Class information for:
Level 1: W TI THIN FILMS//WTI THIN FILMS//SURFACE LASER TREATMENT

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
22185 334 18.1 42%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1792 5778 DIFFUSION BARRIER//ELECTROMIGRATION//CU METALLIZATION

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 W TI THIN FILMS Author keyword 11 100% 2% 6
2 WTI THIN FILMS Author keyword 2 67% 1% 2
3 SURFACE LASER TREATMENT Author keyword 2 50% 1% 3
4 QUANTUM ELECT LASER TECHN Address 1 100% 1% 2
5 W TI ALLOY Author keyword 1 100% 1% 2
6 ANNEALING OXIDATION Author keyword 1 50% 0% 1
7 IMPURITY CONTENTS Author keyword 1 50% 0% 1
8 IN SITU WAFER CURVATURE Author keyword 1 50% 0% 1
9 TI W Author keyword 1 50% 0% 1
10 W 10TI ALLOY Author keyword 1 50% 0% 1

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 W TI THIN FILMS 11 100% 2% 6 Search W+TI+THIN+FILMS Search W+TI+THIN+FILMS
2 WTI THIN FILMS 2 67% 1% 2 Search WTI+THIN+FILMS Search WTI+THIN+FILMS
3 SURFACE LASER TREATMENT 2 50% 1% 3 Search SURFACE+LASER+TREATMENT Search SURFACE+LASER+TREATMENT
4 W TI ALLOY 1 100% 1% 2 Search W+TI+ALLOY Search W+TI+ALLOY
5 ANNEALING OXIDATION 1 50% 0% 1 Search ANNEALING+OXIDATION Search ANNEALING+OXIDATION
6 IMPURITY CONTENTS 1 50% 0% 1 Search IMPURITY+CONTENTS Search IMPURITY+CONTENTS
7 IN SITU WAFER CURVATURE 1 50% 0% 1 Search IN+SITU+WAFER+CURVATURE Search IN+SITU+WAFER+CURVATURE
8 TI W 1 50% 0% 1 Search TI+W Search TI+W
9 W 10TI ALLOY 1 50% 0% 1 Search W+10TI+ALLOY Search W+10TI+ALLOY
10 IN SITU OPTICAL SPECTROSCOPY 0 33% 0% 1 Search IN+SITU+OPTICAL+SPECTROSCOPY Search IN+SITU+OPTICAL+SPECTROSCOPY

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 TIW 13 80% 2% 8
2 THIN FILM INTERACTIONS 7 64% 2% 7
3 SILVER METALLIZATION 1 40% 1% 2
4 AL SI METALLIZATIONS 1 50% 0% 1
5 ALUMINUM SILICIDE REACTIONS 1 50% 0% 1
6 NI W FILMS 1 50% 0% 1
7 TITANIUM DIFFUSION BARRIERS 1 50% 0% 1
8 WTI 1 50% 0% 1
9 GLASS PULSED LASER 0 33% 0% 1
10 METALLIZATION SCHEMES 0 33% 0% 1

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
INTERACTIONS BETWEEN BINARY METALLIC ALLOYS AND SI, GESI AND GAAS 1992 1 129 29%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 QUANTUM ELECT LASER TECHN 1 100% 0.6% 2
2 INORGAN MAT POLYMER NANOCOMPOSITE 0 25% 0.3% 1
3 LUCIA BEAMLINE 0 17% 0.3% 1
4 TERMINAL EFFECTS 0 17% 0.3% 1
5 WIRELESS PACKAGING SYST 0 17% 0.3% 1
6 EA 2976 0 14% 0.3% 1
7 SHAANXI PROV ELECT MAT INFILTRAT TECHNO 0 10% 0.3% 1
8 PROC INTEGRAT HIGH VOLTAGE 0 100% 0.3% 1
9 THIN FILMS COATINGS GRP 0 100% 0.3% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000260170 TUNGSTEN NITRIDE//WNX//GRP MAT ENGN SUPERFICIES
2 0.0000208691 CROSS BRIDGE KELVIN RESISTOR CBKR//CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR
3 0.0000166856 DIFFUSION BARRIER//CU METALLIZATION//TANTALUM NITRIDE
4 0.0000160889 HONG KONG BEIJING JOINT//MATEMATYKI FIZYKI//GEN LASER PHYS
5 0.0000156714 TISI2//SALICIDE//NICKEL SILICIDE
6 0.0000125717 CVD W//FEATURE SCALE MODEL//FOCUS NEW YORK
7 0.0000114457 DELTA MON//MOLYBDENUM NITRIDE//MOLYBDENUM NITRIDE COATINGS
8 0.0000101166 ELECTROMIGRATION//STRESS INDUCED MIGRATION//PRC MER
9 0.0000101149 CRYSTALLINE HYDRATE//NEOLITHIC CERAMICS//STUBLINE
10 0.0000098285 CO AL//AL NI001//CO AL 001