Class information for:
Level 1: OPTICAL SCATTEROMETRY//DIMENSIONAL STANDARDS//LINEWIDTH MONITORING

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
22226 332 17.8 56%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
2305 4103 NANO SENSORS GRP//GUIDED MODE RESONANCE//GUIDED MODE RESONANCE GMR

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 OPTICAL SCATTEROMETRY Author keyword 3 33% 2% 7
2 DIMENSIONAL STANDARDS Author keyword 2 67% 1% 2
3 LINEWIDTH MONITORING Author keyword 2 67% 1% 2
4 SAIT RUSSIA Address 2 67% 1% 2
5 OPTICAL CRITICAL DIMENSION Author keyword 2 27% 2% 6
6 LATTICE PLANE SELECTIVE ETCH Author keyword 1 100% 1% 2
7 LITHOGRAPHY INSPECTION Author keyword 1 100% 1% 2
8 MATH MODELLING DATA ANAL Address 1 50% 1% 2
9 OPTICAL CD MEASUREMENT Author keyword 1 50% 1% 2
10 MUELLER MATRIX POLARIMETRY Author keyword 1 29% 1% 4

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 OPTICAL SCATTEROMETRY 3 33% 2% 7 Search OPTICAL+SCATTEROMETRY Search OPTICAL+SCATTEROMETRY
2 DIMENSIONAL STANDARDS 2 67% 1% 2 Search DIMENSIONAL+STANDARDS Search DIMENSIONAL+STANDARDS
3 LINEWIDTH MONITORING 2 67% 1% 2 Search LINEWIDTH+MONITORING Search LINEWIDTH+MONITORING
4 OPTICAL CRITICAL DIMENSION 2 27% 2% 6 Search OPTICAL+CRITICAL+DIMENSION Search OPTICAL+CRITICAL+DIMENSION
5 LATTICE PLANE SELECTIVE ETCH 1 100% 1% 2 Search LATTICE+PLANE+SELECTIVE+ETCH Search LATTICE+PLANE+SELECTIVE+ETCH
6 LITHOGRAPHY INSPECTION 1 100% 1% 2 Search LITHOGRAPHY+INSPECTION Search LITHOGRAPHY+INSPECTION
7 OPTICAL CD MEASUREMENT 1 50% 1% 2 Search OPTICAL+CD+MEASUREMENT Search OPTICAL+CD+MEASUREMENT
8 MUELLER MATRIX POLARIMETRY 1 29% 1% 4 Search MUELLER+MATRIX+POLARIMETRY Search MUELLER+MATRIX+POLARIMETRY
9 ELECTRICAL CRITICAL DIMENSION ECD 1 40% 1% 2 Search ELECTRICAL+CRITICAL+DIMENSION+ECD Search ELECTRICAL+CRITICAL+DIMENSION+ECD
10 ELECTRICAL TEST STRUCTURE 1 40% 1% 2 Search ELECTRICAL+TEST+STRUCTURE Search ELECTRICAL+TEST+STRUCTURE

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SCATTEROMETRY 20 34% 14% 48
2 OPTICAL SCATTEROMETRY 5 29% 5% 15
3 SPECTROSCOPIC SCATTEROMETRY 4 75% 1% 3
4 SUBWAVELENGTH DIFFRACTION GRATINGS 4 75% 1% 3
5 GRATING TEST PATTERNS 2 67% 1% 2
6 CONICAL DIFFRACTION 2 17% 3% 11
7 CRITICAL DIMENSION 2 15% 3% 11
8 LATENT IMAGES 1 38% 1% 3
9 ELLIPSOMETRIC SCATTEROMETRY 1 50% 1% 2
10 FOURIER SCATTEROMETRY 1 100% 1% 2

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology 2015 0 27 63%
Advances in Optical and Magnetooptical Scatterometry of Periodically Ordered Nanostructured Arrays 2013 1 49 18%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 SAIT RUSSIA 2 67% 0.6% 2
2 MATH MODELLING DATA ANAL 1 50% 0.6% 2
3 ENSA SAFI 1 50% 0.3% 1
4 MEMSC 1 50% 0.3% 1
5 NANOSCALE METROL GRP 1 50% 0.3% 1
6 SCOPE STUTTGART PHOTON ENGN 1 50% 0.3% 1
7 OPT TECHNOL DEV 1 25% 0.6% 2
8 TRAITEMENT SIGNAL RUMENT 0 33% 0.3% 1
9 GEORGIA TECH CNRS 0 12% 0.9% 3
10 UMR 7617 0 14% 0.6% 2

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000264772 NANO SENSORS GRP//GUIDED MODE RESONANCE//GUIDED MODE RESONANCE GMR
2 0.0000143746 LASER INTERFERENCE MICROSCOPY//COHERENT PHASE MICROSCOPY//DYNAMIC PHASE MICROSCOPY
3 0.0000138554 METHOD OF AUXILIARY SOURCES//METHOD OF AUXILIARY SOURCES MAS//GENERALIZED MULTIPOLE TECHNIQUE
4 0.0000134352 TIP CHARACTERIZATION//TIP CHARACTERIZER//SIDEWALL MEASUREMENT
5 0.0000118543 2D PERIODIC ARRAYS//CHRISTOPHER S BOND LIFE SCI 240C//PHOTONIC GRATING
6 0.0000107535 CONE DEFECT//DYED RESIST//NITRIDE BUBBLES
7 0.0000093628 SCANNING//SECONDARY EMISSION NOISE//INTEGRATED CIRCUIT ADV PROC TECHNOL
8 0.0000077467 DOT MATRIX HOLOGRAM//BAR CODE DECODING//ANTICOUNTERFEITING
9 0.0000068434 MUELLER MATRIX//SHENZHEN MINIMAL INVAS MED TECHNOL//BIOPHYS BIOIMAGING
10 0.0000054063 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT