Class information for:
Level 1: RAPID THERMAL PROCESSING RTP//RAPID THERMAL PROCESSING//CTOD FRACTURE TOUGHNESS TESTING

Basic class information

ID Publications Average number
of references
Avg. shr. active
ref. in WoS
20709 388 17.8 42%



Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)



ID, lev.
above
Publications Label for level above
2847 2446 INTERFACIAL SHEARS//MICROBENDING LOSS//RAPID THERMAL PROCESSING RTP

Terms with highest relevance score



Rank Term Type of term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 RAPID THERMAL PROCESSING RTP Author keyword 10 38% 5% 20
2 RAPID THERMAL PROCESSING Author keyword 9 20% 11% 41
3 CTOD FRACTURE TOUGHNESS TESTING Author keyword 6 100% 1% 4
4 CTOD R RESISTANCE CURVE Author keyword 6 100% 1% 4
5 SILICON NANOELECT Address 5 44% 2% 8
6 RAPID ISOTHERMAL PROCESSING RIP Author keyword 4 75% 1% 3
7 THERMAL BUDGET CONTROL Author keyword 4 75% 1% 3
8 WAFER TEMPERATURE UNIFORMITY Author keyword 4 75% 1% 3
9 PLANE PLASMA DISCHARGE Author keyword 3 100% 1% 3
10 SIMS DEPTH PROFILE Author keyword 3 45% 1% 5

Web of Science journal categories

Author Key Words



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
LCSH search Wikipedia search
1 RAPID THERMAL PROCESSING RTP 10 38% 5% 20 Search RAPID+THERMAL+PROCESSING+RTP Search RAPID+THERMAL+PROCESSING+RTP
2 RAPID THERMAL PROCESSING 9 20% 11% 41 Search RAPID+THERMAL+PROCESSING Search RAPID+THERMAL+PROCESSING
3 CTOD FRACTURE TOUGHNESS TESTING 6 100% 1% 4 Search CTOD+FRACTURE+TOUGHNESS+TESTING Search CTOD+FRACTURE+TOUGHNESS+TESTING
4 CTOD R RESISTANCE CURVE 6 100% 1% 4 Search CTOD+R+RESISTANCE+CURVE Search CTOD+R+RESISTANCE+CURVE
5 RAPID ISOTHERMAL PROCESSING RIP 4 75% 1% 3 Search RAPID+ISOTHERMAL+PROCESSING+RIP Search RAPID+ISOTHERMAL+PROCESSING+RIP
6 THERMAL BUDGET CONTROL 4 75% 1% 3 Search THERMAL+BUDGET+CONTROL Search THERMAL+BUDGET+CONTROL
7 WAFER TEMPERATURE UNIFORMITY 4 75% 1% 3 Search WAFER+TEMPERATURE+UNIFORMITY Search WAFER+TEMPERATURE+UNIFORMITY
8 PLANE PLASMA DISCHARGE 3 100% 1% 3 Search PLANE+PLASMA+DISCHARGE Search PLANE+PLASMA+DISCHARGE
9 SIMS DEPTH PROFILE 3 45% 1% 5 Search SIMS+DEPTH+PROFILE Search SIMS+DEPTH+PROFILE
10 INVERSE PROBLEM ALGORITHM 2 67% 1% 2 Search INVERSE+PROBLEM+ALGORITHM Search INVERSE+PROBLEM+ALGORITHM

Key Words Plus



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 TEMPERATURE UNIFORMITY 12 63% 3% 12
2 RTP 4 30% 3% 12
3 CIRCULAR INFRARED LAMP 1 100% 1% 2
4 PIPE RADIATION THERMOMETER 1 100% 1% 2
5 TEMPERATURE DEPENDENT EMISSIVITY 1 50% 1% 2
6 WAFER TEMPERATURE UNIFORMITY 1 50% 1% 2
7 SEMICONDUCTOR WAFERS 1 13% 2% 8
8 WAFER TEMPERATURE 1 20% 1% 4
9 RAPID THERMAL PROCESSOR 1 33% 1% 2
10 SIHCL3 H 2 SYSTEM 1 18% 1% 4

Journals

Reviews



Title Publ. year Cit. Active
references
% act. ref.
to same field
Temperature Measurement in Rapid Thermal Processing with Focus on the Application to Flash Lamp Annealing 2011 2 13 38%
RAPID THERMAL-PROCESSING SYSTEMS - A REVIEW WITH EMPHASIS ON TEMPERATURE CONTROL 1990 58 25 20%

Address terms



Rank Address term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ.
in class
1 SILICON NANOELECT 5 44% 2.1% 8
2 MECH ENGN MARIBOR 2 67% 0.5% 2
3 RTP PROD BUSINESS UNIT 2 67% 0.5% 2
4 ELECT ENGN SEMICOND 1 100% 0.5% 2
5 OBERFLACHEN ICHTENANALYT 1 100% 0.5% 2
6 IUT SENART 1 27% 0.8% 3
7 ELEKTRONENMIKROSKOPIE FE RUKTURFOR 1 50% 0.3% 1
8 EXCELLENCE PHOTOVOLTA EDUC 1 22% 0.5% 2
9 THERMAL ANAL MAT PROC 0 20% 0.5% 2
10 CES ENERGY EFFICIENCY SYST 0 33% 0.3% 1

Related classes at same level (level 1)



Rank Relatedness score Related classes
1 0.0000139766 MEASUREMENT ENGN SENSOR TECHNOL//PHYS TECHNOL LOW DIMENS STRUCT//PLANAR MICROCAVITIES
2 0.0000119104 PARASITIC REACTION//CVD REACTOR//MOCVD REACTOR
3 0.0000094435 RUN TO RUN CONTROL//IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING//AUTOMATIC VIRTUAL METROLOGY AVM
4 0.0000075931 X RAY FRACTOGRAPHY//SCANNING ELECTRON BEAM//BE AL
5 0.0000066701 INTERFACIAL SHEARS//NON LOCAL STRESS CURVATURE RELATIONS//NON UNIFORM MISFIT STRAIN
6 0.0000064661 INTERFACIAL SILICON EMISSION//SILICON OXIDATION//LOW TEMPERATURE SILICON OXIDATION
7 0.0000063212 ULTRAVIOLET LIGHT DETECTORS//ORIENTATION OF MOLECULES//BORON CHEMICAL VAPOR DEPOSITION
8 0.0000062006 SPECTRAL EMISSIVITY//MULTISPECTRAL RADIATION THERMOMETRY//SINTESIS ESTUDIO MAT
9 0.0000060961 SCATTERING CORRECTIONS//FED SCI PROD//SPECTRAL MATCHING FACTOR
10 0.0000050379 D CAMPHOR BETA SULFONIC ACID//P NITROPHENYLHYDRAZINE//HYDROGEN STORAGE INTERMETALLICS