Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
21500 | 358 | 16.5 | 70% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1376 | 7700 | GALLIUM ARSENIDE//SULFUR PASSIVATION//INDIUM ARSENIDE |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | ATOMIC HYDROGEN CLEANING | Author keyword | 2 | 43% | 1% | 3 |
2 | ECR HYDROGEN PLASMA | Author keyword | 1 | 100% | 1% | 2 |
3 | IN SITU VACUUM PROCESS | Author keyword | 1 | 100% | 1% | 2 |
4 | ATOMIC HYDROGEN ASSISTED MOLECULAR BEAM EPITAXY | Author keyword | 1 | 50% | 0% | 1 |
5 | CRACKING EFFICIENCY | Author keyword | 1 | 50% | 0% | 1 |
6 | DOUBLE HETERO STRUCTURE | Author keyword | 1 | 50% | 0% | 1 |
7 | EXCESS AS | Author keyword | 1 | 50% | 0% | 1 |
8 | GALLIUM ARSENIDE 111A | Author keyword | 1 | 50% | 0% | 1 |
9 | LOW TEMPERATURE CLEANING | Author keyword | 1 | 50% | 0% | 1 |
10 | NEAR INTERFACE QUANTUM WELL | Author keyword | 1 | 50% | 0% | 1 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | DISLOCATION DENSITY GAAS | 15 | 82% | 3% | 9 |
2 | MOVPE REGROWTH | 4 | 67% | 1% | 4 |
3 | BEAM EPITAXIAL REGROWTH | 4 | 75% | 1% | 3 |
4 | OXIDE DESORPTION | 4 | 50% | 2% | 6 |
5 | SUBSTRATE OXIDE DESORPTION | 4 | 75% | 1% | 3 |
6 | RESONANCE ECR PLASMA | 2 | 67% | 1% | 2 |
7 | SITU CHARACTERIZATION | 2 | 67% | 1% | 2 |
8 | ARSENIC PASSIVATION | 2 | 50% | 1% | 3 |
9 | NONUNIVERSAL CONDUCTANCE QUANTIZATION | 1 | 38% | 1% | 3 |
10 | INP SURFACES | 1 | 16% | 2% | 7 |
Journals |
Reviews |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | STRUCT FUNCT PROPERTY GRP | 1 | 50% | 0.3% | 1 |
2 | SUR E THIN FILM STAND SECT | 1 | 50% | 0.3% | 1 |
3 | TOSHIBA EUROPE LTD | 1 | 25% | 0.6% | 2 |
4 | NANOTECHNOL ENGN GRP | 0 | 33% | 0.3% | 1 |
5 | CHIM INGN CHIM MAT | 0 | 25% | 0.3% | 1 |
6 | EMERGING DEVICES TECHNOL | 0 | 20% | 0.3% | 1 |
7 | MAT FINAL SPECIF | 0 | 17% | 0.3% | 1 |
8 | SEMICOND SUR E PHYS | 0 | 14% | 0.3% | 1 |
9 | NANOELE ON ABORAT | 0 | 100% | 0.3% | 1 |
10 | REPUBL CHINA TAIWAN INT PROGRAM | 0 | 100% | 0.3% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000182835 | SELECTIVE AREA GROWTH//TERTIARYBUTYLCHLORIDE//SELECTIVE EPITAXY |
2 | 0.0000172587 | SULFUR PASSIVATION//PHOSPHIDIZATION//PHOSPHINE PLASMA |
3 | 0.0000161079 | FUJIMI KU//GAAS OXIDE//REACTIVE ION BEAM ETCHING |
4 | 0.0000146990 | ELECTRON COUNTING MODEL//SUR E STUDY//GA ADATOM |
5 | 0.0000129029 | SEMICOND INTEGRATED CIRCUIT//SCI TECH FES SAIS//HIGFET |
6 | 0.0000110808 | OVAL DEFECTS//SEEIE//GA AS BI SOLUTION |
7 | 0.0000110429 | GAAS MOSFET//INTERFACE CONTROL LAYER//III V MOSFET |
8 | 0.0000109665 | ELECTROMAGNETIC GREENS FUNCTION//COUPLED PLASMON PHONON MODE//EDUC MACROMOLEC |
9 | 0.0000109021 | INDIUM PHOSPHIDE100//INTERACTION IONS MATTER//SIMULATION METHOD TRIM |
10 | 0.0000098936 | WEBSTER//ADIABATIC BOND CHARGE MODEL//INAS110 |