Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
22426 | 325 | 16.2 | 42% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
2900 | 2299 | PHOTORESIST REMOVAL//WET OZONE//HYDROGEN TERMINATION |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | CLEANROOM | Author keyword | 9 | 24% | 10% | 33 |
2 | FAN FILTER UNIT | Author keyword | 4 | 75% | 1% | 3 |
3 | ORGANIC CONTAMINATION | Author keyword | 4 | 19% | 6% | 19 |
4 | AIRBORNE MOLECULAR CONTAMINANTS AMCS | Author keyword | 3 | 100% | 1% | 3 |
5 | FAN FILTER UNIT FFU | Author keyword | 3 | 100% | 1% | 3 |
6 | CLEAN ROOM | Author keyword | 3 | 18% | 5% | 15 |
7 | WAFER CONTAMINATION | Author keyword | 2 | 44% | 1% | 4 |
8 | FRONT OPENING UNIFIED POD FOUP | Author keyword | 2 | 67% | 1% | 2 |
9 | PARALLEL ANGLE RESOLVED XPS | Author keyword | 2 | 67% | 1% | 2 |
10 | PATTERN WAFER | Author keyword | 2 | 67% | 1% | 2 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | CLEANROOM | 9 | 24% | 10% | 33 | Search CLEANROOM | Search CLEANROOM |
2 | FAN FILTER UNIT | 4 | 75% | 1% | 3 | Search FAN+FILTER+UNIT | Search FAN+FILTER+UNIT |
3 | ORGANIC CONTAMINATION | 4 | 19% | 6% | 19 | Search ORGANIC+CONTAMINATION | Search ORGANIC+CONTAMINATION |
4 | AIRBORNE MOLECULAR CONTAMINANTS AMCS | 3 | 100% | 1% | 3 | Search AIRBORNE+MOLECULAR+CONTAMINANTS+AMCS | Search AIRBORNE+MOLECULAR+CONTAMINANTS+AMCS |
5 | FAN FILTER UNIT FFU | 3 | 100% | 1% | 3 | Search FAN+FILTER+UNIT+FFU | Search FAN+FILTER+UNIT+FFU |
6 | CLEAN ROOM | 3 | 18% | 5% | 15 | Search CLEAN+ROOM | Search CLEAN+ROOM |
7 | WAFER CONTAMINATION | 2 | 44% | 1% | 4 | Search WAFER+CONTAMINATION | Search WAFER+CONTAMINATION |
8 | FRONT OPENING UNIFIED POD FOUP | 2 | 67% | 1% | 2 | Search FRONT+OPENING+UNIFIED+POD+FOUP | Search FRONT+OPENING+UNIFIED+POD+FOUP |
9 | PARALLEL ANGLE RESOLVED XPS | 2 | 67% | 1% | 2 | Search PARALLEL+ANGLE+RESOLVED+XPS | Search PARALLEL+ANGLE+RESOLVED+XPS |
10 | PATTERN WAFER | 2 | 67% | 1% | 2 | Search PATTERN+WAFER | Search PATTERN+WAFER |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MINIENVIRONMENT | 15 | 88% | 2% | 7 |
2 | ORGANIC CONTAMINATION | 10 | 40% | 6% | 20 |
3 | MOLECULAR CONTAMINATION | 9 | 83% | 2% | 5 |
4 | AIRBORNE MOLECULAR CONTAMINATION | 5 | 60% | 2% | 6 |
5 | MINIENVIRONMENTS | 4 | 75% | 1% | 3 |
6 | WAFER SURFACE | 2 | 21% | 2% | 8 |
7 | SILICON WAFER SURFACE | 2 | 28% | 2% | 5 |
8 | FAN FILTER UNIT | 1 | 100% | 1% | 2 |
9 | OPENING UNIFIED POD | 1 | 100% | 1% | 2 |
10 | SIHCL3 H 2 SYSTEM | 1 | 18% | 1% | 4 |
Journals |
Reviews |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | AIR CONDITIONING REFRIGERAT ENGN | 2 | 19% | 2.5% | 8 |
2 | EQUIPE RUMENTAT REACTIVITE ATMOSPHER | 1 | 33% | 0.6% | 2 |
3 | INCAM SOLUT | 1 | 50% | 0.3% | 1 |
4 | SEODAIMUN KU | 1 | 50% | 0.3% | 1 |
5 | MFG ENGN RD | 1 | 25% | 0.6% | 2 |
6 | AIRCONDITIONING REFRIGERAT ENGN | 0 | 33% | 0.3% | 1 |
7 | HIYOSHI KOUHOKU KU | 0 | 33% | 0.3% | 1 |
8 | PROC PLICAT DEV | 0 | 33% | 0.3% | 1 |
9 | PROD PLANNING GRP | 0 | 33% | 0.3% | 1 |
10 | SUBMICROMETER TECHNOL GRP | 0 | 33% | 0.3% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000209317 | WET OZONE//PHOTORESIST REMOVAL//RESIST REMOVAL |
2 | 0.0000133817 | HYDROGEN TERMINATION//SHIZUOKA TORY//LAYER BY LAYER OXIDATION |
3 | 0.0000085836 | WAFER RINSING//MICRO NANO FABRICAT//CIRCULATION COOLING WATER |
4 | 0.0000082248 | DISPLACEMENT VENTILATION//PERSONALIZED VENTILATION//STRATUM VENTILATION |
5 | 0.0000068373 | MICRO WETTABILITY//MACRO WETTING//MICRO CONTAMINANT |
6 | 0.0000057471 | AC SURFACE PHOTOVOLTAGE//SCANNING PHOTON MICROSCOPE//METAL AIR INSULATOR SEMICONDUCTOR |
7 | 0.0000054512 | WATER DEW POINT//ATMOSPHERIC PRESSURE IONIZATION MASS SPECTROMETER//CAPACITOR SENSOR |
8 | 0.0000052900 | VACUUM COOLING//IMMERSION VACUUM COOLING//DISPLAY CABINET |
9 | 0.0000048615 | FILTER PACK//DIFFUSION SCRUBBER//FILTER PACK METHOD |
10 | 0.0000045788 | BREAZEALE NUCL REACTOR//MED RADIOL SHOWA KU//MED VIRGINIA NUCL MED |