Class information for:
Level 1: MEMS PATTERNING//ETCHING DAMAGE//RUOX PT

Basic class information

ID Publications Average number
of references
Avg. shr. active
ref. in WoS
23558 287 14.7 66%



Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)



ID, lev.
above
Publications Label for level above
178 21135 INTEGRATED FERROELECTRICS//FERROELECTRIC THIN FILMS//PZT

Terms with highest relevance score



Rank Term Type of term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 MEMS PATTERNING Author keyword 3 100% 1% 3
2 ETCHING DAMAGE Author keyword 3 30% 2% 7
3 RUOX PT Author keyword 2 67% 1% 2
4 TI MASK Author keyword 2 67% 1% 2
5 ECR ION GUN Author keyword 1 100% 1% 2
6 MAT DEVICE SECTOR Address 1 17% 2% 7
7 CL 2 AR Author keyword 1 33% 1% 3
8 MICROELECT TECH Address 1 33% 1% 3
9 BARIUM STRONTIUM TITANATEBST Author keyword 1 50% 0% 1
10 INTEGRATED FERROELECTRIC CAPACITORS Author keyword 1 50% 0% 1

Web of Science journal categories

Author Key Words



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
LCSH search Wikipedia search
1 MEMS PATTERNING 3 100% 1% 3 Search MEMS+PATTERNING Search MEMS+PATTERNING
2 ETCHING DAMAGE 3 30% 2% 7 Search ETCHING+DAMAGE Search ETCHING+DAMAGE
3 RUOX PT 2 67% 1% 2 Search RUOX+PT Search RUOX+PT
4 TI MASK 2 67% 1% 2 Search TI+MASK Search TI+MASK
5 ECR ION GUN 1 100% 1% 2 Search ECR+ION+GUN Search ECR+ION+GUN
6 CL 2 AR 1 33% 1% 3 Search CL+2+AR Search CL+2+AR
7 BARIUM STRONTIUM TITANATEBST 1 50% 0% 1 Search BARIUM+STRONTIUM+TITANATEBST Search BARIUM+STRONTIUM+TITANATEBST
8 INTEGRATED FERROELECTRIC CAPACITORS 1 50% 0% 1 Search INTEGRATED+FERROELECTRIC+CAPACITORS Search INTEGRATED+FERROELECTRIC+CAPACITORS
9 IR BASED ELECTRODE 1 50% 0% 1 Search IR+BASED+ELECTRODE Search IR+BASED+ELECTRODE
10 LOW COO 1 50% 0% 1 Search LOW+COO Search LOW+COO

Key Words Plus



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 INDUCTIVELY COUPLED CL 2 AR 4 67% 1% 4
2 ECR RF REACTOR 2 67% 1% 2
3 AR SPUTTER ETCH 1 100% 1% 2
4 SRBI2TA2O9 CAPACITORS 1 50% 1% 2
5 RF MAGNETRON 1 25% 1% 3
6 FERAM 1 21% 1% 3
7 IMPRINT CHARACTERISTICS 1 50% 0% 1
8 RAYLEIGH BEHAVIOR 1 50% 0% 1
9 SF6 AR 1 50% 0% 1
10 FERROELECTRIC CAPACITOR 0 33% 0% 1

Journals

Reviews



Title Publ. year Cit. Active
references
% act. ref.
to same field
Wet chemical etching method for BST thin films annealed at high temperature 2008 7 17 47%
Gold etching for microfabrication 2014 1 34 24%

Address terms



Rank Address term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 MAT DEVICE SECTOR 1 17% 2.4% 7
2 MICROELECT TECH 1 33% 1.0% 3
3 MICRO NANO TECHNOL PROGRAM 1 50% 0.3% 1
4 ZI PETITE SAVATE 1 50% 0.3% 1
5 MICROELECT DEVICES MAT TECHNOL 0 13% 1.0% 3
6 MICROSTRUCT IL 0 33% 0.3% 1
7 PROC EQUIPMENT GRP 0 33% 0.3% 1
8 ULSI DEV HEADQUARTERS 0 33% 0.3% 1
9 ATMI 0 25% 0.3% 1
10 NEW MAT TECHNOL DEV 0 25% 0.3% 1

Related classes at same level (level 1)



Rank Relatedness score Related classes
1 0.0000256074 INDUCTIVELY COUPLED PLASMA REACTIVE ION ETCHING//TI HARD MASK//CL 2 BASED PLASMA
2 0.0000255367 HYDROGEN INDUCED DEGRADATION//SELECTIVELY NUCLEATED LATERAL CRYSTALLIZATION//FORMING GAS ANNEAL
3 0.0000158329 RUO2//RUOD3//RU
4 0.0000156735 ELECT DEVICES MAT TECHNOL//SIO2 ETCHING//PLASMA ETCHING
5 0.0000132385 PZT//PZT THIN FILMS//INTEGRATED FERROELECTRICS
6 0.0000125312 PZT THICK FILM//PIEZOELECTRIC THICK FILM//PZT THICK FILMS
7 0.0000094115 BST//BARIUM STRONTIUM TITANATE//TUNABILITY
8 0.0000093981 AEROSOL DEPOSITION METHOD//AEROSOL DEPOSITION//AEROSOL DEPOSITION METHOD ADM
9 0.0000082456 ELECTROLYTIC COPPER ADDITION//BCL3 PLASMA//FIS CHIM SUPERFICI INTER E
10 0.0000078930 SOCIOTECHNO SCI TECHNOL//N GAN//GALLIUM HYDROXIDE