Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
20783 | 385 | 23.9 | 67% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
414 | 16017 | DIAMOND AND RELATED MATERIALS//DIAMOND//DIAMOND FILM |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | SINGLE CRYSTAL DIAMOND | Author keyword | 9 | 29% | 7% | 27 |
2 | CH3 RADICAL DENSITY | Author keyword | 4 | 75% | 1% | 3 |
3 | DIAMOND | Address | 4 | 12% | 8% | 32 |
4 | LIMHP | Address | 4 | 14% | 7% | 26 |
5 | MPCVD REACTOR | Author keyword | 3 | 100% | 1% | 3 |
6 | MICROWAVE ELECTRIC FIELD | Author keyword | 2 | 67% | 1% | 2 |
7 | MICROWAVE POWER DENSITY | Author keyword | 2 | 67% | 1% | 2 |
8 | INGN MAT HAUTES P S | Address | 2 | 11% | 5% | 18 |
9 | COATINGS LASER PLICAT | Address | 2 | 40% | 1% | 4 |
10 | HIGH RATE GROWTH | Author keyword | 2 | 33% | 1% | 5 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | RATE HOMOEPITAXIAL GROWTH | 15 | 62% | 4% | 16 |
2 | LOW PRESSURE MICROWAVE | 8 | 100% | 1% | 5 |
3 | MICROWAVE PLASMA CVD | 7 | 26% | 6% | 23 |
4 | DISCHARGE CH4 PLASMA | 7 | 67% | 2% | 6 |
5 | DIAMOND DEPOSITION | 5 | 22% | 5% | 19 |
6 | H 2 PLASMAS | 5 | 55% | 2% | 6 |
7 | POWER DENSITY REGIME | 4 | 67% | 1% | 4 |
8 | ASSISTED CVD REACTOR | 4 | 75% | 1% | 3 |
9 | DISCHARGE SIMULATIONS | 3 | 100% | 1% | 3 |
10 | NITROGEN ADDITION | 3 | 15% | 5% | 20 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
High quality MPACVD diamond single crystal growth: high microwave power density regime | 2007 | 46 | 96 | 28% |
Modelling of diamond deposition microwave cavity generated plasmas | 2010 | 21 | 162 | 20% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | DIAMOND | 4 | 12% | 8.3% | 32 |
2 | LIMHP | 4 | 14% | 6.8% | 26 |
3 | INGN MAT HAUTES P S | 2 | 11% | 4.7% | 18 |
4 | COATINGS LASER PLICAT | 2 | 40% | 1.0% | 4 |
5 | CNRS UPR 1311 | 1 | 38% | 0.8% | 3 |
6 | CNRS UMR 7040 | 1 | 50% | 0.5% | 2 |
7 | EXCELLENCE SCI ENGN ADV MAT DEVICES | 1 | 100% | 0.5% | 2 |
8 | UPR 1311 | 1 | 10% | 2.9% | 11 |
9 | ADV PROJECTS | 1 | 15% | 1.6% | 6 |
10 | FCT PROJECT | 1 | 21% | 1.0% | 4 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000262429 | DIAMOND AND RELATED MATERIALS//BIAS ENHANCED NUCLEATION//DIAMOND FILM |
2 | 0.0000225009 | STATE MMCMS//N TYPE DIAMOND//BORON DOPING |
3 | 0.0000195762 | NANOCRYSTALLINE DIAMOND//ULTRANANOCRYSTALLINE DIAMOND//ULTRANANOCRYSTALLINE DIAMOND FILMS |
4 | 0.0000162676 | SYNTHETIC DIAMOND//NATURAL DIAMONDS//NATURAL DIAMOND |
5 | 0.0000129706 | CVD DIAMOND DETECTOR//DIAMOND DETECTORS//DIAMOND DETECTOR |
6 | 0.0000118067 | DIAMOND//MAT LOW CARBON EMISS//HYDROGEN TERMINATED SURFACE |
7 | 0.0000113062 | DYNAMIC FRICTION POLISHING//P TYPE DIAMOND FILMS//DESIGN TECHNOL MONOCRYSTAL |
8 | 0.0000099156 | SURFACE WAVE PLASMA//GRP ESPE OSCOPIA PLASMAS//GRP PHYS PLASMAS |
9 | 0.0000088811 | NITROGEN AFTERGLOW//FIS PLASMAS//CO2 LASER MIXTURE |
10 | 0.0000067007 | NITROGEN VACANCY CENTER//NV CENTER//NV CENTERS |