Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
200 | 3886 | 20.0 | 76% |
Classes in level above (level 2) |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | GAN | Author keyword | 78 | 11% | 17% | 656 |
2 | HYDRIDE VAPOR PHASE EPITAXY | Author keyword | 77 | 48% | 3% | 118 |
3 | AMMONOTHERMAL CRYSTAL GROWTH | Author keyword | 45 | 90% | 0% | 19 |
4 | AMMONOTHERMAL GROWTH | Author keyword | 38 | 89% | 0% | 17 |
5 | NITRIDES | Author keyword | 36 | 10% | 9% | 332 |
6 | HVPE | Author keyword | 36 | 37% | 2% | 77 |
7 | MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH | Journal | 32 | 24% | 3% | 119 |
8 | GALLIUM NITRIDE | Author keyword | 31 | 13% | 6% | 224 |
9 | HYDRIDE VAPOR PHASE EPITAXY HVPE | Author keyword | 30 | 79% | 0% | 19 |
10 | HIGH PRESSURE GROWTH FROM SOLUTION | Author keyword | 27 | 92% | 0% | 11 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | GAN | 78 | 11% | 17% | 656 | Search GAN | Search GAN |
2 | HYDRIDE VAPOR PHASE EPITAXY | 77 | 48% | 3% | 118 | Search HYDRIDE+VAPOR+PHASE+EPITAXY | Search HYDRIDE+VAPOR+PHASE+EPITAXY |
3 | AMMONOTHERMAL CRYSTAL GROWTH | 45 | 90% | 0% | 19 | Search AMMONOTHERMAL+CRYSTAL+GROWTH | Search AMMONOTHERMAL+CRYSTAL+GROWTH |
4 | AMMONOTHERMAL GROWTH | 38 | 89% | 0% | 17 | Search AMMONOTHERMAL+GROWTH | Search AMMONOTHERMAL+GROWTH |
5 | NITRIDES | 36 | 10% | 9% | 332 | Search NITRIDES | Search NITRIDES |
6 | HVPE | 36 | 37% | 2% | 77 | Search HVPE | Search HVPE |
7 | GALLIUM NITRIDE | 31 | 13% | 6% | 224 | Search GALLIUM+NITRIDE | Search GALLIUM+NITRIDE |
8 | HYDRIDE VAPOR PHASE EPITAXY HVPE | 30 | 79% | 0% | 19 | Search HYDRIDE+VAPOR+PHASE+EPITAXY+HVPE | Search HYDRIDE+VAPOR+PHASE+EPITAXY+HVPE |
9 | HIGH PRESSURE GROWTH FROM SOLUTION | 27 | 92% | 0% | 11 | Search HIGH+PRESSURE+GROWTH+FROM+SOLUTION | Search HIGH+PRESSURE+GROWTH+FROM+SOLUTION |
10 | SEMICONDUCTING GALLIUM COMPOUNDS | 16 | 25% | 1% | 56 | Search SEMICONDUCTING+GALLIUM+COMPOUNDS | Search SEMICONDUCTING+GALLIUM+COMPOUNDS |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | GALLIUM NITRIDE | 95 | 17% | 13% | 497 |
2 | THREADING DISLOCATIONS | 77 | 38% | 4% | 159 |
3 | VAPOR PHASE EPITAXY | 76 | 13% | 15% | 567 |
4 | AIN BUFFER LAYER | 70 | 53% | 2% | 92 |
5 | SAPPHIRE | 64 | 11% | 15% | 574 |
6 | HVPE | 54 | 48% | 2% | 83 |
7 | BULK GAN | 47 | 46% | 2% | 75 |
8 | BUFFER LAYER | 39 | 15% | 6% | 247 |
9 | HIGH N 2 PRESSURE | 38 | 93% | 0% | 14 |
10 | DISLOCATION DENSITY | 31 | 22% | 3% | 123 |
Journals |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH | 32 | 24% | 3% | 119 |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
III-nitrides: Growth, characterization, and properties | 2000 | 775 | 133 | 38% |
Metal organic vapour phase epitaxy of GaN and lateral overgrowth | 2004 | 160 | 195 | 74% |
Substrates for gallium nitride epitaxy | 2002 | 398 | 343 | 40% |
X-ray diffraction of III-nitrides | 2009 | 225 | 210 | 28% |
Epitaxial lateral overgrowth of GaN | 2001 | 126 | 119 | 77% |
Dislocations and their reduction in GaN | 2010 | 26 | 58 | 84% |
Growth and applications of Group III nitrides | 1998 | 766 | 221 | 32% |
Gallium nitride bulk crystal growth processes: A review | 2006 | 51 | 80 | 74% |
Properties of GaN and related compounds studied by means of Raman scattering | 2002 | 314 | 108 | 22% |
Breakthroughs in improving crystal quality of GaN and invention of the p-n junction blue-light-emitting diode | 2006 | 55 | 36 | 50% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ETUD RECH MAT | 13 | 37% | 0.7% | 28 |
2 | RIM | 7 | 28% | 0.5% | 21 |
3 | OE TEAM | 6 | 80% | 0.1% | 4 |
4 | UNIV RECH ALENCON | 6 | 71% | 0.1% | 5 |
5 | STRUCT INTER ES FONCT COUCHES MINCES | 6 | 58% | 0.2% | 7 |
6 | CENT SOLAR ENERGY | 5 | 63% | 0.1% | 5 |
7 | NJC TECHNOL | 5 | 55% | 0.2% | 6 |
8 | RECH PROPRIETES MAT NOUVEAUX | 5 | 44% | 0.2% | 8 |
9 | SEMICOND SCI TECHNOL | 5 | 10% | 1.1% | 42 |
10 | ERATO JST UCSB GRP | 4 | 75% | 0.1% | 3 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000264597 | GAN SURFACES//INTERDISCIPLINARY MODELLING//INTERDISCIPLINARY MAT MODELLING |
2 | 0.0000259288 | SI111 SUBSTRATES//SI111 SUBSTRATE//ALN BUFFER |
3 | 0.0000258661 | EPITAXIAL SEMICOND GRP//EXP SOLID STATE PHYS 3//RECIPROCAL SPACE ANALYSIS |
4 | 0.0000204622 | LIGAO2//AMORPHOUS GAN//NON POLAR NITRIDES |
5 | 0.0000199503 | OBNINSK BRANCH FED STATE UNITARY ENTERPRISE//YELLOW LUMINESCENCE//MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH |
6 | 0.0000175986 | CUBIC GAN//FB PHYS 6//HEXAGONAL GAN |
7 | 0.0000153522 | SEMICONDUCTING ALUMINUM COMPOUNDS//CERAM OPERAT//ALGAN |
8 | 0.0000148053 | A PLANE GAN//LED TECHNOL//NONPOLAR |
9 | 0.0000124360 | SOCIOTECHNO SCI TECHNOL//N GAN//GALLIUM HYDROXIDE |
10 | 0.0000114907 | P INGAN//GAN SIC HETEROJUNCTION//COMMON EMITTER |