Class information for:
Level 1: LIBWE//BACKSIDE ETCHING//LASER INDUCED BACKSIDE WET ETCHING

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
20383 401 18.4 69%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1053 9576 JOURNAL OF LASER MICRO NANOENGINEERING//LASER CLEANING//FEMTOSECOND LASER

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 LIBWE Author keyword 29 88% 3% 14
2 BACKSIDE ETCHING Author keyword 9 83% 1% 5
3 LASER INDUCED BACKSIDE WET ETCHING Author keyword 6 71% 1% 5
4 LIBDE Author keyword 6 100% 1% 4
5 LASER ETCHING Author keyword 5 22% 5% 19
6 PLICAT PLASMA PHOTON Address 3 50% 1% 5
7 DIELECTRIC MASK Author keyword 3 57% 1% 4
8 TWIN LIBWE Author keyword 3 100% 1% 3
9 VISIBLE LIBWE Author keyword 3 100% 1% 3
10 ARRAYED MICROSTRUCTURE Author keyword 2 67% 0% 2

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 LIBWE 29 88% 3% 14 Search LIBWE Search LIBWE
2 BACKSIDE ETCHING 9 83% 1% 5 Search BACKSIDE+ETCHING Search BACKSIDE+ETCHING
3 LASER INDUCED BACKSIDE WET ETCHING 6 71% 1% 5 Search LASER+INDUCED+BACKSIDE+WET+ETCHING Search LASER+INDUCED+BACKSIDE+WET+ETCHING
4 LIBDE 6 100% 1% 4 Search LIBDE Search LIBDE
5 LASER ETCHING 5 22% 5% 19 Search LASER+ETCHING Search LASER+ETCHING
6 DIELECTRIC MASK 3 57% 1% 4 Search DIELECTRIC+MASK Search DIELECTRIC+MASK
7 TWIN LIBWE 3 100% 1% 3 Search TWIN+LIBWE Search TWIN+LIBWE
8 VISIBLE LIBWE 3 100% 1% 3 Search VISIBLE+LIBWE Search VISIBLE+LIBWE
9 ARRAYED MICROSTRUCTURE 2 67% 0% 2 Search ARRAYED+MICROSTRUCTURE Search ARRAYED+MICROSTRUCTURE
10 DPSS UV LASER 2 67% 0% 2 Search DPSS+UV+LASER Search DPSS+UV+LASER

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 UV TRANSPARENT MATERIALS 47 88% 5% 22
2 LIBWE METHOD 10 63% 2% 10
3 PLASMA ASSISTED ABLATION 9 45% 4% 15
4 WET ETCHING TECHNIQUE 6 100% 1% 4
5 MULTIWAVELENGTH EXCITATION 5 54% 2% 7
6 ORGANIC SOLUTION 5 26% 4% 18
7 KRF EXCIMER 5 55% 1% 6
8 LIBWE 4 75% 1% 3
9 MULTIPHOTONIC ABSORPTION 4 56% 1% 5
10 LIPAA 2 67% 0% 2

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
Recent developments on microablation of glass materials using excimer lasers 2007 14 22 36%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 PLICAT PLASMA PHOTON 3 50% 1.2% 5
2 ION BEAM TECH 2 67% 0.5% 2
3 ENERGY PHYS TECHNOL 1 14% 2.0% 8
4 ACAE 1 50% 0.2% 1
5 BEIJING ENGN PRECIS MEASUREMENT TECHNOL 1 50% 0.2% 1
6 COMP SCI PL NAT SCI 1 50% 0.2% 1
7 GREMI UMR 7344 1 50% 0.2% 1
8 JOHN DEERE 1 50% 0.2% 1
9 ABT IONENSTRAHLTECH 0 25% 0.2% 1
10 ADV PHOTON SCI SI 0 25% 0.2% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000224684 WET ETCHING OF GLASS//DEEP GLASS ETCHING//TECH SUPPORT MACHINERY MET IND
2 0.0000168631 PULSED LASER PHOTODEPOSITION//UMR CNRS UNIV 5798//OPTICAL MICROELEMENTS
3 0.0000146964 LASER IMPLANTATION//LASER INDUCED POLYMER FILMS//MOLECULAR JET
4 0.0000124844 FEMTOSECOND LASER ABLATION//FEMTOSECOND LASER//PHOTO MFG SCI TECHNOL
5 0.0000095847 LASER MICROPROC GRP//PHOTON CRAFT PROJECT//PARTICLE PHYS PARTICLE IRRADIAT
6 0.0000081159 SYST CONTROL INTEGRAT//LEHRSTUHL PHOTON TECHNOL//LASER SCRIBING
7 0.0000078243 157 NM LASER//SUR E ENGN OPTOELECT F4//HYBRIDIZATION REACTION
8 0.0000071709 SYNCHROTRON RADIATION STIMULATED ETCHING//SYNCHROTRON RADIATION EXCITED GROWTH//VACUUM UV PHOTOSCI
9 0.0000070584 RD OPT THIN FILM COATINGS//TIO2 SIO2 HIGH REFLECTORS//LASER INDUCED DAMAGE
10 0.0000061400 CHAIR PHYS CHEM 2//CRYSTAL REORIENTATION//NON PYROPHORIC