Class information for:
Level 1: HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
2151 2272 21.1 65%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
2646 2988 HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 HIPIMS Author keyword 99 68% 4% 87
2 HPPMS Author keyword 38 70% 1% 32
3 HIGH POWER IMPULSE MAGNETRON SPUTTERING Author keyword 35 62% 2% 36
4 GRP DRAFT Address 32 78% 1% 21
5 IONIZED PHYSICAL VAPOR DEPOSITION Author keyword 22 81% 1% 13
6 IFM MAT PHYS Address 22 55% 1% 27
7 TARGET UTILIZATION Author keyword 21 90% 0% 9
8 PULSED MAGNETRON Author keyword 20 100% 0% 9
9 MAGNETRON Author keyword 19 21% 4% 80
10 PLASMA COATINGS PHYS Address 18 56% 1% 22

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 HIPIMS 99 68% 4% 87 Search HIPIMS Search HIPIMS
2 HPPMS 38 70% 1% 32 Search HPPMS Search HPPMS
3 HIGH POWER IMPULSE MAGNETRON SPUTTERING 35 62% 2% 36 Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING
4 IONIZED PHYSICAL VAPOR DEPOSITION 22 81% 1% 13 Search IONIZED+PHYSICAL+VAPOR+DEPOSITION Search IONIZED+PHYSICAL+VAPOR+DEPOSITION
5 TARGET UTILIZATION 21 90% 0% 9 Search TARGET+UTILIZATION Search TARGET+UTILIZATION
6 PULSED MAGNETRON 20 100% 0% 9 Search PULSED+MAGNETRON Search PULSED+MAGNETRON
7 MAGNETRON 19 21% 4% 80 Search MAGNETRON Search MAGNETRON
8 HIGH POWER PULSED MAGNETRON SPUTTERING 17 62% 1% 18 Search HIGH+POWER+PULSED+MAGNETRON+SPUTTERING Search HIGH+POWER+PULSED+MAGNETRON+SPUTTERING
9 REACTIVE SPUTTERING 17 14% 5% 114 Search REACTIVE+SPUTTERING Search REACTIVE+SPUTTERING
10 HIGH POWER IMPULSE MAGNETRON SPUTTERING HIPIMS 16 61% 1% 17 Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING+HIPIMS Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING+HIPIMS

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 TARGET EROSION 49 94% 1% 17
2 PULSED MAGNETRON DISCHARGE 47 84% 1% 26
3 PLANAR MAGNETRON 40 59% 2% 44
4 PHYSICAL VAPOR DEPOSITION 33 22% 6% 133
5 TITANIUM DEPOSITION 31 92% 1% 12
6 GAS RAREFACTION 30 100% 1% 12
7 SPUTTERING DISCHARGE 27 83% 1% 15
8 POWER DENSITIES 26 56% 1% 32
9 METAL IONIZATION 23 100% 0% 10
10 CYLINDRICAL MAGNETRON 18 89% 0% 8

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
High power impulse magnetron sputtering discharge 2012 98 197 94%
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art 2010 201 111 68%
Fundamental understanding and modeling of reactive sputtering processes 2005 243 17 94%
Ionized physical vapor deposition (IPVD): A review of technology and applications 2006 317 154 49%
An introduction to thin film processing using high-power impulse magnetron sputtering 2012 53 103 79%
Control of reactive sputtering processes 2005 142 22 95%
Physics and phenomena in pulsed magnetrons: an overview 2009 30 55 95%
Plasma diagnostics for understanding the plasma-surface interaction in HiPIMS discharges: a review 2014 3 288 65%
Computer modelling of magnetron discharges 2009 23 51 94%
Magnetron sputter deposition: Linking discharge voltage with target properties 2009 44 59 36%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 GRP DRAFT 32 78% 0.9% 21
2 IFM MAT PHYS 22 55% 1.2% 27
3 PLASMA COATINGS PHYS 18 56% 1.0% 22
4 NANOTECHNOL PVD 9 43% 0.7% 17
5 CHIM INORGAN ANALYT 9 32% 1.0% 23
6 FUNCT COATING SUR E ENGN 6 80% 0.2% 4
7 PHYS VVI 6 50% 0.4% 9
8 LOW TEMP PLASMA 6 33% 0.7% 15
9 ADV MAT SUR E ENGN 6 43% 0.4% 10
10 SUR E ENGN GRP 5 19% 1.1% 26

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000159687 ENERGY RESOLVED MASS SPECTROSCOPY//TRIODE ION PLATING//HOLLOW CATHODE ARC PLASMA
2 0.0000105654 LASER POLISHING//SELF ION ASSISTED DEPOSITION//QUASISTATIC PROBLEM OF THERMOELASTICITY
3 0.0000089379 TITANIUM NITRIDE//ZIRCONIUM NITRIDE//ZIRCONIUM OXYNITRIDE
4 0.0000083866 FUSED HOLLOW CATHODE//HOLLOW CATHODE//PLASMA GRP
5 0.0000075536 KAPPA AL2O3//ALUMINA COATINGS//COMBUSTION CHEMICAL VAPOR DEPOSITION
6 0.0000059481 AMERG//PHYS PROCEDES VIDE//INTRINSIC STRESS
7 0.0000057151 LADDER SHAPED ELECTRODE//PLASMA ATOM PHYS//VHF PLASMA
8 0.0000054608 ADV COATINGS EXPT//REACTIVE ION ASSISTED COEVAPORATION//TETRAGONAL AND MONOCLINIC PHASES
9 0.0000054216 CHROMIUM NITRIDE//TIALN//SUPERHARDNESS EFFECT
10 0.0000045263 IMPULSE PLASMA DEPOSITION//IPD METHOD//PULSED HIGH ENERGY DENSITY PLASMA