISCHARGE
5 0.0000084182 ENVIRONM DEV SOC GRP//STAKEHOLDER MAP//STAKEHOLDER STRATEGY
6 0.0000083866 HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING
7 0.0000078735 ANTI AGING PRODUCTS//HORIZONTAL FURNACE//SDTA
8 0.0000071440 ENERGY RESOLVED MASS SPECTROSCOPY//TRIODE ION PLATING//HOLLOW CATHODE ARC PLASMA
9 0.0000067550 SELECTIVE REMOVAL OF ATOMS//MACROPOROUS CHAR//COMPOSITE ION BEAM IRRADIATION
10 0.0000066804 SURFACE WAVE PLASMA//GRP ESPE OSCOPIA PLASMAS//GRP PHYS PLASMAS