Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
19652 | 431 | 11.1 | 30% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
3128 | 1760 | FERROELECTRIC CATHODE//PSEUDOSPARK SWITCH//PSEUDOSPARK |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | STRESS STRAINED STATE | Author keyword | 12 | 86% | 1% | 6 |
2 | STRESS STRUCTURAL INHOMOGENEITY | Author keyword | 8 | 100% | 1% | 5 |
3 | STATE ENGN | Address | 3 | 60% | 1% | 3 |
4 | MULTI AXIS SYSTEMS | Author keyword | 2 | 67% | 0% | 2 |
5 | NANOMETRIC RANGE | Author keyword | 2 | 67% | 0% | 2 |
6 | TEMPERATURE DEFORMATIONS | Author keyword | 2 | 67% | 0% | 2 |
7 | HEATED CONDITION | Author keyword | 1 | 100% | 0% | 2 |
8 | SUBMICROMETRIC ACCURACY | Author keyword | 1 | 100% | 0% | 2 |
9 | VACUUM ARC DEPOSITION METHOD | Author keyword | 1 | 100% | 0% | 2 |
10 | PLASMA ELECTRON SOURCE | Author keyword | 1 | 40% | 0% | 2 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ELECTROSTATIC CONFINEMENT | 7 | 67% | 1% | 6 |
2 | HOLLOW CATHODE GLOW | 2 | 50% | 1% | 3 |
3 | NEUTRAL MOLECULE BEAM | 1 | 100% | 0% | 2 |
4 | CUTTING PLATES | 1 | 50% | 0% | 1 |
5 | EMISSION ELECTRONICS | 1 | 50% | 0% | 1 |
6 | VACUUM CHAMBER | 1 | 20% | 1% | 3 |
7 | POWDER MATERIALS | 0 | 20% | 0% | 2 |
8 | ELECTRON EMITTER | 0 | 25% | 0% | 1 |
9 | SOURCE TECHNOLOGY | 0 | 25% | 0% | 1 |
10 | HARD ALLOY | 0 | 17% | 0% | 1 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Glow discharges with electrostatic confinement of fast electrons | 2015 | 0 | 59 | 27% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | STATE ENGN | 3 | 60% | 0.7% | 3 |
2 | P IDIUM BURYATIAN SCI | 1 | 33% | 0.5% | 2 |
3 | ELE ON BEAM PROC SECT | 1 | 50% | 0.2% | 1 |
4 | SCI EDUC NANOSTRUCT MAT NANOTECHNOL | 1 | 50% | 0.2% | 1 |
5 | UMR CNRS ECL ENISE | 1 | 50% | 0.2% | 1 |
6 | AA BAYKOV MET | 0 | 33% | 0.2% | 1 |
7 | MAT SCI TECHNOL MET MAT | 0 | 33% | 0.2% | 1 |
8 | PLASMA COATING TECHNOL | 0 | 33% | 0.2% | 1 |
9 | SUKHUMI PHYSICOTECH | 0 | 25% | 0.2% | 1 |
10 | P IDIUM BURYAT SCI | 0 | 11% | 0.2% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000145870 | CENT PHYS TECHNOL//ELECTRODISCHARGE OZONIZER// |
2 | 0.0000111336 | FERROELECTRIC CATHODE//ELECTRON AND ION EMISSION//FERROELECTRIC CATHODES |
3 | 0.0000110163 | FUSED HOLLOW CATHODE//HOLLOW CATHODE//PLASMA GRP |
4 | 0.0000085749 | PSEUDOSPARK SWITCH//PSEUDOSPARK//TRIGGERED VACUUM SWITCH TVS |
5 | 0.0000063466 | INTENSE PULSED ION BEAM//HIGH CURRENT PULSED ELECTRON BEAM//HIGH INTENSITY PULSED ION BEAM |
6 | 0.0000062005 | PLASMA LENS//PLASMA OPTICS//HALL CURRENT ACCELERATOR |
7 | 0.0000049703 | PLASMA ANTENNA//PLASMA STEALTH//STATE PULSE POWER LASER TECHNOL |
8 | 0.0000049083 | BI SB SOLID SOLUTIONS//QUENCH DEPOSITED FILM//VARIABLE VALENCE |
9 | 0.0000046286 | VACUUM ARC//CATHODE SPOT//VACUUM ARCS |
10 | 0.0000045443 | A SCHEME//COULOMB BROADENING//NOISE PULSES |