Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
20142 | 411 | 15.7 | 37% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
2557 | 3267 | INTERFACIAL SILICON EMISSION//SILICON OXIDATION//GENIE URBAIN ENVIRONM |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | IRRADIATED P N JUNCTION LEAKAGE | Author keyword | 1 | 100% | 0% | 2 |
2 | JUNCTION SHAPE | Author keyword | 1 | 100% | 0% | 2 |
3 | P N JUNCTION LEAKAGE | Author keyword | 1 | 100% | 0% | 2 |
4 | PHOTOELECTRIC MOSFET | Author keyword | 1 | 100% | 0% | 2 |
5 | SI JUNCTION DIODES | Author keyword | 1 | 100% | 0% | 2 |
6 | SILICON SUBSTRATE HARDENING | Author keyword | 1 | 100% | 0% | 2 |
7 | SURFACE GENERATION VELOCITY | Author keyword | 1 | 30% | 1% | 3 |
8 | MAT PL SCI | Address | 1 | 11% | 2% | 7 |
9 | CARRIER LIFETIMES | Author keyword | 1 | 19% | 1% | 4 |
10 | P N JUNCTION DIODES | Author keyword | 1 | 33% | 0% | 2 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | CONVECTIVE CURRENTS | 3 | 100% | 1% | 3 |
2 | EMISSION CURRENTS | 3 | 100% | 1% | 3 |
3 | IMPLEMENTATION PRINCIPLES | 3 | 100% | 1% | 3 |
4 | PERIPHERAL CURRENT ANALYSIS | 2 | 67% | 0% | 2 |
5 | PULSED MOS CAPACITOR | 2 | 67% | 0% | 2 |
6 | SEMICONDUCTOR INSULATOR INTERFACE | 2 | 67% | 0% | 2 |
7 | PULSED MIS CAPACITOR | 2 | 50% | 1% | 3 |
8 | GENERATION LIFETIME | 2 | 26% | 1% | 5 |
9 | NP JUNCTION DIODES | 1 | 38% | 1% | 3 |
10 | RECOMBINATION LIFETIME | 1 | 21% | 1% | 5 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
THE PULSED MIS CAPACITOR - A CRITICAL-REVIEW | 1985 | 53 | 8 | 100% |
Separation of dynamic current-voltage characteristics (DCVCs) of an oxide film from the DCVC of ionic currents in a metal oxide semiconductor structure: Universal quasi-static DCVCs of a film | 2006 | 0 | 7 | 86% |
ELECTRICAL CHARACTERIZATION OF SEMICONDUCTOR-MATERIALS AND DEVICES | 1986 | 0 | 4 | 50% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MAT PL SCI | 1 | 11% | 1.7% | 7 |
2 | ADV EDRAM | 1 | 50% | 0.2% | 1 |
3 | INVEST DISPOSIT SEMICONDUCTO | 1 | 50% | 0.2% | 1 |
4 | INTER E COMPOSANTS MICROELECT | 0 | 33% | 0.2% | 1 |
5 | YIELD ENHANCEMENT TEAM | 0 | 33% | 0.2% | 1 |
6 | IST NUOVI MAT ELETTRON | 0 | 14% | 0.2% | 1 |
7 | SHU SOLAR E PV | 0 | 14% | 0.2% | 1 |
8 | MICRODEVICES | 0 | 13% | 0.2% | 1 |
9 | ELE ON ELE OTECH | 0 | 100% | 0.2% | 1 |
10 | ELECT ENGN ESAT INTEGRATED SYST | 0 | 100% | 0.2% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000199519 | HITACHI ADM//SOLAR CELL METALLIZATION// |
2 | 0.0000147427 | EMISSION RATE SPECTRUM//CAPACITANCE TRANSIENTS//DLTS RESOLUTION |
3 | 0.0000120490 | SIDEWALL OXIDATION//COMPUTAT ELECT//MEMORY DEVICE BUSINESS |
4 | 0.0000091349 | NONIONIZING ENERGY LOSS NIEL//DISPLACEMENT DAMAGE DOSE//NONIONIZING ENERGY LOSS |
5 | 0.0000090647 | AC SURFACE PHOTOVOLTAGE//SCANNING PHOTON MICROSCOPE//METAL AIR INSULATOR SEMICONDUCTOR |
6 | 0.0000077257 | OXYGEN PRECIPITATION//GROWN IN DEFECT//CZOCHRALSKI SILICON |
7 | 0.0000073010 | MOS TUNNELING DIODE//ELECTRON HOLE PLASMA RECOMBINATION//LATERAL NONUNIFORMITY LNU |
8 | 0.0000070931 | CAPACITORLESS DRAM//1T DRAM//CAPACITORLESS 1T DRAM |
9 | 0.0000066328 | GETTERING//GETTERING EFFICIENCY//SI AU |
10 | 0.0000065428 | ELECTRICAL PASSIVATION OF STRUCTURAL DEFECTS//GAAS DIODE//TRIPLE CRYSTAL DIFFRACTOMETRY |