Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
2047 | 2308 | 21.9 | 62% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
303 | 17862 | SURFACE & COATINGS TECHNOLOGY//PLASMA NITRIDING//EXPANDED AUSTENITE |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | TITANIUM NITRIDE | Author keyword | 33 | 16% | 8% | 188 |
2 | ZIRCONIUM NITRIDE | Author keyword | 27 | 48% | 2% | 42 |
3 | ZIRCONIUM OXYNITRIDE | Author keyword | 25 | 75% | 1% | 18 |
4 | HOLLOW CATHODE DISCHARGE ION PLATING | Author keyword | 18 | 89% | 0% | 8 |
5 | ZRN | Author keyword | 14 | 32% | 2% | 36 |
6 | TITANIUM NITRIDE FILMS | Author keyword | 13 | 69% | 0% | 11 |
7 | TINXOY | Author keyword | 12 | 75% | 0% | 9 |
8 | ZIRCONIUM NITRIDES | Author keyword | 11 | 78% | 0% | 7 |
9 | TITANIUM OXYNITRIDE | Author keyword | 10 | 40% | 1% | 19 |
10 | FCC HCP TRANSFORMATION | Author keyword | 9 | 83% | 0% | 5 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | TITANIUM NITRIDE | 33 | 16% | 8% | 188 | Search TITANIUM+NITRIDE | Search TITANIUM+NITRIDE |
2 | ZIRCONIUM NITRIDE | 27 | 48% | 2% | 42 | Search ZIRCONIUM+NITRIDE | Search ZIRCONIUM+NITRIDE |
3 | ZIRCONIUM OXYNITRIDE | 25 | 75% | 1% | 18 | Search ZIRCONIUM+OXYNITRIDE | Search ZIRCONIUM+OXYNITRIDE |
4 | HOLLOW CATHODE DISCHARGE ION PLATING | 18 | 89% | 0% | 8 | Search HOLLOW+CATHODE+DISCHARGE+ION+PLATING | Search HOLLOW+CATHODE+DISCHARGE+ION+PLATING |
5 | ZRN | 14 | 32% | 2% | 36 | Search ZRN | Search ZRN |
6 | TITANIUM NITRIDE FILMS | 13 | 69% | 0% | 11 | Search TITANIUM+NITRIDE+FILMS | Search TITANIUM+NITRIDE+FILMS |
7 | TINXOY | 12 | 75% | 0% | 9 | Search TINXOY | Search TINXOY |
8 | ZIRCONIUM NITRIDES | 11 | 78% | 0% | 7 | Search ZIRCONIUM+NITRIDES | Search ZIRCONIUM+NITRIDES |
9 | TITANIUM OXYNITRIDE | 10 | 40% | 1% | 19 | Search TITANIUM+OXYNITRIDE | Search TITANIUM+OXYNITRIDE |
10 | FCC HCP TRANSFORMATION | 9 | 83% | 0% | 5 | Search FCC+HCP+TRANSFORMATION | Search FCC+HCP+TRANSFORMATION |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | TITANIUM NITRIDE FILMS | 41 | 47% | 3% | 64 |
2 | TIN FILMS | 40 | 27% | 6% | 127 |
3 | TITANIUM NITRIDE | 37 | 17% | 8% | 195 |
4 | ZRN | 35 | 38% | 3% | 73 |
5 | HFN | 33 | 52% | 2% | 45 |
6 | GAS PULSING TECHNIQUE | 20 | 100% | 0% | 9 |
7 | ZIRCONIUM NITRIDE FILMS | 20 | 67% | 1% | 18 |
8 | SPONTANEOUS HYDROGENATION | 15 | 82% | 0% | 9 |
9 | EPITAXIAL TIN100 FILMS | 12 | 86% | 0% | 6 |
10 | PREFERRED ORIENTATION | 12 | 11% | 4% | 102 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate | 2009 | 39 | 96 | 56% |
Ion bombardment effects during deposition of nitride and metal films | 1998 | 36 | 23 | 91% |
Study of TiN and ZrN thin films grown by cathodic arc technique | 2006 | 34 | 34 | 50% |
Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films | 2008 | 19 | 96 | 47% |
Structure, electrical and optical properties of TiNx films by atmospheric pressure chemical vapor deposition | 2011 | 4 | 22 | 59% |
USE OF ION-BEAM ASSISTED DEPOSITION TO MODIFY THE MICROSTRUCTURE AND PROPERTIES OF THIN-FILMS | 1990 | 276 | 178 | 25% |
ION-BEAM ASSISTED THIN-FILM DEPOSITION | 1991 | 120 | 75 | 37% |
Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides | 2003 | 55 | 134 | 34% |
A REVIEW OF THE PRESENT STATE OF ART IN HARD COATINGS GROWN FROM THE VAPOR-PHASE | 1986 | 365 | 96 | 44% |
Review of thin film materials deposition by filtered cathodic vacuum arc process at CSIRO | 2014 | 2 | 29 | 24% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | TECHNOL EQUIPMENT MAT SCI | 5 | 55% | 0.3% | 6 |
2 | POT MPH | 3 | 100% | 0.1% | 3 |
3 | MARINE SCI TECHNOL ANDALUCIA | 2 | 67% | 0.1% | 2 |
4 | CHAMOS MATRUSANSTHA MECH ENGN | 1 | 100% | 0.1% | 2 |
5 | GEN EDUC GRP | 1 | 100% | 0.1% | 2 |
6 | MET PHYSSP2MI | 1 | 100% | 0.1% | 2 |
7 | PLASMA SUR E TECHNOL MAT PHYS | 1 | 50% | 0.1% | 2 |
8 | PSDB | 1 | 100% | 0.1% | 2 |
9 | STATE PLAST FORMING SIMULAT DIE MOULD T | 1 | 50% | 0.1% | 2 |
10 | UTS MAT COMP | 1 | 50% | 0.1% | 2 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000211450 | TINX FILMS//MAT CHEM COATINGS//TDEAT |
2 | 0.0000180241 | ZRCN//GRF CFUM//SEG CEMUC MECH ENGN |
3 | 0.0000168551 | ENERGY RESOLVED MASS SPECTROSCOPY//TRIODE ION PLATING//HOLLOW CATHODE ARC PLASMA |
4 | 0.0000168457 | CHROMIUM NITRIDE//TIALN//SUPERHARDNESS EFFECT |
5 | 0.0000108277 | TI B N//TITANIUM DIBORIDE COATING//TIBN |
6 | 0.0000100256 | DIFFUSED INTERFACE//DUPLEX COATING TECHNIQUE//FATIGUE AND CORROSION FATIGUE PROPERTIES |
7 | 0.0000099874 | DELTA MON//MOLYBDENUM NITRIDE//MOLYBDENUM NITRIDE COATINGS |
8 | 0.0000095706 | AMERG//PHYS PROCEDES VIDE//INTRINSIC STRESS |
9 | 0.0000094242 | W TI THIN FILMS//WTI THIN FILMS//SURFACE LASER TREATMENT |
10 | 0.0000093428 | IM FRANTSEVYCH PROBLEMS MAT SCI//TRANSITION METAL CARBIDES//SINGLE NANO SIZED PARTICLE |