Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
19644 | 431 | 16.8 | 44% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
2776 | 2621 | CHEMICAL MECHANICAL POLISHING//CHEMICAL MECHANICAL PLANARIZATION//CMP |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | MAKYOH TOPOGRAPHY | Author keyword | 11 | 65% | 3% | 11 |
2 | WIRE SAWING | Author keyword | 5 | 37% | 2% | 10 |
3 | WAFER PRODUCTION | Author keyword | 4 | 67% | 1% | 4 |
4 | WIRESAW | Author keyword | 4 | 75% | 1% | 3 |
5 | SEMICONDUCTOR MATERIAL | Author keyword | 3 | 20% | 3% | 14 |
6 | WIRE SAW | Author keyword | 3 | 32% | 2% | 7 |
7 | DIAMOND WIRE SAW | Author keyword | 3 | 28% | 2% | 8 |
8 | MULTI WIRE SAWING | Author keyword | 2 | 44% | 1% | 4 |
9 | CELL THINNING | Author keyword | 2 | 67% | 0% | 2 |
10 | CHIP STRENGTH | Author keyword | 2 | 67% | 0% | 2 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | MAKYOH TOPOGRAPHY | 11 | 65% | 3% | 11 | Search MAKYOH+TOPOGRAPHY | Search MAKYOH+TOPOGRAPHY |
2 | WIRE SAWING | 5 | 37% | 2% | 10 | Search WIRE+SAWING | Search WIRE+SAWING |
3 | WAFER PRODUCTION | 4 | 67% | 1% | 4 | Search WAFER+PRODUCTION | Search WAFER+PRODUCTION |
4 | WIRESAW | 4 | 75% | 1% | 3 | Search WIRESAW | Search WIRESAW |
5 | SEMICONDUCTOR MATERIAL | 3 | 20% | 3% | 14 | Search SEMICONDUCTOR+MATERIAL | Search SEMICONDUCTOR+MATERIAL |
6 | WIRE SAW | 3 | 32% | 2% | 7 | Search WIRE+SAW | Search WIRE+SAW |
7 | DIAMOND WIRE SAW | 3 | 28% | 2% | 8 | Search DIAMOND+WIRE+SAW | Search DIAMOND+WIRE+SAW |
8 | MULTI WIRE SAWING | 2 | 44% | 1% | 4 | Search MULTI+WIRE+SAWING | Search MULTI+WIRE+SAWING |
9 | CELL THINNING | 2 | 67% | 0% | 2 | Search CELL+THINNING | Search CELL+THINNING |
10 | CHIP STRENGTH | 2 | 67% | 0% | 2 | Search CHIP+STRENGTH | Search CHIP+STRENGTH |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SILICON DIE | 7 | 64% | 2% | 7 |
2 | WIRESAW | 6 | 71% | 1% | 5 |
3 | CHUCK SHAPE | 6 | 100% | 1% | 4 |
4 | MAGIC MIRROR METHOD | 3 | 57% | 1% | 4 |
5 | LAPLACIAN IMAGE | 3 | 100% | 1% | 3 |
6 | CHIP STRENGTH | 2 | 67% | 0% | 2 |
7 | MAKYOH | 2 | 50% | 1% | 3 |
8 | DIE ATTACH TECHNIQUE | 1 | 100% | 0% | 2 |
9 | MACHINING FAM PROCESSES | 1 | 100% | 0% | 2 |
10 | ORIENTAL MAGIC MIRRORS | 1 | 100% | 0% | 2 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Grinding of silicon wafers: A review from historical perspectives | 2008 | 31 | 28 | 93% |
Basic mechanisms and models of multi-wire sawing | 2004 | 64 | 23 | 48% |
Simultaneous double side grinding of silicon wafers: a literature review | 2006 | 11 | 7 | 100% |
Machining processes for sapphire wafers: a literature review | 2011 | 6 | 27 | 56% |
Review of Microcrack Detection Techniques for Silicon Solar Cells | 2014 | 1 | 33 | 27% |
Die singulation technologies for advanced packaging: A critical review | 2012 | 9 | 62 | 23% |
Ultrathin Wafer Pre-Assembly and Assembly Process Technologies: A Review | 2015 | 0 | 34 | 29% |
Proteolytic dysfunction in neurodegenerative disorders | 2004 | 13 | 126 | 1% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | GEORGIA TECH MFG | 1 | 50% | 0.5% | 2 |
2 | LEADERS GLOBAL OPERAT | 1 | 100% | 0.5% | 2 |
3 | METROL SYST | 1 | 100% | 0.5% | 2 |
4 | ESTUDIOS INVEST TECN GIPUZKOA | 1 | 19% | 0.9% | 4 |
5 | SYNCHROTRONSTRAHLUNG | 1 | 12% | 1.4% | 6 |
6 | PACKAGE DEV ENGN | 1 | 50% | 0.2% | 1 |
7 | PRECIS ENGN STRATEG PROGRAMME | 1 | 50% | 0.2% | 1 |
8 | ASSEMBLY PACKAGING TECHNOL | 0 | 33% | 0.2% | 1 |
9 | ENSEIRBUMR 5218 | 0 | 33% | 0.2% | 1 |
10 | MECH ENGNMINIST EDUC | 0 | 33% | 0.2% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000162413 | MONOCRYSTALLINE SILICON SURFACE//AU SI THIN FILMS//FOCUSSED ION BEAM MICROSCOPY |
2 | 0.0000104433 | GRINDING//VITRIFIED BOND//AMTREL |
3 | 0.0000078178 | DIAMOND TURNING//FAST TOOL SERVO//ROTARY ULTRASONIC MACHINING RUM |
4 | 0.0000067901 | PROVINCIAL KEY STONE MACHINING//INDUSTRIAL DIAMOND REVIEW//MARBLE TECHNOL |
5 | 0.0000067493 | METALLURGICAL GRADE SILICON//SOLAR GRADE SILICON//MULTICRYSTALLINE SILICON |
6 | 0.0000060153 | CHAIR PHYS CHEM 2//CRYSTAL REORIENTATION//NON PYROPHORIC |
7 | 0.0000057773 | STRIP BENDING TEST//MEMS PROD//HIGH CYCLE FATIGUE TEST |
8 | 0.0000057027 | CHEMICAL MECHANICAL POLISHING//CHEMICAL MECHANICAL PLANARIZATION//CMP |
9 | 0.0000056265 | HYDRODYNAMIC POLISHING PROCESS//ULTR RECIS SCI TECHNOL//JOINT OPTOMECHATRON DESIGN ENGN |
10 | 0.0000054195 | PROBE CARD//POROUS SILICON MICROMACHINING//VERTICAL ACTIVE DEVICES |