Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
22861 | 310 | 19.2 | 54% |
Classes in level above (level 2) |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | RU2SI3 | Author keyword | 8 | 75% | 2% | 6 |
2 | OSSI2 | Author keyword | 6 | 80% | 1% | 4 |
3 | CHROMIUM DISILICIDE | Author keyword | 5 | 44% | 3% | 8 |
4 | RESI175 | Author keyword | 4 | 67% | 1% | 4 |
5 | RUTHENIUM SILICIDE | Author keyword | 2 | 38% | 2% | 5 |
6 | CR SI SYSTEM | Author keyword | 2 | 67% | 1% | 2 |
7 | CRSI2 | Author keyword | 2 | 33% | 1% | 4 |
8 | AUTOMAT CONTROL SCI | Address | 1 | 100% | 1% | 2 |
9 | RU2GE3 | Author keyword | 1 | 100% | 1% | 2 |
10 | STATE RARE EARTH CHEM PLICAT | Address | 1 | 50% | 1% | 2 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | RU2SI3 | 8 | 75% | 2% | 6 | Search RU2SI3 | Search RU2SI3 |
2 | OSSI2 | 6 | 80% | 1% | 4 | Search OSSI2 | Search OSSI2 |
3 | CHROMIUM DISILICIDE | 5 | 44% | 3% | 8 | Search CHROMIUM+DISILICIDE | Search CHROMIUM+DISILICIDE |
4 | RESI175 | 4 | 67% | 1% | 4 | Search RESI175 | Search RESI175 |
5 | RUTHENIUM SILICIDE | 2 | 38% | 2% | 5 | Search RUTHENIUM+SILICIDE | Search RUTHENIUM+SILICIDE |
6 | CR SI SYSTEM | 2 | 67% | 1% | 2 | Search CR+SI+SYSTEM | Search CR+SI+SYSTEM |
7 | CRSI2 | 2 | 33% | 1% | 4 | Search CRSI2 | Search CRSI2 |
8 | RU2GE3 | 1 | 100% | 1% | 2 | Search RU2GE3 | Search RU2GE3 |
9 | ALLOY SILICIDE | 1 | 50% | 0% | 1 | Search ALLOY+SILICIDE | Search ALLOY+SILICIDE |
10 | CHANNELED ION IMPLANTATION | 1 | 50% | 0% | 1 | Search CHANNELED+ION+IMPLANTATION | Search CHANNELED+ION+IMPLANTATION |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | RESI2 | 22 | 67% | 6% | 20 |
2 | CRSI2 | 16 | 42% | 10% | 30 |
3 | RU2SI3 | 11 | 57% | 4% | 13 |
4 | CHROMIUM DISILICIDE | 10 | 61% | 4% | 11 |
5 | TRANSPORT PERFORMANCES | 8 | 100% | 2% | 5 |
6 | RU2GE3 | 7 | 64% | 2% | 7 |
7 | SEMICONDUCTING RHENIUM SILICIDE | 7 | 67% | 2% | 6 |
8 | DIFFUSIONLESS PHASE TRANSFORMATIONS | 5 | 63% | 2% | 5 |
9 | DOPED RU2SI3 | 4 | 56% | 2% | 5 |
10 | RUTHENIUM SILICON SYSTEM | 3 | 100% | 1% | 3 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Microscopic study of electrical properties of CrSi2 nanocrystals in silicon | 2011 | 2 | 8 | 63% |
Introduction: Fundamental aspects | 2003 | 0 | 88 | 10% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | AUTOMAT CONTROL SCI | 1 | 100% | 0.6% | 2 |
2 | STATE RARE EARTH CHEM PLICAT | 1 | 50% | 0.6% | 2 |
3 | GRP THERMODYNAM MET | 1 | 33% | 1.0% | 3 |
4 | AUTOMAT CONTROL PROCESS | 1 | 50% | 0.3% | 1 |
5 | PHYS MECAN MAT METALL | 1 | 50% | 0.3% | 1 |
6 | UNIT RECH PHYS | 1 | 50% | 0.3% | 1 |
7 | NEW OPTOELECT MAT TECHNOL | 1 | 29% | 0.6% | 2 |
8 | AMARL | 0 | 33% | 0.3% | 1 |
9 | NUCL FUEL TECHNOL DEV | 0 | 33% | 0.3% | 1 |
10 | UM2ENSCMUM1UMR 5253 | 0 | 33% | 0.3% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000295291 | BETA FESI2//IRON DISILICIDE//FESI2 |
2 | 0.0000202857 | VALENCE BAND DENSITY OF STATES//SURFACE MAGNETO OPTIC KERR EFFECT//METAL SEMICONDUCTOR THIN FILM |
3 | 0.0000154560 | RESISTIVE FILMS//RELATIVE RESISTANCE CHANGE//MINIST HIGH TEMP MAT TESTS |
4 | 0.0000147567 | HIGHER MANGANESE SILICIDE//HIGHER MANGANESE SILICIDES//ADV THIN FILMS |
5 | 0.0000116477 | RECONFIGURABLE TRANSISTOR//RFET//SILICIDE NANOWIRES |
6 | 0.0000113051 | LASER MOL BEAM EPITAXY//PTSI//IRIDIUM SILICIDES |
7 | 0.0000106100 | LINEAR LEAST SQUARES FITTING//LINEAR LEAST SQUARE FIT//LINEAR LEAST SQUARE METHOD |
8 | 0.0000103485 | FESI//MNSI//FE1 XCOXSI |
9 | 0.0000099458 | MG2SI//MAGNESIUM SILICIDE//MG2SN |
10 | 0.0000084863 | TISI2//SALICIDE//NICKEL SILICIDE |