Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
23437 | 291 | 15.8 | 55% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1565 | 6737 | PHOTOPOLYMERIZATION//CATIONIC PHOTOPOLYMERIZATION//PHOTOBASE GENERATOR |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | PHOTOSENSITIVE POLYIMIDE | Author keyword | 18 | 45% | 10% | 29 |
2 | REACTION DEVELOPMENT PATTERNING RDP | Author keyword | 17 | 100% | 3% | 8 |
3 | PHOTOSENSITIVE POLYBENZOXAZOLE | Author keyword | 14 | 100% | 2% | 7 |
4 | REACTION DEVELOPMENT PATTERNING | Author keyword | 9 | 83% | 2% | 5 |
5 | NEGATIVE TONE REACTION DEVELOPMENT PATTERNING | Author keyword | 8 | 100% | 2% | 5 |
6 | ALKALINE DEVELOPER | Author keyword | 6 | 80% | 1% | 4 |
7 | DIAZONAPHTHOQUINONE DNQ | Author keyword | 6 | 80% | 1% | 4 |
8 | LOW TEMPERATURE IMIDIZATION | Author keyword | 6 | 80% | 1% | 4 |
9 | POLYO HYDROXY AMIDE | Author keyword | 6 | 80% | 1% | 4 |
10 | POSITIVE TYPE | Author keyword | 5 | 54% | 2% | 7 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | POLYHYDROXYIMIDE | 34 | 93% | 4% | 13 |
2 | CONTAINING PHOTOREACTIVE POLYIMIDES | 19 | 70% | 5% | 16 |
3 | DIAZONAPHTHOQUINONE | 14 | 59% | 5% | 16 |
4 | PHOTOREACTIVE POLYIMIDES | 14 | 100% | 2% | 7 |
5 | POSITIVE WORKING | 8 | 70% | 2% | 7 |
6 | RDP | 8 | 48% | 4% | 12 |
7 | POLYBENZOXAZOLE | 6 | 35% | 5% | 14 |
8 | POLYO HYDROXY AMIDE | 5 | 63% | 2% | 5 |
9 | PHOTOACID GENERATOR | 5 | 24% | 6% | 18 |
10 | DIAZIDE MOIETIES | 4 | 75% | 1% | 3 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Recent progress of photosensitive polyimides | 2008 | 31 | 71 | 54% |
Innovation via photosensitive polyimide and poly(benzoxazole) precursors - a review by inventor | 2004 | 15 | 1 | 100% |
Recent development of photosensitive polybenzoxazoles | 2006 | 11 | 39 | 54% |
Developments of photosensitive polyimides and photosensitive polybenzoxazoles | 2006 | 2 | 47 | 83% |
Photosensitive polyimides | 2001 | 7 | 19 | 63% |
Diazonaphthoquinone-novolac resist dissolution in composite Langmuir-Blodgett and spin-cast films | 1993 | 1 | 2 | 100% |
NOVEL PHOTOSENSITIVE POLYIMIDE PRECURSOR BASED ON POLYISOIMIDE USING NIFEDIPINE AS A DISSOLUTION INHIBITOR | 1994 | 0 | 4 | 100% |
PHOTOCHEMICAL BEHAVIOR OF NIFEDIPINE DERIVATIVES AND APPLICATION TO PHOTOSENSITIVE POLYIMIDE | 1994 | 0 | 2 | 100% |
Molecular design of cationically polymerizable monomers and polymers | 2004 | 1 | 8 | 13% |
PHYSICS AND CHEMISTRY OF THE POLYFUNCTIONAL NUCLEOPHILIC COMPOUND POLYCONDENSATION WITH DERIVATIVES OF POLYCARBOXYLIC ACID | 1985 | 4 | 6 | 33% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ELECT IMAGING MAT S | 3 | 22% | 3.8% | 11 |
2 | MAT DESIGN UNIT | 2 | 67% | 0.7% | 2 |
3 | DEVICE INTEGRAT MAT | 1 | 50% | 0.3% | 1 |
4 | ELECT DEVICE MAT 2 | 1 | 50% | 0.3% | 1 |
5 | FAB MAT DEV | 1 | 50% | 0.3% | 1 |
6 | IND MAT S | 1 | 50% | 0.3% | 1 |
7 | ELECT IMAGING S | 0 | 33% | 0.3% | 1 |
8 | YAMAZAKI RD | 0 | 33% | 0.3% | 1 |
9 | INFRA TECHNOL SERV | 0 | 18% | 0.7% | 2 |
10 | MFG TECHNOL TEAM | 0 | 10% | 1.0% | 3 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000271671 | PHOTOBASE GENERATOR//BASE AMPLIFIER//BASE PROLIFERATION REACTION |
2 | 0.0000225244 | POLYIMIDES//FLUORINATED POLYIMIDES//AROMATIC POLYAMIDES |
3 | 0.0000120849 | PHOTOCROSSLINKABLE POLYMERS//PHOTOCROSSLINKING POLYMERS//CINNAMOYL GROUP |
4 | 0.0000110566 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY//LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESISTS |
5 | 0.0000088356 | ELECTRODEPOSITION COATING//CATHODIC ELECTRODEPOSITION COATING//FILM FORMING SUBSTANCE |
6 | 0.0000087603 | POLYSILOXANE BLOCK POLYIMIDE//POLYHYDROSILYLATION//POLYIMIDESILOXANE |
7 | 0.0000070309 | FLEXIBLE COPPER CLAD LAMINATE//FLEXIBLE COPPER CLAD LAMINATE FCCL//SILANE MODIFIED POLYVINYLIMIDAZOLE |
8 | 0.0000063988 | ADDITION CONDENSATION//PYROLIGNEOUS ACID//BAMBOO VINEGAR |
9 | 0.0000062772 | POLY2 6 DIMETHYL 1 4 PHENYLENE ETHER//2 6 DIMETHYLPHENOL//POLYOXY 2 6 DIMETHYL 1 4 PHENYLENE |
10 | 0.0000060650 | HIGH REFRACTIVE INDEX//ADV MAT BUSINESS PROMOT//LOW BIREFRINGENCE |