Class information for:
Level 1: PHOTOSENSITIVE POLYIMIDE//REACTION DEVELOPMENT PATTERNING RDP//PHOTOSENSITIVE POLYBENZOXAZOLE

Basic class information

ID Publications Average number
of references
Avg. shr. active
ref. in WoS
23437 291 15.8 55%



Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)



ID, lev.
above
Publications Label for level above
1565 6737 PHOTOPOLYMERIZATION//CATIONIC PHOTOPOLYMERIZATION//PHOTOBASE GENERATOR

Terms with highest relevance score



Rank Term Type of term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 PHOTOSENSITIVE POLYIMIDE Author keyword 18 45% 10% 29
2 REACTION DEVELOPMENT PATTERNING RDP Author keyword 17 100% 3% 8
3 PHOTOSENSITIVE POLYBENZOXAZOLE Author keyword 14 100% 2% 7
4 REACTION DEVELOPMENT PATTERNING Author keyword 9 83% 2% 5
5 NEGATIVE TONE REACTION DEVELOPMENT PATTERNING Author keyword 8 100% 2% 5
6 ALKALINE DEVELOPER Author keyword 6 80% 1% 4
7 DIAZONAPHTHOQUINONE DNQ Author keyword 6 80% 1% 4
8 LOW TEMPERATURE IMIDIZATION Author keyword 6 80% 1% 4
9 POLYO HYDROXY AMIDE Author keyword 6 80% 1% 4
10 POSITIVE TYPE Author keyword 5 54% 2% 7

Web of Science journal categories

Author Key Words



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
LCSH search Wikipedia search
1 PHOTOSENSITIVE POLYIMIDE 18 45% 10% 29 Search PHOTOSENSITIVE+POLYIMIDE Search PHOTOSENSITIVE+POLYIMIDE
2 REACTION DEVELOPMENT PATTERNING RDP 17 100% 3% 8 Search REACTION+DEVELOPMENT+PATTERNING+RDP Search REACTION+DEVELOPMENT+PATTERNING+RDP
3 PHOTOSENSITIVE POLYBENZOXAZOLE 14 100% 2% 7 Search PHOTOSENSITIVE+POLYBENZOXAZOLE Search PHOTOSENSITIVE+POLYBENZOXAZOLE
4 REACTION DEVELOPMENT PATTERNING 9 83% 2% 5 Search REACTION+DEVELOPMENT+PATTERNING Search REACTION+DEVELOPMENT+PATTERNING
5 NEGATIVE TONE REACTION DEVELOPMENT PATTERNING 8 100% 2% 5 Search NEGATIVE+TONE+REACTION+DEVELOPMENT+PATTERNING Search NEGATIVE+TONE+REACTION+DEVELOPMENT+PATTERNING
6 ALKALINE DEVELOPER 6 80% 1% 4 Search ALKALINE+DEVELOPER Search ALKALINE+DEVELOPER
7 DIAZONAPHTHOQUINONE DNQ 6 80% 1% 4 Search DIAZONAPHTHOQUINONE+DNQ Search DIAZONAPHTHOQUINONE+DNQ
8 LOW TEMPERATURE IMIDIZATION 6 80% 1% 4 Search LOW+TEMPERATURE+IMIDIZATION Search LOW+TEMPERATURE+IMIDIZATION
9 POLYO HYDROXY AMIDE 6 80% 1% 4 Search POLYO+HYDROXY+AMIDE Search POLYO+HYDROXY+AMIDE
10 POSITIVE TYPE 5 54% 2% 7 Search POSITIVE+TYPE Search POSITIVE+TYPE

Key Words Plus



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 POLYHYDROXYIMIDE 34 93% 4% 13
2 CONTAINING PHOTOREACTIVE POLYIMIDES 19 70% 5% 16
3 DIAZONAPHTHOQUINONE 14 59% 5% 16
4 PHOTOREACTIVE POLYIMIDES 14 100% 2% 7
5 POSITIVE WORKING 8 70% 2% 7
6 RDP 8 48% 4% 12
7 POLYBENZOXAZOLE 6 35% 5% 14
8 POLYO HYDROXY AMIDE 5 63% 2% 5
9 PHOTOACID GENERATOR 5 24% 6% 18
10 DIAZIDE MOIETIES 4 75% 1% 3

