Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
1989 | 2332 | 21.1 | 59% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
138 | 22619 | IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | OXIDE TRAPPED CHARGE | Author keyword | 38 | 63% | 2% | 38 |
2 | ELDRS | Author keyword | 29 | 67% | 1% | 26 |
3 | TOTAL IONIZING DOSE | Author keyword | 28 | 36% | 3% | 64 |
4 | ENHANCED LOW DOSE RATE SENSITIVITY | Author keyword | 26 | 87% | 1% | 13 |
5 | ENHANCED LOW DOSE RATE SENSITIVITY ELDRS | Author keyword | 25 | 77% | 1% | 17 |
6 | GAIN DEGRADATION | Author keyword | 23 | 72% | 1% | 18 |
7 | TOTAL DOSE EFFECT | Author keyword | 21 | 85% | 0% | 11 |
8 | TOTAL DOSE | Author keyword | 17 | 34% | 2% | 41 |
9 | TOTAL IONIZING DOSE TID | Author keyword | 16 | 40% | 1% | 31 |
10 | TOTAL DOSE EFFECTS | Author keyword | 15 | 50% | 1% | 22 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | OXIDE TRAPPED CHARGE | 38 | 63% | 2% | 38 | Search OXIDE+TRAPPED+CHARGE | Search OXIDE+TRAPPED+CHARGE |
2 | ELDRS | 29 | 67% | 1% | 26 | Search ELDRS | Search ELDRS |
3 | TOTAL IONIZING DOSE | 28 | 36% | 3% | 64 | Search TOTAL+IONIZING+DOSE | Search TOTAL+IONIZING+DOSE |
4 | ENHANCED LOW DOSE RATE SENSITIVITY | 26 | 87% | 1% | 13 | Search ENHANCED+LOW+DOSE+RATE+SENSITIVITY | Search ENHANCED+LOW+DOSE+RATE+SENSITIVITY |
5 | ENHANCED LOW DOSE RATE SENSITIVITY ELDRS | 25 | 77% | 1% | 17 | Search ENHANCED+LOW+DOSE+RATE+SENSITIVITY+ELDRS | Search ENHANCED+LOW+DOSE+RATE+SENSITIVITY+ELDRS |
6 | GAIN DEGRADATION | 23 | 72% | 1% | 18 | Search GAIN+DEGRADATION | Search GAIN+DEGRADATION |
7 | TOTAL DOSE EFFECT | 21 | 85% | 0% | 11 | Search TOTAL+DOSE+EFFECT | Search TOTAL+DOSE+EFFECT |
8 | TOTAL DOSE | 17 | 34% | 2% | 41 | Search TOTAL+DOSE | Search TOTAL+DOSE |
9 | TOTAL IONIZING DOSE TID | 16 | 40% | 1% | 31 | Search TOTAL+IONIZING+DOSE+TID | Search TOTAL+IONIZING+DOSE+TID |
10 | TOTAL DOSE EFFECTS | 15 | 50% | 1% | 22 | Search TOTAL+DOSE+EFFECTS | Search TOTAL+DOSE+EFFECTS |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | GAIN DEGRADATION | 112 | 85% | 3% | 60 |
2 | HARDNESS ASSURANCE | 81 | 75% | 2% | 58 |
3 | INTERFACE TRAP FORMATION | 58 | 73% | 2% | 45 |
4 | MOBILE PROTONS | 45 | 94% | 1% | 16 |
5 | INDUCED GAIN DEGRADATION | 38 | 84% | 1% | 21 |
6 | BORDER TRAPS | 32 | 41% | 3% | 62 |
7 | PB DEFECTS | 32 | 85% | 1% | 17 |
8 | MOS DEVICES | 31 | 25% | 5% | 110 |
9 | ELDRS | 31 | 92% | 1% | 12 |
10 | ISOLATION OXIDES | 30 | 100% | 1% | 12 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Total ionizing dose effects in MOS oxides and devices | 2003 | 194 | 98 | 87% |
THE SILICON SILICON-DIOXIDE SYSTEM - ITS MICROSTRUCTURE AND IMPERFECTIONS | 1994 | 245 | 67 | 52% |
Radiation effects and hardening of MOS technology: Devices and circuits | 2003 | 100 | 290 | 74% |
Total ionizing dose effects in bipolar devices and circuits | 2003 | 43 | 72 | 96% |
Oxide, interface, and border traps in thermal, N2O, and N2O-nitrided oxides | 1996 | 98 | 86 | 52% |
1/F NOISE AND RADIATION EFFECTS IN MOS DEVICES | 1994 | 92 | 75 | 73% |
Effects of hydrogen transport and reactions on microelectronics radiation response and reliability | 2002 | 52 | 177 | 63% |
Total-dose radiation hardness assurance | 2003 | 32 | 114 | 96% |
Influence of ionizing radiation and hot carrier injection on metal-oxide-semiconductor transistors | 2008 | 6 | 87 | 62% |
Analysis of Effective Gate Length Modulation by X-Ray Irradiation for Fully Depleted SOI p-MOSFETs | 2015 | 0 | 16 | 63% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ELECT ENGN NIKOLA TESLA | 5 | 63% | 0.2% | 5 |
2 | SPACE MISSION TECHNOL | 4 | 67% | 0.2% | 4 |
3 | IBW RELIC | 4 | 75% | 0.1% | 3 |
4 | FIS DISPOSIT MICROELECT | 2 | 67% | 0.1% | 2 |
5 | ETUD TELECOMMUN | 2 | 11% | 0.6% | 14 |
6 | CEM2 | 2 | 11% | 0.6% | 15 |
7 | 1332 | 1 | 100% | 0.1% | 2 |
8 | CARACTERISAT COMPOSANTS SEMICOND | 1 | 50% | 0.1% | 2 |
9 | COMMERCIAL SYST | 1 | 100% | 0.1% | 2 |
10 | IES UMR CNRS UM2 5214 | 1 | 100% | 0.1% | 2 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000233971 | SINGLE EVENT BURNOUT SEB//SINGLE EVENT GATE RUPTURE SEGR//RREACT GRP |
2 | 0.0000217173 | RADFET//IMPLANTABLE DOSIMETER//DEVICE PHYS MICROELECT |
3 | 0.0000148830 | NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI//NEGATIVE BIAS TEMPERATURE INSTABILITY//CHRISTIAN DOPPLER TCAD |
4 | 0.0000139345 | SID4//DEUTERIUM D ANNEALING//TRAP CREATION |
5 | 0.0000124410 | STRESS INDUCED LEAKAGE CURRENT//SOFT BREAKDOWN//DIELECTRIC BREAKDOWN BD |
6 | 0.0000104877 | ELECTRICALLY DETECTED MAGNETIC RESONANCE//EDMR//BERLIN JOINT EPR |
7 | 0.0000090937 | SIMOX//BURIED OXIDE LAYER//CONTACTLESS I V METHOD |
8 | 0.0000086279 | NONIONIZING ENERGY LOSS NIEL//DISPLACEMENT DAMAGE DOSE//NONIONIZING ENERGY LOSS |
9 | 0.0000083455 | TRANSPARENT ELE OACT MAT PROJECT//PHYS ASTRON SCI//UDR CAGLIARI |
10 | 0.0000074304 | HOT CARRIER//CHANNEL INITIATED SECONDARY ELECTRON CHISEL//HOT CARRIER DEGRADATION |