Class information for:
Level 1: VUV LITHOG//IMMERSION LITHOGRAPHY//LEAF ARRANGEMENT ANALYSIS

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
21899 344 15.9 55%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
740 11887 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 VUV LITHOG Address 8 75% 2% 6
2 IMMERSION LITHOGRAPHY Author keyword 8 14% 15% 52
3 LEAF ARRANGEMENT ANALYSIS Author keyword 6 100% 1% 4
4 TRIPLE PATTERNING LITHOGRAPHY TPL Author keyword 4 75% 1% 3
5 DOUBLE PATTERNING Author keyword 3 11% 9% 30
6 LAYOUT DECOMPOSITION Author keyword 3 32% 2% 8
7 PLANT SHOOT Author keyword 3 60% 1% 3
8 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS Journal 3 10% 7% 25
9 193 NM IMMERSION MICROLITHOGRAPHY Author keyword 2 67% 1% 2
10 LIQUID RENOVATION Author keyword 2 67% 1% 2

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 IMMERSION LITHOGRAPHY 8 14% 15% 52 Search IMMERSION+LITHOGRAPHY Search IMMERSION+LITHOGRAPHY
2 LEAF ARRANGEMENT ANALYSIS 6 100% 1% 4 Search LEAF+ARRANGEMENT+ANALYSIS Search LEAF+ARRANGEMENT+ANALYSIS
3 TRIPLE PATTERNING LITHOGRAPHY TPL 4 75% 1% 3 Search TRIPLE+PATTERNING+LITHOGRAPHY+TPL Search TRIPLE+PATTERNING+LITHOGRAPHY+TPL
4 DOUBLE PATTERNING 3 11% 9% 30 Search DOUBLE+PATTERNING Search DOUBLE+PATTERNING
5 LAYOUT DECOMPOSITION 3 32% 2% 8 Search LAYOUT+DECOMPOSITION Search LAYOUT+DECOMPOSITION
6 PLANT SHOOT 3 60% 1% 3 Search PLANT+SHOOT Search PLANT+SHOOT
7 193 NM IMMERSION MICROLITHOGRAPHY 2 67% 1% 2 Search 193+NM+IMMERSION+MICROLITHOGRAPHY Search 193+NM+IMMERSION+MICROLITHOGRAPHY
8 LIQUID RENOVATION 2 67% 1% 2 Search LIQUID+RENOVATION Search LIQUID+RENOVATION
9 LITHOGRAPHY HOTSPOT DETECTION 2 67% 1% 2 Search LITHOGRAPHY+HOTSPOT+DETECTION Search LITHOGRAPHY+HOTSPOT+DETECTION
10 MULTI EXPOSURES 2 67% 1% 2 Search MULTI+EXPOSURES Search MULTI+EXPOSURES

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 SEM MEASUREMENT 5 55% 2% 6
2 MINIMUM DEVIATION TECHNIQUES 4 67% 1% 4
3 RESIST REFLOW PROCESS 3 100% 1% 3
4 LAYOUT DECOMPOSITION 2 38% 1% 5
5 DOUBLE PATTERNING PROCESS 1 50% 1% 2
6 ARF RESIST 1 27% 1% 3
7 8X 1 50% 0% 1
8 DOUBLE PATTERNING LITHOGRAPHY 1 50% 0% 1
9 NEGATIVE TONE DEVELOPMENT 1 50% 0% 1
10 OPTICAL RETICLES 1 50% 0% 1

Journals


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 3 10% 7% 25
2 MICROLITHOGRAPHY WORLD 1 14% 2% 7

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Advances in Patterning Materials for 193 nm Immersion Lithography 2010 45 161 50%
Immersion Lithography: Photomask and Wafer-Level Materials 2009 31 69 49%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 VUV LITHOG 8 75% 1.7% 6
2 INFORMAT COMMUN ELECT ENGN 1 15% 2.6% 9
3 RD MANAGEMENT HEADQUARTERS 1 25% 1.2% 4
4 DESIGN SILICON 1 40% 0.6% 2
5 ADV MAT DEV 1 1 22% 1.2% 4
6 ADV MASK TECHNOL 1 50% 0.3% 1
7 AV HARDWARE BRANCH 1 50% 0.3% 1
8 DEVICE BUSINESS 1 50% 0.3% 1
9 LITHOG PROC TECHNOL 1 50% 0.3% 1
10 OHMI 1 50% 0.3% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000224865 OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//BOTTOM ANTIREFLECTIVE COATINGS
2 0.0000167242 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY//LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESISTS
3 0.0000154185 HYDROGEN SILSESQUIOXANE//HSQ//HSQ RESIST
4 0.0000080701 WAFER RINSING//MICRO NANO FABRICAT//CIRCULATION COOLING WATER
5 0.0000077901 LASER INTERFERENCE METALLURGY//DIRECT DIGITAL MFG//JR3CN
6 0.0000077533 SOLVENT FREE NANOFLUIDS//LIQUID LIKE BEHAVIOR//NANOSCALE IONIC MATERIALS
7 0.0000066670 PHOTOBASE GENERATOR//BASE AMPLIFIER//BASE PROLIFERATION REACTION
8 0.0000059644 INTERFACIAL SHEARS//NON LOCAL STRESS CURVATURE RELATIONS//NON UNIFORM MISFIT STRAIN
9 0.0000045679 CLEANROOM//FAN FILTER UNIT//ORGANIC CONTAMINATION
10 0.0000043667 PHOTON OPTOINFORMAT//EPSILON NEAR ZERO//WIRE MEDIUM