Journals

Reviews



Title Publ. year Cit. Active
references
% act. ref.
to same field
Recent progress of photosensitive polyimides 2008 31 71 54%
Innovation via photosensitive polyimide and poly(benzoxazole) precursors - a review by inventor 2004 15 1 100%
Recent development of photosensitive polybenzoxazoles 2006 11 39 54%
Developments of photosensitive polyimides and photosensitive polybenzoxazoles 2006 2 47 83%
Photosensitive polyimides 2001 7 19 63%
Diazonaphthoquinone-novolac resist dissolution in composite Langmuir-Blodgett and spin-cast films 1993 1 2 100%
NOVEL PHOTOSENSITIVE POLYIMIDE PRECURSOR BASED ON POLYISOIMIDE USING NIFEDIPINE AS A DISSOLUTION INHIBITOR 1994 0 4 100%
PHOTOCHEMICAL BEHAVIOR OF NIFEDIPINE DERIVATIVES AND APPLICATION TO PHOTOSENSITIVE POLYIMIDE 1994 0 2 100%
Molecular design of cationically polymerizable monomers and polymers 2004 1 8 13%
PHYSICS AND CHEMISTRY OF THE POLYFUNCTIONAL NUCLEOPHILIC COMPOUND POLYCONDENSATION WITH DERIVATIVES OF POLYCARBOXYLIC ACID 1985 4 6 33%

Address terms



Rank Address term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 ELECT IMAGING MAT S 3 22% 3.8% 11
2 MAT DESIGN UNIT 2 67% 0.7% 2
3 DEVICE INTEGRAT MAT 1 50% 0.3% 1
4 ELECT DEVICE MAT 2 1 50% 0.3% 1
5 FAB MAT DEV 1 50% 0.3% 1
6 IND MAT S 1 50% 0.3% 1
7 ELECT IMAGING S 0 33% 0.3% 1
8 YAMAZAKI RD 0 33% 0.3% 1
9 INFRA TECHNOL SERV 0 18% 0.7% 2
10 MFG TECHNOL TEAM 0 10% 1.0% 3

Related classes at same level (level 1)



Rank Relatedness score Related classes
1 0.0000271671 PHOTOBASE GENERATOR//BASE AMPLIFIER//BASE PROLIFERATION REACTION
2 0.0000225244 POLYIMIDES//FLUORINATED POLYIMIDES//AROMATIC POLYAMIDES
3 0.0000120849 PHOTOCROSSLINKABLE POLYMERS//PHOTOCROSSLINKING POLYMERS//CINNAMOYL GROUP
4 0.0000110566 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY//LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESISTS
5 0.0000088356 ELECTRODEPOSITION COATING//CATHODIC ELECTRODEPOSITION COATING//FILM FORMING SUBSTANCE
6 0.0000087603 POLYSILOXANE BLOCK POLYIMIDE//POLYHYDROSILYLATION//POLYIMIDESILOXANE
7 0.0000070309 FLEXIBLE COPPER CLAD LAMINATE//FLEXIBLE COPPER CLAD LAMINATE FCCL//SILANE MODIFIED POLYVINYLIMIDAZOLE
8 0.0000063988 ADDITION CONDENSATION//PYROLIGNEOUS ACID//BAMBOO VINEGAR
9 0.0000062772 POLY2 6 DIMETHYL 1 4 PHENYLENE ETHER//2 6 DIMETHYLPHENOL//POLYOXY 2 6 DIMETHYL 1 4 PHENYLENE
10 0.0000060650 HIGH REFRACTIVE INDEX//ADV MAT BUSINESS PROMOT//LOW BIREFRINGENCE