Class information for:
Level 1: POLYOXIDE//INTERPOLY OXIDE//NONPLANAR POLYOXIDE

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
21676 352 14.5 49%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
138 22619 IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 POLYOXIDE Author keyword 9 67% 2% 8
2 INTERPOLY OXIDE Author keyword 1 100% 1% 2
3 NONPLANAR POLYOXIDE Author keyword 1 100% 1% 2
4 PLASMA OXIDE Author keyword 1 40% 1% 2
5 AREA GAIN Author keyword 1 50% 0% 1
6 CONTROL OF RESIDUAL STRESS Author keyword 1 50% 0% 1
7 DEEP ELECTRON TRAPS Author keyword 1 50% 0% 1
8 FN INJECTION Author keyword 1 50% 0% 1
9 FOWLER NORDHEIM LEAKAGE CURRENT Author keyword 1 50% 0% 1
10 GATE OFF CURRENT Author keyword 1 50% 0% 1

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 POLYOXIDE 9 67% 2% 8 Search POLYOXIDE Search POLYOXIDE
2 INTERPOLY OXIDE 1 100% 1% 2 Search INTERPOLY+OXIDE Search INTERPOLY+OXIDE
3 NONPLANAR POLYOXIDE 1 100% 1% 2 Search NONPLANAR+POLYOXIDE Search NONPLANAR+POLYOXIDE
4 PLASMA OXIDE 1 40% 1% 2 Search PLASMA+OXIDE Search PLASMA+OXIDE
5 AREA GAIN 1 50% 0% 1 Search AREA+GAIN Search AREA+GAIN
6 CONTROL OF RESIDUAL STRESS 1 50% 0% 1 Search CONTROL+OF+RESIDUAL+STRESS Search CONTROL+OF+RESIDUAL+STRESS
7 DEEP ELECTRON TRAPS 1 50% 0% 1 Search DEEP+ELECTRON+TRAPS Search DEEP+ELECTRON+TRAPS
8 FN INJECTION 1 50% 0% 1 Search FN+INJECTION Search FN+INJECTION
9 FOWLER NORDHEIM LEAKAGE CURRENT 1 50% 0% 1 Search FOWLER+NORDHEIM+LEAKAGE+CURRENT Search FOWLER+NORDHEIM+LEAKAGE+CURRENT
10 GATE OFF CURRENT 1 50% 0% 1 Search GATE+OFF+CURRENT Search GATE+OFF+CURRENT

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 N POLYCRYSTALLINE SILICON 23 100% 3% 10
2 RUGGED POLYSILICON 8 100% 1% 5
3 FLASH MEMORY DEVICES 2 67% 1% 2
4 HEMISPHERICAL GRAINED SI 2 67% 1% 2
5 TRENCH CAPACITORS 2 67% 1% 2
6 DOPED POLYSILICON 2 26% 1% 5
7 DOUBLE POLY STRUCTURES 1 100% 1% 2
8 HEMISPHERICAL GRAINED SILICON 1 100% 1% 2
9 THIN POLYSILICON FILM 1 100% 1% 2
10 OXIDE NITRIDE 1 33% 1% 3

Journals

Reviews

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 INTEGRATED SCI NANODEVICE BIO SYST 1 50% 0.3% 1
2 TEAM ELE OANAL ELE OCHEM 1 50% 0.3% 1
3 KIHEUNG PLANT 0 33% 0.3% 1
4 SIEMENS 0 25% 0.3% 1
5 SEMICOND PL PHYS 0 20% 0.3% 1
6 TECHNOL PROC DEV 0 11% 0.3% 1
7 PROC ENGN 4 0 100% 0.3% 1
8 RD NONVOLATILE MEMORY DEVICE GRP 0 100% 0.3% 1
9 ROGER ADAMS 207 0 100% 0.3% 1
10 SCI CORE TECH GRP 0 100% 0.3% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000219329 BORON PENETRATION//REMOTE PLASMA NITRIDATION RPN//SI NITRIDE
2 0.0000160977 SONOS//CHARGE TRAPPING LAYER//FLASH MEMORY
3 0.0000140673 SIPOS//MSOS O P STRUCTURE//SEMI INSULATING POLYCRYSTALLINE SILICON
4 0.0000134893 FILM EDGE//SHAPE ENGINEERING//SILICON TECHNOLOGIES
5 0.0000129188 STRESS INDUCED LEAKAGE CURRENT//SOFT BREAKDOWN//DIELECTRIC BREAKDOWN BD
6 0.0000121671 POLYSILICON RESISTORS//HEAVILY DOPED POLYSILICON RESISTOR//LPCVD SI LAYERS
7 0.0000112201 POLY SI TFT//POLYCRYSTALLINE SILICON THIN FILM TRANSISTORS POLY SI TFTS//JOINT SCI TECHNOL
8 0.0000106536 METAL INDUCED CRYSTALLIZATION//SOLID PHASE CRYSTALLIZATION//METAL INDUCED LATERAL CRYSTALLIZATION
9 0.0000063131 EXPANDED CORE FIBER//FINE WIRING//H2 REDUCTION
10 0.0000062354 INTERFACIAL SILICON EMISSION//SILICON OXIDATION//LOW TEMPERATURE SILICON OXIDATION