Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
19558 | 435 | 21.2 | 49% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
2051 | 4868 | SCANNING//LAMACOP//BACKSCATTERED ELECTRONS |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | MEAN PENETRATION DEPTH | Author keyword | 12 | 86% | 1% | 6 |
2 | CONTINUOUS SLOWING DOWN APPROXIMATION | Author keyword | 9 | 83% | 1% | 5 |
3 | DOPANT CONTRAST | Author keyword | 9 | 67% | 2% | 8 |
4 | VICANEK AND URBASSEK THEORY | Author keyword | 6 | 100% | 1% | 4 |
5 | SECONDARY ELECTRON POTENTIAL CONTRAST SEPC | Author keyword | 4 | 75% | 1% | 3 |
6 | APPLICATIONS OF MONTE CARLO METHODS | Author keyword | 3 | 50% | 1% | 4 |
7 | MAT SYST ELECT | Address | 2 | 38% | 1% | 5 |
8 | DIFFERENTIAL ELASTIC SCATTERING CROSS SECTION | Author keyword | 2 | 67% | 0% | 2 |
9 | DOPING CONTRAST | Author keyword | 2 | 67% | 0% | 2 |
10 | UFA SETIF | Address | 2 | 67% | 0% | 2 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | DIELECTRIC SOLIDS | 9 | 67% | 2% | 8 |
2 | POSITRON BACKSCATTERING | 8 | 75% | 1% | 6 |
3 | DOPANT CONTRAST | 8 | 62% | 2% | 8 |
4 | IMPLANTATION PROFILES | 6 | 50% | 2% | 8 |
5 | POTENTIAL CONTRAST | 4 | 75% | 1% | 3 |
6 | DOPED REGIONS | 3 | 57% | 1% | 4 |
7 | KILOVOLT ELECTRON | 3 | 57% | 1% | 4 |
8 | BACKSCATTERING PROBABILITIES | 3 | 100% | 1% | 3 |
9 | KEV ELECTRON | 3 | 26% | 2% | 9 |
10 | MOTT CROSS SECTIONS | 3 | 42% | 1% | 5 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
Electron-beam interactions with solids | 2003 | 48 | 5 | 80% |
From the physics of secondary electron emission to image contrasts in scanning electron microscopy | 2012 | 9 | 42 | 26% |
Toward Quantitative Scanning Electron Microscopy | 2014 | 2 | 42 | 19% |
A new type of scanning electron microscope using the coaxial backscattered electrons | 2002 | 2 | 2 | 100% |
Electrons impinging on solid targets | 2003 | 0 | 2 | 100% |
A comparative study between slow electrons and positrons transport in solid thin films | 2009 | 0 | 24 | 63% |
Monte Carlo simulations | 2003 | 0 | 11 | 73% |
On the spatial resolution and nanoscale feature visibility in scanning electron microscopy | 2002 | 2 | 18 | 61% |
Inelastic scattering | 2003 | 1 | 5 | 60% |
Elastic scattering | 2003 | 0 | 3 | 33% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MAT SYST ELECT | 2 | 38% | 1.1% | 5 |
2 | UFA SETIF | 2 | 67% | 0.5% | 2 |
3 | MAT ELECT SYST LMSE | 1 | 100% | 0.5% | 2 |
4 | QUAL MANAGEMENT FAILURE ANAL | 1 | 100% | 0.5% | 2 |
5 | FRONT END PROC GRP | 1 | 50% | 0.2% | 1 |
6 | ICPMBCNRSFR 2843 | 1 | 50% | 0.2% | 1 |
7 | PHYS MOL ISICPMBFR 2843 | 1 | 50% | 0.2% | 1 |
8 | QD | 1 | 50% | 0.2% | 1 |
9 | ALIS BUSINESS UNIT | 1 | 29% | 0.5% | 2 |
10 | MAT BIOFIS MED | 0 | 33% | 0.2% | 1 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000251375 | SCANNING//SECONDARY EMISSION NOISE//INTEGRATED CIRCUIT ADV PROC TECHNOL |
2 | 0.0000222257 | STANDARDLESS ANALYSIS//FU 160//TRITIUM ANALYSIS |
3 | 0.0000171273 | IMFP//ELASTIC PEAK ELECTRON SPECTROSCOPY//SURFACE EXCITATION |
4 | 0.0000160257 | SURFACE EMISSION RATE//ALPHA BETA COUNTING//EXTRAPOLATED RANGE |
5 | 0.0000156196 | LAMACOP//SECONDARY ELECTRON EMISSION//ALUMINA INSULATOR |
6 | 0.0000151819 | EMISSION STATISTICS//PARTICLE INDUCED ELECTRON EMISSION//KINETIC ELECTRON EMISSION |
7 | 0.0000151617 | ADV SPACE STUDIES//NANODOSIMETRY//GEANT4 DNA |
8 | 0.0000118234 | POSITRON BEAM//SLOW POSITRON BEAM//POSITRON MICROSCOPE |
9 | 0.0000111150 | SECOND ORDER FOCUSING//SPACE PLASMA INSTRUMENT//SPHERICAL CONDENSER |
10 | 0.0000086921 | CATHODE LENS//SPECTROMICROSCOPY//PHOTOEMISSION MICROSCOPY |